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Katayama Toshiharu

Mitsubishi

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Publication

Featured researches published by Katayama Toshiharu.

Archive | 1993

Semiconductor device having impurity diffusion region formed in substrate beneath interlayer contact hole

Katayama Toshiharu

Archive | 1996

NONVOLATILE SEMICONDUCTOR MEMORY AND FABRICATION THEREOF

Otani Naoko; Katayama Toshiharu

Archive | 1993

Semiconductor device of DRAM structure - comprising substrate, impurity regions formed on substrate, and conducting layers

Katayama Toshiharu

Archive | 1995

SEMICONDUCTOR MEMORY AND ITS MANUFACTURING METHOD

Otani Naoko; Katayama Toshiharu

Archive | 1996

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SILICON SUBSTRATE CASSETTE FOR SELECTIVE ETCHING

Katayama Toshiharu; Otani Naoko

Archive | 1992

Semiconductor device with improved element isolation - has diffusion layer located below contact and has good field screening properties and prevents short circuiting

Katayama Toshiharu

Archive | 2001

Bestimmungsverfahren für Fehler in einem Gateisolierfilm in Halbleitereinrichtungen

Katayama Toshiharu; Ohtani Naoko; Imai Yukari

Archive | 1999

NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE AND MAKING METHOD OF THE SAME

Otani Naoko; Katayama Toshiharu

Archive | 1998

DISPOSITIF MEMOIRE NON VOLATILE A SEMI-CONDUCTEURS ET PROCEDE DE FABRICATION DE CELUI-CI

Otani Naoko; Katayama Toshiharu

Archive | 1998

METHOD OF EVALUATING INSULATION FILM

Otani Naoko; Kimura Yasuhiro; Katayama Toshiharu

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Otani Naoko

Mitsubishi

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Imai Yukari

Mitsubishi

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Ohtani Naoko

Mitsubishi

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