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Featured researches published by Kazuhiko Naitoh.


Archive | 1995

Visible Light Photoinitiation Systems Based on Electron and Energy Transfer Processes

Tsuguo Yamaoka; Kazuhiko Naitoh

Nearly 35 years ago L. M. Minsk et al. reported poly(vinyl cinnamate)1 and E. I. du Pont de Nemours & Co. commercialized the letterpress plate made of photopolymerizing material2 With the current rapid development of technology, photopolymers are finding increasing applications in the fields of printing, coating, microlithography, and electronic device production.


Journal of The Chemical Society-perkin Transactions 1 | 1992

Photochemical dissociation of p-nitrobenzyl sulfonate esters via an intramolecular electron transfer

Kazuhiko Naitoh; Tsuguo Yamaoka

The photochemistry of p-nitrobenzyl sulfonate esters, p-nitrobenzyl 5-dimethylaminonaphthalene-1-sulfonate (NDS) and p-nitrobenzyl pyrene-1-sulfonate (NPS) has been investigated by both steady-state and laser flash photolysis techniques. These sulfonates are photochemically dissociated to give the parent sulfonic acids. Quantum yields for photodissociation of NDS and NPS with excitation at 365 nm in degassed acetonitrile solution are 0.20 ± 0.05 and 0.16 ± 0.04, respectively. Photodissociation of these sulfonates is considered to proceed via an intramolecular electron transfer from the excited singlet state of the 5-dimethylaminonaphthalene or pyrene moiety to the p-nitrobenzyl moiety from the fact that the transient absorption bands at 390 and 550 nm due to the radical cation of the 5-dimethylaminonaphthalene moiety, 420 and 450 nm due to the radical cation of the pyrene moiety, and at 340 nm due to the radical anion of the p-nitrobenzyl moiety are detected in laser spectroscopy. Intramolecular-electron-transfer-induced bond cleavage is observed at the oxygen–carbon bond of these sulfonate esters, producing the organic strong acids. Although photodissociation of o-nitrobenzyl esters of carboxylic and sulfonic acids is known, that of p-nitrobenzyl esters has not been previously reported. From the mechanistic point of view, the photochemical behaviour of these p-nitrobenzyl sulfonate esters is quite different from that of o-nitrobenzyl esters. While the latter involves a photoinduced intramolecular rearrangement, the former involves a photoinduced intramolecular electron transfer.


Chemistry Letters | 1991

Intra-ion-pair electron transfer mechanism for photolysis of diphenyliodonium salt sensitized by 9,10-dimethoxyanthracene-2-sulfonate counteranion

Kazuhiko Naitoh; Tsuguo Yamaoka; Akira Umehara


Chemistry of Materials | 1993

Novel dual-mode photoresist based on cationic polymerization and acidolysis

Seongyun Moon; Kazuhiko Naitoh; Tsuguo Yamaoka


Polymers for Advanced Technologies | 1993

Photoreactive fluorinated polyimide protected by tetrahydropyranyl (THP) group based on chemical amplification: Acid generation in polyimide film and lithographic properties

Kazuhiko Naitoh; Kazuhisa Ishii; Tsuguo Yamaoka; Toshihiko Omote


Journal of Applied Polymer Science | 1993

An aqueous-base developable photoresist based on light-induced cationic polymerization: Resist performance of poly(glycidyl methacrylate-co-methacrylic acid)

Kazuhiko Naitoh; Ken'ichi Koseki; Tsuguo Yamaoka


The Journal of Physical Chemistry | 1992

Photoinduced intramolecular electron transfer mechanism for photochemical dissociation of para-substituted benzyl 9,10-dimethoxyanthracene-2-sulfonates

Kazuhiko Naitoh; Koh Yoneyama; Tsuguo Yamaoka


Polymers for Advanced Technologies | 1993

Photoreactive fluorinated polyimide protected by a tetrahydropyranyl group (THP) based on photo‐induced acidolysis

Toshihiko Omote; Syun'ichi Hayashi; Kazuhisa Ishii; Kazuhiko Naitoh; Tsuguo Yamaoka


Journal of Photopolymer Science and Technology | 1994

Photochemical Behavior of Nifedipine Derivatives and Application to Photosensitive Polyimides

Tsuguo Yamaoka; S. Yokoyama; Toshihiko Omote; Kazuhiko Naitoh; K. Yoshida


Polymers for Advanced Technologies | 1992

Acid generation and deprotecting reaction by diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate in a novolak positive photoresist based on chemical amplification

Kazuhiko Naitoh; Tsuguo Yamaoka; Akira Umehara

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