Jung H. Shin

Optical gain at 1.54 μm in erbium-doped silicon nanocluster sensitized waveguide

Optical gain at 1.54 μm in erbium-doped silicon-rich silicon oxide (SRSO) is demonstrated. Er-doped SRSO thin film was fabricated by electron-cyclotron resonance enhanced chemical vapor deposition of silicon suboxide with concurrent sputtering of erbium followed by a 5 min anneal at 1000 °C. Ridge-type single mode waveguides were fabricated by wet chemical etching. Optical gain of 4 dB/cm of an externally coupled signal at 1.54 μm is observed when the Er is excited via carriers generated in the Si nanoclusters by the 477 nm line of an Ar laser incident on the top of the waveguide at a pump power of 1.5 W cm−2.Optical gain at 1.54 μm in erbium-doped silicon-rich silicon oxide (SRSO) is demonstrated. Er-doped SRSO thin film was fabricated by electron-cyclotron resonance enhanced chemical vapor deposition of silicon suboxide with concurrent sputtering of erbium followed by a 5 min anneal at 1000 °C. Ridge-type single mode waveguides were fabricated by wet chemical etching. Optical gain of 4 dB/cm of an externally coupled signal at 1.54 μm is observed when the Er is excited via carriers generated in the Si nanoclusters by the 477 nm line of an Ar laser incident on the top of the waveguide at a pump power of 1.5 W cm−2.

High efficiency visible electroluminescence from silicon nanocrystals embedded in silicon nitride using a transparent doping layer

We have fabricated light-emitting diodes with a transparent doping layer on silicon nanocrystals (nc-Si) embeded in silicon nitride matrix formed by plasma-enhanced chemical vapor deposition. Under forward biased condition, orange electroluminescence (EL) with its peak wavelength at about 600 nm was observed at room temperature. The peak position of the EL is very similar to that of the photoluminescence (PL) and the emitted EL intensity is proportional to the current density passing through the device. We suggest that the observed EL is originated from electron-hole pair recombination in nc-Si. By using indium tin oxide and n-type SiC layer combination as a transparent doping layer, we obtained high external quantum efficiency greater than 1.6%.

Flexible, Angle-Independent, Structural Color Reflectors Inspired by Morpho Butterfly Wings

Thin-film color reflectors inspired by Morpho butterflies are fabricated. Using a combination of directional deposition, silica microspheres with a wide size distribution, and a PDMS (polydimethylsiloxane) encasing, a large, flexible reflector is created that actually provides better angle-independent color characteristics than Morpho butterflies and which can even be bent and folded freely without losing its Morpho-mimetic photonic properties.

Coefficient determination related to optical gain in erbium-doped silicon-rich silicon oxide waveguide amplifier

Gain-determining coefficients in Er-doped, nanocrystal-Si (nc-Si) sensitized silica waveguide amplifiers are investigated. Single-mode, Er-doped silica waveguides with nc-Si embedded in them were prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition of Er-doped a-Si:Ox (x<2) followed by a high-temperature anneal to precipitate nc-Si. Exciting the Er ions via nc-Si by pumping the waveguide from the top with the 477 nm line of an Ar laser resulted in an enhancement of the transmitted 1535 nm signal of up to 14 dB/cm, indicating a possible net gain of up to 7 dB/cm. From the dependence of the signal enhancement upon the pump power, an emission cross section of 2×10−19 cm2 at 1535 nm and an effective excitation cross section of ⩾10−17 cm2 at 477 nm is obtained.

Composition dependence of room temperature 1.54 μm Er3+ luminescence from erbium-doped silicon:oxygen thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition

The composition dependence of room temperature 1.54 μm Er3+ photoluminescence of erbium-doped silicon:oxygen thin films produced by electron cyclotron resonance plasma enhanced chemical vapor deposition of SiH4 and O2 with concurrent sputtering of erbium is investigated. The Si:O ratio was varied from 3:1 to 1:2 and the annealing temperature was varied from 500 to 900 °C. The most intense Er3+ luminescence is observed from the sample with a Si:O ratio of 1:1.2 after a 900 °C anneal and the formation of silicon nanoclusters embedded in the SiO2 matrix. The high active erbium fraction, efficient excitation via carriers, and high luminescence efficiency due to the high quality SiO2 matrix are identified as key factors in producing the intense Er3+ luminescence.

Optical gain at 1.5 /spl mu/m in nanocrystal Si-sensitized Er-doped silica waveguide using top-pumping 470 nm LEDs

This paper demonstrates optical gain at 1.5 /spl mu/m in Si-nanocrystal-sensitized, Er-doped silica waveguide using a commercial, low-cost 470 nm LED in top-pumping configuration. Experimental evidence of full inversion with maximum possible gain of 3 dB/cm is presented. Possible application of Si-nanocrystal-sensitized, Er-doped silica for silicon-based microphotonics is also presented.

Intense blue–white luminescence from carbon-doped silicon-rich silicon oxide

The effect of carbon doping on the enhancement of visible luminescence from silicon-rich silicon oxide (SRSO), which consists of Si nanoclusters embedded inside a SiO2 matrix, is investigated. C-doped SRSO films were fabricated by electron cyclotron resonance-plasma enhanced chemical vapor deposition method using SiH4, O2, and CH4 source gases followed by a high-temperature anneal. Intense blue-white visible luminescence, visible to the naked eye under daylight conditions, was observed from the film with a nearly equal amount of C and excess Si (∼16 at. %) after an anneal at 950 °C. Furthermore luminescence could be tuned from 1.8 to 2.5 eV by controlling the C to excess Si ratio, the C content, and the anneal temperature. Taken together with the infrared absorption spectra, these results indicate that the luminescence is attributed to exciton recombination in C-incorporated Si nanoclusters.

Effect of nitride passivation on the visible photoluminescence from Si-nanocrystals

The effect of nitride passivation on the visible photoluminescence from nanocrystal Si (nc-Si) is investigated. Silicon-rich silicon nitride (SRSN) and silicon-rich silicon oxide (SRSO), which consist of nc-Si embedded in silicon nitride and silicon oxide, respectively, were prepared by reactive ultrahigh vacuum ion beam sputter deposition followed by a high temperature anneal. Both SRSN and SRSO display photoluminescence peaks after high temperature annealing, coincident with the formation of Si nanocrystals, and similar changes in the peak luminescence position with the excess Si content. However, the luminescence peak positions from SRSN are blueshifted by about 0.6 eV over that of comparable SRSO such that its luminescence peaks in the visible range. The results demonstrate that control of the surface passivation is critical in controlling the nc-Si luminescence, and indicate the possibility of using nitride-passivated nc-Si for visible luminescence applications including white luminescence.

Er3+ luminescence and cooperative upconversion in ErxY2−xSiO5 nanocrystal aggregates fabricated using Si nanowires

Er3+ luminescence and cooperative upconversion in ErxY2−xSiO5 nanocrystal aggregates fabricated using Si nanowires is investigated. X-ray diffraction and photoluminescence spectroscopy indicate that the composition of the final nanocrystals can be varied continuously from pure Y2SiO5 to pure Er2SiO5 while keeping the crystal structure the same. Analysis of concentration and pump-power dependence of the Er3+ photoluminescence intensity and decay time shows that while cooperative upconversion occurs at high Er concentrations, the cooperative upconversion coefficient is only (2.2±1.1)×10−18cm3∕s at a Er concentration of 1.2×1021cm−3. This is nearly ten times lower at more than ten times higher Er concentration than that reported from Er-doped silica and demonstrates the viability of using such silicates for compact, high-gain Si-based optical material for Si photonics.

Indirect excitation of Er3+ in sol-gel hybrid films doped with an erbium complex

Transparent sol-gel hybrid films doped with erbium tris 8-hydroxyquinoline were prepared using methyltriethoxysilane, vinyltriethoxysilane, and phenyltrimethoxysilane as precursors. We obtain a strong 1.53-μm Er3+ luminescence with a wide full width at half-maximum and no thermal quenching. Comparison of absorption of the film with the pump wavelength dependence of Er3+ luminescence intensity indicates the presence of an efficient indirect excitation path for Er3+ via organic ligands.