Keiichiro Yamanaka
Panasonic
Network
Latest external collaboration on country level. Dive into details by clicking on the dots.
Publication
Featured researches published by Keiichiro Yamanaka.
Microlithography '90, 4-9 Mar, San Jose | 1990
Nobuaki Furuya; Takuhiro Ono; Naoya Horiuchi; Keiichiro Yamanaka; Takeo Miyata
As a light source for deep submicron lithography the authors have developed a long life and high power KrF narrow band excimer laser by installing a polarization coupled resonator into the conventional narrow band excimer laser with intra-cavity etalons. A maximum output power of 1O. 5Yi with a low etalon-load of L5W arid a narrow spectral band-width of 24pm at 200Hz is obtained. The central wavelength is stabilized to within only 5pm and drift is not observed when increasing the repetition rate from 4Hz to 200Hz without a wavelength feedback loop system. Furthermore the etalon-life is expected to be drastically prolonged to over a billion pulses resulting from the reduction of the etalonload to only about 10 of that in a conventional laser. 2.
High-power lasers and applications | 1998
Keiichiro Yamanaka; Yuji Hashidate; Hidemi Takahashi; Nobuaki Furuya
We discuss a new resonator design for sub-pm bandwidth (FWHM) KrF excimer laser using an etalon, a grating and prisms. This resonator uses a polarization beam splitter prism (PBSP) which has both functions of splitting polarized beam and beam expansion to reduce the resonator length. In our experiments, the output power is improved 29.4% by using PBSP in comparison with the conventional method, while the bandwidth (FWHM) is reduced from less than 0.9 pm to less than 0.6 pm at the same time. A calculation has been done to confirm the output power dependence on the resonator length and the loss of optics. Its result explains our experimental results approximately. We demonstrated that PBSP has a significant effect to improve the output power of the narrow bandwidth KrF excimer laser that would result in the extension of chamber lifetime. Furthermore, this technique will help the development of the band narrowing excimer laser for microlithography.
Archive | 1990
Nobuaki Furuya; Takuhiro Ono; Naoya Horiuchi; Keiichiro Yamanaka; Takeo Miyata
Archive | 1992
Takuhiro Ono; Naoya Horiuchi; Keiichiro Yamanaka; Kenichi Takahata; Nobuaki Furuya; Takeo Miyata
Archive | 1992
Nobuaki Furuya; Takuhiro Ono; Naoya Horiuchi; Keiichiro Yamanaka; Takeo Miyata; Kenichi Takahata
Archive | 1999
Nobuaki Furuya; Yuji Hashidate; Hiromoto Ichihashi; Hidemi Takahashi; Keitaro Takano; Keiichiro Yamanaka; 伸昭 古谷; 圭一郎 山中; 宏基 市橋; 雄二 橋立; 秀実 高橋; 啓太郎 高野
Archive | 1991
Nobuaki Furuya; Takuhiro Ono; Naoya Horiuchi; Keiichiro Yamanaka; Takeo Miyata
Archive | 2002
Shintaro Hara; Isaku Jinno; Takeshi Kamata; Hiroyoshi Yajima; Keiichiro Yamanaka; 慎太郎 原; 圭一郎 山中; 浩義 矢島; 伊策 神野; 健 鎌田
Archive | 2002
Isaku Kanno; Keiichiro Yamanaka; Takeshi Kamada; Hiroyoshi Yajima; Shintaro Hara
Archive | 1999
Nobuaki Furuya; Hiromoto Ichihashi; Hidemi Takahashi; Keiichiro Yamanaka; 伸昭 古谷; 圭一郎 山中; 宏基 市橋; 秀実 高橋