K.Mae

The microscopic mechanism of surfactant epitaxy by molecular dynamics

Surfactant epitaxy has been expected to be a powerful method to improve thin-film growth from 3D island to layered growth, but the atomic level process of surfactant epitaxy has not been revealed yet. The purpose of this paper is to elucidate the phenomenon of surfactant epitaxy by molecular dynamic simulations. It is found that a smaller surface energy is necessary for the surfactant to be stable on the surface and that the difference of the atomic radii between the surfactant and the adatom plays an important role in the process of quick exchange of their positions.

Local interaction energy of carbon and nitrogen atoms in FFC γ-iron

A Mossbauer effect study has been done for Fe−C and Fe−M−C (M: Al, Mn) γ-iron. From the obtained fractional intensity of each component of spectra, the local interaction energies between carbon atoms were determined by means of Monte-Carlo simulation. The interaction energiees between carbon atoms and M atoms are also derived.

Computer simulations on the electrical resistivities of metallic superlattices based on simple model

Abstract We have calculated the resistivity and temperature coefficient resistance (TCR) of multilayers by a theory analogous with the Fuchs-Sondheimer theory. The calculated results of the bilayer thickness dependence of resistivity and TCR of Au/Pd, Al/Ag, Mo/Ta, Pd/Co and Ag/Co are in good agreement with experiments.

Computer simulation of the surfactant epitaxy by Modified Embedded Atom Method (MEAM)

We have systematically performed the static calculations using the Modified Embedded Atom Method (MEAM). We have calculated the energetical difference between the structure with a monolayer film on a substrate and the structure with the film buried into the second layer. The calculation will give the necessary condition for the surfactant epitaxy and the substrate atom segregating phenomenon from the energetical point of view.

Fundamental processes of the epitaxial growth of silver and gold films

Abstract Intensity oscillations of reflection high-energy electron diffraction (RHEED) during the autoepitaxy of Au on Au(001) and Ag on Ag(001) and during the heteroepitaxy of Au on Ag(001) and Ag on Au(001) were measured at 310 and 330 K. The morphologies of the growing surfaces are discussed in terms of the surface energies and the surface reconstruction. RHEED intensity oscillation during Au deposition on Ag(001) at 330 K rapidly decayed at the 6th period when reconstruction of the Au(001) surface appeared. Such a rapid decay was not observed at 310 K. On the other hand, the reconstruction entirely disappeared at the first minimum of the RHEED intensity oscillation in the case of Ag deposition on Au.

RHEED investigation of metal epitaxies and multilayers

Abstract Homoepitaxies and heteroepitaxies of Au and Ag were examined by means of RHEED intensity oscillation. The surface reconstruction of Au was found to influence the damping of the RHEED oscillations. We have also performed the RHEED observations during the growth of Au/Co multilayers at some temperatures. Samples grown at lower temperatures have smoother interface and show greater perpendicular magnetic anisotropy.

Study of the epitaxial growth of metal on metal using RHEED

Abstract We have measured RHEED intensity oscillations during homoepitaxial and heteroepitaxial growth of Au and Ag in order to examine the influence of the surface reconstruction on their growth. The reconstruction was found to influence the damping of the RHEED oscillations. We have also performed the RHEED observations during the growth of Au/Co multilayers at some temperatures. The sample grown at lower temperature has a smoother interface and shows greater perpendicular magnetic anisotropy.