Keisuke Kitano

Three-dimensional photonic crystals created by single-step multi-directional plasma etching

We fabricate 3D photonic nanostructures by simultaneous multi-directional plasma etching. This simple and flexible method is enabled by controlling the ion-sheath in reactive-ion-etching equipment. We realize 3D photonic crystals on single-crystalline silicon wafers and show high reflectance (>95%) and low transmittance (<-15dB) at optical communication wavelengths, suggesting the formation of a complete photonic bandgap. Moreover, our method simply demonstrates Si-based 3D photonic crystals that show the photonic bandgap effect in a shorter wavelength range around 0.6 μm, where further fine structures are required.

Control of radiation angle by introducing symmetric end structure to oblique waveguide in three-dimensional photonic crystal.

We investigate the radiation angle of an oblique waveguide in a stripe-stacked three-dimensional photonic crystal. We show that the output-light is radiated in a different direction from the oblique waveguide direction. Moreover, the radiation polar angle varies from 30° to 50° depending on the frequency. To inhibit the frequency dependence and obtain vertical radiation, we introduced a symmetric structure at the end of the waveguide. As a result of cancellation of the in-plane asymmetric wavenumber, the radiation polar angle is less than 6° from the surface-normal direction and does not depend on frequency.