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Kagetaka Ichikawa

Showa Denko

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Publication

Featured researches published by Kagetaka Ichikawa.

Archive | 2001

COMPOSITION FOR POLISHING A SEMICONDUCTOR DEVICE AND PROCESS FOR MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME

Takanori Kido; Kagetaka Ichikawa

Archive | 2000

Polishing material composition and polishing method for polishing LSI devices

Takanori Kido; Fumio Tsujino; Kagetaka Ichikawa; Nobuo Uotani

Archive | 1999

Cerium oxide slurry for polishing, process for preparing the slurry, and process for polishing with the slurry

Takanori Kido; Masayuki Sanbayashi; Fumio Tsujino; Kagetaka Ichikawa

Archive | 1999

Abrasive composition for polishing semiconductor device and process for producing semiconductor device with the same

Kagetaka Ichikawa; Takanori Kido

Archive | 1991

Method for producing high density hexagonal boron nitride sintered article

Kagetaka Ichikawa; Takao Noda

Archive | 2004

METHOD FOR REFINING ORGANIC ACID

Kagetaka Ichikawa; Masuzo Yokoyama; Hideaki Yugawa; 景隆 市川; 益造 横山; 英明 湯川

Archive | 1999

Abrasive composition for polishing lsi device

Kagetaka Ichikawa; Takanori Kido; Fumio Tsujino; Nobuo Uotani

Archive | 1999

Cerium oxide slurry for polishing, preparation thereof, and polishing method

Kagetaka Ichikawa; Takanori Kido; Masayuki Mitsuhayashi; Fumio Tsujino; 正幸 三林; 景隆 市川; 高徳 貴堂; 史雄 辻野

Archive | 1998

Abrasive composition for polishing of lsi device and polishing method

Kagetaka Ichikawa; Takanori Kido; Fumio Tsujino; Nobuo Uotani; 景隆 市川; 高徳 貴堂; 史雄 辻野; 信夫 魚谷

Archive | 1999

Aufschlämmung von ceriumoxid zum polieren, verfahren zur herstellung dieser aufschlämmung und verfahren zum polieren mit dieser aufschlämmung Slurry of cerium oxide for polishing, process to manufacture this slurry and method for polishing with this slurry

Kagetaka Ichikawa; Takanori Kido; Masayuki Shiojiri-shi Sanbayashi; Fumio Tsujino

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Takanori Kido

Showa Denko

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Fumio Tsujino

Showa Denko

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Nobuo Uotani

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Masayuki Sanbayashi

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Takao Noda

Showa Denko

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