Kazuki Tateyama
Toshiba
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Publication
Featured researches published by Kazuki Tateyama.
Journal of microelectronics and electronic packaging | 2005
Yasunari Ukita; Kazuki Tateyama; Masao Segawa; Yoshihiko Tojo; Hideyuki Gotoh; Katsuhisa Oosako
Lead-free materials are required to replace conventional lead-containing solder for environmental protection. The Pb-rich solder die mount material in a high-power transistor package is required to be replaced by a silver adhesive paste. The silver paste has disadvantages such as low thermal conductivity and high electrical resistivity, since conduction paths are achieved only by mechanical contacts between silver particles. Recently, a new conductive paste containing silver particles and silver nanoparticles with a particle size of 3–7 nm in diameter was developed. The paste shows very low electrical resistivity of 6×10−6 ohm.cm, since the silver nanoparticles can be fused at temperatures below 200°C. We have been studying the possibility of the paste as a die mount material for high-power transistor packages. It was confirmed that the paste had a very high thermal conductivity of 51 W/mK. We fabricated a high-power transistor package using this paste. As a result, the package showed lower thermal resist...
japan international electronic manufacturing technology symposium | 1995
Soichi Honma; Kazuki Tateyama; Hiroshi Yamada; Masayuki Saito
This paper describes the optimum thickness of barrier metals and the cause of the decrease in the shear strength of 37Pb/63Sn solder bumps for flip-chip interconnection. The authors evaluated the mutual diffusion and the shear strength of solder bumps on barrier metals. From aging test results with the Cu/Ti structure, when the thickness of the Cu film was greater than 10 /spl mu/m, the shear strength did not change from the initial value. In the Ni/Ti structure, where the Ni film had a thickness of 1.0 /spl mu/m, the shear strength also did not change from the initial value. In addition, it was confirmed that the decrease in the shear strength is caused by diffusion between Sn and Cu, or Sn and Ni, and oxidization of the barrier metals.
Archive | 1996
Hiroshi Yamada; Takasi Togasaki; Masayuki Saito; Soichi Honma; Miki Mori; Kazuki Tateyama
Archive | 2005
Katsuhisa Osako; Naoto Shioi; Daisuke Itoh; Hideyuki Gotoh; Yorishige Matsuba; Kazuki Tateyama; Yasunari Ukita; Masao Segawa; Takuo Kikuchi
Archive | 1996
Yasushi Shizuki; Yuji Iseki; Naoko Ono; Kunio Yoshihara; Masayuki Saito; Hiroshi Yamada; Kazuki Tateyama
Archive | 2005
Kazuki Tateyama; Takahiro Sogou; Tomohiro Iguchi; Hiroyoshi Hanada; Yasuhito Saito; Masayuki Arakawa; Naruhito Kondo
Archive | 2005
Osamu Tsuneoka; Naruhito Kondo; Naokazu Iwanade; Akihiro Hara; Kazuki Tateyama
Archive | 2005
Katsuhisa Osako; Naoto Shioi; Daisuke Itoh; Hideyuki Gotoh; Yorishige Matsuba; Kazuki Tateyama; Yasunari Ukita; Masao Segawa; Takuo Kikuchi
Archive | 2007
Osamu Tsuneoka; Naruhito Kondo; Akihiro Hara; Kazuki Tateyama; Takahiro Sogou; Yasuhito Saito; Masayuki Arakawa
Archive | 2005
Hideyuki Goto; Daisuke Ito; Takuo Kikuchi; Yorishige Matsuba; Takehisa Osako; Masao Segawa; Naoto Shioi; Kazuki Tateyama; Yasunari Ukita; 大輔 伊東; 直人 塩井; 雄久 大迫; 英之 後藤; 頼重 松葉; 康成 浮田; 雅雄 瀬川; 和樹 舘山; 拓雄 菊池