Kazushi Ishiyama

Electromagnetic near field measurements by using magnet garnet crystal

An optical scanning electromagnetic field probe system consisting of an optic crystal substrate and a galvano scanner has been developed for high speed, low-invasive measurement of electromagnetic near field distribution. We measured magnetic field distributions above a microstrip line using several magnetic garnet crystal substrates and the probe system. We observed that the frequency response in the gigahertz range improved when we applied a magnetic bias to the crystal. In addition, a magnetic field component in a particular direction could be detected by controlling the direction of the magnetic bias.

Optical scanning probe system for electromagnetic near field measurements

An optical scanning electromagnetic field probe system, consisting of an electro-optic or magneto-optic crystal substrate and a galvano scanner, has been developed for high speed, low-invasive measurement of electromagnetic near field distribution. We demonstrate the measurement of electric field distributions using a LiNbO3 crystal substrate and the probe system. We also measure magnetic field distributions above a microstrip line in the gigahertz range using a magnetic garnet thin film. The probe system is also used for measuring electromagnetic field distributions above a commercially available IC.

Electromagnetic near field distribution measurements using optically scanning system

An optically scanning electromagnetic field probe system, consisting of an electro-optic or magneto-optic crystal substrate and a galvano scanner, has been developed for the high speed, low-invasive measurement of electromagnetic near field distribution. We present some examples of electromagnetic field distribution measurements above a microstrip line using a LiNbO3 or a magnetic garnet crystal substrate and the probe system. We have also measured electromagnetic fields above a commercially available IC using the system.