Jung Kyun Park

Uniformity of internal linear-type inductively coupled plasma source for flat panel display processing

The variation in plasma uniformity over an extremely large size inductively coupled plasma (ICP) source of 2750×2350mm2 was examined. An internal linear-type antenna called “double comb-type antenna” was used as the ICP source. A plasma density of ∼1.4×1011∕cm3 could be obtained at 5mTorr Ar by applying 10kW rf power to the source at a frequency of 13.56MHz. An increase in rf power from 1to10kW improved the plasma uniformity over a substrate area of 2300×2000mm2 from 18.1% to 11.4%. The improvement in uniformity of the internal ICP source was attributed to the increase in plasma density near the wall.

Nanoscale topographical replication of graphene architecture by artificial DNA nanostructures

Despite many studies on how geometry can be used to control the electronic properties of graphene, certain limitations to fabrication of designed graphene nanostructures exist. Here, we demonstrate controlled topographical replication of graphene by artificial deoxyribonucleic acid (DNA) nanostructures. Owing to the high degree of geometrical freedom of DNA nanostructures, we controlled the nanoscale topography of graphene. The topography of graphene replicated from DNA nanostructures showed enhanced thermal stability and revealed an interesting negative temperature coefficient of sheet resistivity when underlying DNA nanostructures were denatured at high temperatures.

Effect of antenna capacitance on the plasma characteristics of an internal linear inductively coupled plasma system

This study examined the effect of the antenna capacitance of an inductively coupled plasma (ICP) source, which was varied using an internal linear antenna, on the electrical and plasma characteristics of the ICP source. The inductive coupling at a given rf current increased with decreasing antenna capacitance. This was caused by a decrease in the inner copper diameter of the antenna made from coaxial copper/quartz tubing, which resulted in a higher plasma density and lower plasma potential. By decreasing the diameter of the copper tube from 25to10mm, the plasma density of a plasma source size of 2750×2350mm2 was increased from approximately 8×1010∕cm3to1.5×1011∕cm3 at 15mTorr Ar and 9kW of rf power.

Characteristics of Plasma Using a Ferromagnetic Enhanced Inductively Coupled Plasma Source

Plasma characteristics and electrical parameters of an internal linear inductively coupled plasma (ICP) source with a U-type antenna with/without a Ni–Zn ferromagnetic material installed near the antenna were investigated. The application of the ferromagnetic material to the antenna increased the plasma density, improved the plasma uniformity, lowered the antenna voltage, and increased the stability of the plasma during the operation. For the U-type ferromagnetic enhanced internal linear ICP source, a high density plasma on the order of 4.5×1011 cm-3 which is about three higher than that obtained for the source without the ferromagnetic material could be obtained at the pressure of 10 mTorr Ar and at the RF power of 600 W at 13.56 MHz.