Junjun Wei

Enhanced deposition of ZnO films by Li doping using radio frequency reactive magnetron sputtering

Radio frequency (RF) reactive magnetron sputtering was utilized to deposit Li-doped and undoped zinc oxide (ZnO) films on silicon wafers. Various Ar/O2 gas ratios by volume and sputtering powers were selected for each deposition process. The results demonstrate that the enhanced ZnO films are obtained via Li doping. The average deposition rate for doped ZnO films is twice more than that of the undoped films. Both atomic force microscopy and scanning electron microscopy studies indicate that Li doping significantly contributes to the higher degree of crystallinity of wurtzite–ZnO. X-ray diffraction analysis demonstrates that Li doping promotes the (002) preferential orientation in Li-doped ZnO films. However, an increase in the ZnO lattice constant, broadening of the (002) peak and a decrease in the peak integral area are observed in some Li-doped samples, especially as the form of Li2O. This implies that doping with Li expands the crystal structure and thus induces the additional strain in the crystal lattice. The oriented-growth Li-doped ZnO will make significant applications in future surface acoustic wave devices.

Orientation variation along growth direction of millimeter free-standing CVD diamond thinned by mechanical grinding

A free-standing diamond film with millimeter thickness prepared by DC arc plasma jet was thinned successively by mechanical grinding. The orientation and quality of the diamond films with different thicknesses were characterized by X-ray diffraction and Raman spectroscopy, respectively. The results show a random grain-orientation distribution during the initial growth stage. As the film thickness increases, the preferred orientation of the diamond film changes from (111) to (220), due to the competitive growth mechanism. Twinning generated during the nucleation stage appears to stabilize the preferential growth along the 〈110〉 direction. The interplanar spacing of the (220) plane is enlarged as the film thickness increases, which is caused by the increase of non-diamond-phase carbon and impurities under the cyclic gas. In addition, the quality of the diamond film is barely degraded during the growth process. Furthermore, the peak shift demonstrates a significant inhomogeneity of stress along the film growth direction, which results from competitive growth.

Energy consumption of electrooxidation systems with boron-doped diamond electrodes in the pulse current mode

A pulse current technique was conducted in a boron-doped diamond (BDD) anode system for electrochemical wastewater treatment. Due to the strong generation and weak absorption of hydroxyl radicals on the diamond surface, the BDD electrode possesses a powerful capability of electrochemical oxidation of organic compounds, especially in the pulse current mode. The influences of pulse current parameters such as current density, pulse duty cycle, and frequency were investigated in terms of chemical oxygen demand (COD) removal, average current efficiency, and specific energy consumption. The results demonstrated that the relatively high COD removal and low specific energy consumption were obtained simultaneously only if the current density or pulse duty cycle was adjusted to a reasonable value. Increasing the frequency slightly enhanced the COD removal and average current efficiency. A pulse-BDD anode system showed a stronger energy saving ability than a constant-BDD anode system when the electrochemical oxidation of phenol of the two systems was compared. The results prove that the pulse current technique is more cost-effective and more suitable for a BDD anode system for real wastewater treatment. A kinetic analysis was presented to explain the above results.

Particle erosion of infrared materials

Abstract Erosion test of some infrared (IR) optical crystals (Ge, ZnS, MgF2, and quartz) was conducted with a number of different erodents (glass bead, and angular SiC, SiO2, Al2O3) by a homemade gas-blasting erosion tester. The influence of impact angle, impact velocity, erodent, and erosion time on the erosion rate and the effect of erosion on their IR transmittance were studied. The damaged surface morphology was characterized by scanning electron microscopy, and the erosion mechanism was explored. All of the materials show the maximum in wear versus impact angle at 90°, confirming their brittle failure behavior. It is found that the erosion rate is dependent on the erodent velocity by a power law, and it is highly correlated to the hardness of the erodent. The erosion rate-time curves do not show an incubation state, but an accelerated erosion period followed a maximum erosion (steady state). The decrease of IR transmittance is direct proportion to the erosion rate. Although the material loss occurs primarily by brittle process, ductile behavior is clearly an important feature, especially for MgF2 and ZnS.

Optical characterization of single-crystal diamond grown by DC arc plasma jet CVD

Optical centers of single-crystal diamond grown by DC arc plasma jet chemical vapor deposition (CVD) were examined using a low-temperature photoluminescence (PL) technique. The results show that most of the nitrogen-vacancy (NV) complexes are present as NV− centers, although some H2 and H3 centers and B-aggregates are also present in the single-crystal diamond because of nitrogen aggregation resulting from high N2 incorporation and the high mobility of vacancies under growth temperatures of 950–1000°C. Furthermore, emissions of radiation-induced defects were also detected at 389, 467.5, 550, and 588.6 nm in the PL spectra. The reason for the formation of these radiation-induced defects is not clear. Although a Ni-based alloy was used during the diamond growth, Ni-related emissions were not detected in the PL spectra. In addition, the silicon-vacancy (Si-V)-related emission line at 737 nm, which has been observed in the spectra of many previously reported microwave plasma chemical vapor deposition (MPCVD) synthetic diamonds, was absent in the PL spectra of the single-crystal diamond prepared in this work. The high density of NV− centers, along with the absence of Ni-related defects and Si-V centers, makes the single-crystal diamond grown by DC arc plasma jet CVD a promising material for applications in quantum computing.

Preparation of nano-diamond films on GaN with a Si buffer layer

Gallium nitride (GaN) has been widely used in electronic and optoelectronic devices because of its unique electrical properties. However, its low thermal conductivity and the high thermal boundary resistance at the interface between GaN and substrates such as Si and Al2O3preventefficient heat dissipation from the heated regions, which limits the further development of GaN-based high power devices. Diamond, with the highest thermal conductivity, has been considered to be one of the most promising heat sink materials. However, it is hard to prepare a diamond film on a GaN substrate because there is a high thermal expansion coefficient difference and also a large lattice mismatch between them. An approach to prepare a nano-diamond film on a GaN substrate by incorporating a Si buffer layer has been proposed. A GaN substrate decomposes significantly from 560 to 680°C when exposed to ahydrogen plasma for 5 min and no adhesive nano-diamond film can be directly grown on it. This decomposition is significantly suppressed by the presence of a Si buffer layer and a nano-diamond film about 2 μm thick can be deposited on a GaN substrate by microwave chemical vapor deposition using CH4 as the carbon source. With an optimum Si layer of 10 nm, the adhesive force between the nano-diamond film and the GaN substrate reaches 10N, which is ascribed to the complete conversion of the Si layer to a silicon carbidetransition layer during the deposition.