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Dive into the research topics where Katsumi Sugiura is active.

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Featured researches published by Katsumi Sugiura.


Journal of Electronic Materials | 1994

Origin of nonradiative recombination centers in AlGaInP grown by metalorganic vapor phase epitaxy

Makoto Kondo; Naoko Okada; K. Domen; Katsumi Sugiura; Chikashi Anayama; T. Tanahashi

We report the first concrete evidence that oxygen causes nonradiative deep levels in (Alx Ga1–x)0.5In0.5P grown by metalorganic vapor phase epitaxy. We doped AlGaInP with O2 and investigated the oxygen and deep level concentrations by secondary ion mass spectroscopy and isothermal capacitance transient spectroscopy. We confirmed that oxygen causes the D3 (thermal activation energy: ET ≅ 1.0 e V for x = 0.7, nonradiative recombination center) and D2 (ET ≅ 0.46 e V) levels, which we previously found in undoped AlGaInP. We demonstrate that the oxygen and nonradiative deep level concentrations are significantly reduced at higher growth temperatures, higher PH3 partial pressures, and substrate offset from (100) toward [011].


Journal of Crystal Growth | 1991

Study on radiative efficiency in AlGaInP/GaInP double-heterostructures : influence of deep level in cladding layers

K. Domen; Katsumi Sugiura; Chikashi Anayama; Makoto Kondo; Mitsuru Sugawara; T. Tanahashi; Kazuo Nakajima

Abstract We have studied the recombination process of carriers in AlGaInP/GaInP double heterostructures grown by metalorganic vapor phase epitaxy using time-resolved photoluminescence. We found that interfacial recombination is a major process in our samples. We have also studied the influence of the deep-level concentration in AlGaInP-cladding layers on interfacial recombination and found that reducing the deep level concentration from 10 15 to 10 13 cm -3 reduces the interfacial recombination velocity from 140 to 60 cm/s and improves the radiative efficiency. Our results suggest that carriers in the active layer recombine nonradiatively at the interfaces due to the deep level in cladding layers.


Journal of Applied Physics | 1991

Analysis of recombination centers in (AlxGa1−x)0.5In0.5P quaternary alloys

Katsumi Sugiura; K. Domen; Mitsuru Sugawara; Chikashi Anayama; Masao Kondo; T. Tanahashi; K. Nakajima

We studied nonradiative recombination centers in undoped (AlxGa1−x)0.5In0.5Pgrown by metalorganic vapor phase epitaxy using transient capacitance spectroscopy. We found three deep energy levels, including a mid‐gap level. We drew an equation to get a capture cross section for minority carriers, and obtained it using isothermal capacitance transient spectroscopy measurement. The mid‐gap level had an electron capture cross section of 2 × 10−10 cm2 and a hole capture cross section of 1 × 10−15 cm2. The time constant of nonradiative recombination through the mid‐gap level was found to be comparable to that of radiative recombination. We concluded that the mid‐gap level is an effective nonradiative recombination center that reduces photoluminescence intensity.


The Japan Society of Applied Physics | 1992

Origin of Nonradiative Recombination Centers in AlGaInP Grown by MOVPE

Makoto Kondo; Naoko Okada; K. Domen; Katsumi Sugiura; Chikashi Anayama; T. Tanahashi

Nonradiative recombination centers associated with midgap deep levels significantly degrade the radiative efficiency of AlGaInP heterostructures used in visible laser diodes (LDs) and light-emitting diodes (LEDs) in the 600-nm wavelength regionl, 2. We report the first direct evidence that such nonradiative recombination centers in AlGaInP are introduced by oxygen. We quantitatively demonstrate advantages of higher temperature growth and substrate misorientation for reducing the oxygen and, consequently, nonradiative recombination centers. We propose a model for oxygen incorporation mechanisms and defect configurations. We investigated how oxygen is incorporated and affects deep level formation, using secondary ion mass spectroscopy (SIMS) and isothermal capacitance transient spectroscopy (ICTS) for (Als.zGao.g)o.5lns.5P intentionally doped with t6Oz.Epitaxial layers were grown by metalorganic vapor phase epitaxy (MOVPE). The 16C,z concentration in the vapor phase was varied from 0.004 to 0.04 ppm. We obtained a very low SIMS 160 background (1 to 3 x 1g16sm-3) by careful measurement precautions. We studied photoluminescence (PL) intensity for AlGalnP(O2-doped)/GalnP(undoped, 0.02 pm) doublehetero (DH) strucrures. We found that:


The Japan Society of Applied Physics | 1990

Non-Radiative Recombination Center in AlGaInP Quarternary Alloys

Katsumi Sugiura; K. Domen; Chikashi Anayama; Masao Kondo; Mitsuru Sugawara; T. Tanahashi; Kazuo Nakajima

lfe investigated deep energy leve1s in undoped-AlGalnP gronn by metal organie vapor phase epitaxy using eapacitanee transient speetroscopy. He found three deep energy levels ineluding a mid-gap level. lle neasured capture cross sections for both eleetrons and holes and confirned the midgap level to be a non-radiative reeombination center by estimating a time eonstant of a non-radiative reconbination. l{e redueed the number of the non-radiative reconbination centers by high temperature gronth and obtained AlGaInP nith high radiative efficiency.


Electronics Letters | 1998

Low-threshold 650 nm band S/sup 3/ laser diodes using tensile strained GaInAsP/AlGaInP MQW

Naoko Okada; Chikashi Anayama; Katsumi Sugiura; Hiroshi Sekiguchi; Akira Furuya; T. Tanahashi


Electronics Letters | 1998

AlGaInP red lasers with nearly round far field pattern

Chikashi Anayama; Naoko Okada; Katsumi Sugiura; Akira Furuya; T. Tanahashi


Archive | 2002

Compound semiconductor device manufacturing method

Katsumi Sugiura; Chikashi Anayama; Akira Furuya


Archive | 2002

Semiconductor laser and production process

Akira Furuya; Chikashi Anayama; Katsumi Sugiura; Kensei Nakao; Taro Hasegawa


Archive | 2002

Production method of compound semiconductor laser

Katsumi Sugiura; Chikashi Anayama; Akira Furuya

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