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Dive into the research topics where Kazumasa Wakiya is active.

Publication


Featured researches published by Kazumasa Wakiya.


Archive | 2012

Substrate treatment method

Masahito Tanabe; Kazumasa Wakiya; Masakazu Kobayashi; Toshimasa Nakayama


Archive | 2004

Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming method

Taku Hirayama; Ryoichi Takasu; Mitsuru Sato; Kazumasa Wakiya; Masaaki Yoshida; Koki Tamura


Archive | 1996

Remover solution composition for resist and method for removing resist using the same

Masahito Tanabe; Kazumasa Wakiya; Masakazu Kobayashi; Toshimasa Nakayama


Archive | 2002

Photoresist stripping solution and a method of stripping photoresists using the same

Shigeru Yokoi; Kazumasa Wakiya


Archive | 1996

Photoresist stripping liquid compositions and a method of stripping photoresists using the same

Masahito Tanabe; Kazumasa Wakiya; Masakazu Kobayashi; Toshimasa Nakayama


Archive | 2003

Method for removing photoresist

Shigeru Yokoi; Kazumasa Wakiya; Takayuki Haraguchi


Archive | 1997

Process for treating a lithographic substrate and a rinse solution for the treatment

Masahito Tanabe; Kazumasa Wakiya; Masakazu Kobayashi; Toshimasa Nakayama


Archive | 2004

Material for forming resist-protecting film for immersion exposure process, resist-protecting film made of such material, and method for forming resist pattern using such resist-protecting film

Taku Hirayama; Kotaro Endo; Masaaki Yoshida; Kazumasa Wakiya


Archive | 1995

Removing solution composition for resist

Masaichi Kobayashi; Toshimasa Nakayama; Masahito Tanabe; Kazumasa Wakiya; 寿昌 中山; 政一 小林; 将人 田辺; 和正 脇屋


Archive | 2000

Photoresist stripping solution and a method of stripping photoresists with the same

Kazumasa Wakiya; Masakazu Kobayashi

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