Kagehiro Kageyama
Hitachi
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Featured researches published by Kagehiro Kageyama.
Photomask Technology 2018 | 2018
Narihiro Morosawa; Yasunori Noguchi; Satoru Mochizuki; Kagehiro Kageyama
Half-tone masks are essential for process reduction and shape control of photo reactive organic material in FPD, the importance of half-tone masks is increasing in recent large sized and high resolution displays. Half-tone masks are categorized as top layer type and bottom layer type. Process reduction and short term mask production are possible in bottom layer half-tone mask. Therefore it is expected that the demand of bottom layer half-tone mask will be increasing in future. Ulvac coating has developed two types of bottom layer half-tone mask blanks which half-tone layers are composed in Cr material or MoSi material respectively. Since each bottom layer half-tone mask blanks has different advantage in process and characteristics, it is possible to select half-tone mask blank by customer requirement. We will discuss process and characteristics of two types bottom layer half-tone mask blanks in this meeting.
Archive | 1997
Hideki Tamaki; Akira Yoshinari; Akira Okayama; Mitsuru Kobayashi; Kagehiro Kageyama; Takehiro Ohno
Archive | 2009
Kagehiro Kageyama; Daisuke Nakamura; 大介 中村; 景弘 影山
Archive | 1998
Kagehiro Kageyama; Shigeyoshi Nakamura; Akira Okayama; Takehiro Ono; Hideki Tamaoki; Akira Yoshinari; 重義 中村; 明 吉成; 丈博 大野; 昭 岡山; 景弘 影山; 英樹 玉置
Archive | 2003
Hirotaka Hamakake; Kagehiro Kageyama; 景弘 影山; 裕貴 濱欠
Archive | 1999
Kagehiro Kageyama; Katsutoshi Ono; 勝敏 小野; 景弘 影山
Archive | 2001
Kagehiro Kageyama; Koji Sato
Archive | 1997
Kagehiro Kageyama; Mitsuru Kobayashi; Akira Okayama; Takehiro Oono; Hideki Tamaoki; Akira Yoshinari; 明 吉成; 丈博 大野; 満 小林; 昭 岡山; 景弘 影山; 英樹 玉置
Archive | 2003
Kazumi Asaki; Kagehiro Kageyama; Takashi Kichishin; Masakazu Kobayashi; Katsuhiro Komagamine; Taku Meguro; Hitoshi Sato; 仁 佐藤; 崇史 吉眞; 真和 小林; 景弘 影山; 卓 目黒; 克弘 駒ヶ嶺; 和美 麻木
Archive | 1998
Kagehiro Kageyama; Hiroshi Takashima; 景弘 影山; 洋 高島