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Kazuhiro Gotoh

Tokyo Institute of Technology

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Publication

Featured researches published by Kazuhiro Gotoh.

Journal of Crystal Growth | 2013

Optical and structural studies of highly uniform Ge quantum dots on Si (001) substrate grown by solid-source molecular beam epitaxy

Kazuhiro Gotoh; Ryuji Oshima; Takeyoshi Sugaya; Isao Sakata; Koji Matsubara; Michio Kondo

Thin Solid Films | 2014

Effect of deposition rate on the characteristics of Ge quantum dots on Si (001) substrates

Kazuhiro Gotoh; Ryuji Oshima; Takeyoshi Sugaya; Isao Sakata; Koji Matsubara; Michio Kondo

The Japan Society of Applied Physics | 2018

Study on Chemical Passivation of TiO x Passivating Layer/ Crystalline Si

Takeya Mochizuki; Kazuhiro Gotoh; Akio Ohta; Shyohei Ogura; Yasuyoshi Kurokawa; Seiichi Miyazaki; Katsuyuki Fukutani; Noritaka Usami

The Japan Society of Applied Physics | 2018

Epitaxial growth of SiGe layer on Si substrate by printing and firing of Al-Ge mixed paste

Shogo Fukami; Shota Masuda; Yoshihiko Nakagawa; Kazuhiro Gotoh; Yasuyoshi Kurokawa; Marwan Dhamrin; Noritaka Usami

The Japan Society of Applied Physics | 2018

Preparation of BaSi 2 thin films on micro-textured glass substrates and evaluation of optical properties

Yoshihiko Nakagawa; Robin Vismara; Thomas Loef; Yilei Tian; Kazuhiro Gotoh; Yasuyoshi Kurokawa; Olindo Isabella; Miro Zeman; Noritaka Usami

The Japan Society of Applied Physics | 2018

Characterization of Structual and Optical Properties of Barrier Layer for Silicon Quantum Dot Superlattice by Plasma Enhanced Chemical Vapor Deposition

Ryushiro Akaishi; Kouhei Kitazawa; Satoshi Ono; Shinya Kato; Kazuhiro Gotoh; Noritaka Usami; Yasuyoshi Kurokawa

The Japan Society of Applied Physics | 2018

Surface passivation effect of RF-plasma processed a-Si:H layers on the optical properties of BaSi 2 epitaxial films

Zhihao Xu; Kazuhiro Gotoh; Tianguo Deng; Kaoru Toko; Noritaka Usami; Takashi Suemasu

The Japan Society of Applied Physics | 2018

Analysis of interface workfunction and process-induced damage in transition-metal-oxide/passivation-layer/Si structures for carrier-selective contacts: ALD-TiO x

Takefumi Kamioka; Takeya Mochizuki; Kazuhiro Gotoh; Yutaka Hayashi; Yuki Isogai; Kyotaro Nakamura; Noritaka Usami; Yoshio Ohshita

The Japan Society of Applied Physics | 2018

Fabrication of light trapping structure using Ge island with high coverage grown by gas source molecular beam epitaxy as an etching mask

Yushi Ota; Atsushi Hombe; Kazuhiro Gotoh; Yasuyoshi Kurokawa; Usami Noritaka; Domitorij Yurasov; A. V. Novikov; M. V. Shaleev

The Japan Society of Applied Physics | 2018

Impact of SiO x Interlayer on Thermal Stability of TiO x Passivating Layer

Takeya Mochizuki; Kazuhiro Gotoh; Yasuyoshi Kurokawa; Noritaka Usami

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Noritaka Usami

Nagoya University

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Yasuyoshi Kurokawa

Nagoya University

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Koji Matsubara

National Institute of Advanced Industrial Science and Technology

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Michio Kondo

Tokyo Institute of Technology

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Ryuji Oshima

National Institute of Advanced Industrial Science and Technology

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Takeyoshi Sugaya

National Institute of Advanced Industrial Science and Technology

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Isao Sakata

National Institute of Advanced Industrial Science and Technology

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Kyotaro Nakamura

Meiji University

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Yoshio Ohshita

Toyota Technological Institute

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Akio Ohta

Nagoya University

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