Ken-ichi Fukukawa
Tokyo Institute of Technology
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Featured researches published by Ken-ichi Fukukawa.
Biomacromolecules | 2008
Ken-ichi Fukukawa; Raffaella Rossin; Aviv Hagooly; Eric D. Pressly; Jasmine N. Hunt; Benjamin W. Messmore; Karen L. Wooley; Michael J. Welch; Craig J. Hawker
The synthesis of core-shell star copolymers via living free radical polymerization provides a convenient route to three-dimensional nanostructures having a poly(ethylene glycol) outer shell, a hydrophilic inner shell bearing reactive functional groups, and a central hydrophobic core. By starting with well-defined linear diblock copolymers, the thickness of each layer, overall size/molecular weight, and the number of internal reactive functional groups can be controlled accurately, permitting detailed structure/performance information to be obtained. Functionalization of these polymeric nanoparticles with a DOTA-ligand capable of chelating radioactive (64)Cu nuclei enabled the biodistribution and in vivo positron emission tomography (PET) imaging of these materials to be studied and correlated directly to the initial structure. Results indicate that nanoparticles with increasing PEG shell thickness show increased blood circulation and low accumulation in excretory organs, suggesting application as in vivo carriers for imaging, targeting, and therapeutic groups.
Macromolecules | 2005
Ken-ichi Fukukawa; Lei Zhu; Padma Gopalan; Mitsuru Ueda; Shu Yang
High etch resistance to oxygen plasma for silicon-containing polymers, and the high thermal and mechanical robustness of the etching product, silicon oxide, make it attractive to design novel silicon-containing block copolymers for direct patterning of nanostructures on a desired substrate. Here, we report the synthesis of a series of block copolymers from silicon-containing styrenic monomers and styrene (St) or 4-acetoxystyrene (AcOSt) using living free radical polymerization via a α-hydride nitroxide-mediated unimer (a-H unimer). Controlled polymerization with narrow polydispersity (PDI < 1.25) and high yield (up to 80%) were achieved by optimizing polymerization time and temperature, addition of solvents, use of rate accelerants, monomer addition sequence, and solvent polarity. Block copolymer morphologies before and after O 2 plasma were studied using small-angle X-ray scattering (SAXS) and transmission electron microscopy (TEM). When silicon-containing block formed the major phase and silicon concentration was greater than 12 wt %, the morphology and domain size were maintained after O 2 plasma.
ChemPhysChem | 2011
Atsutoshi Abe; Takashi Nakano; Wataru Yamashita; Ken-ichi Fukukawa; Masaki Okazaki; Shoji Tamai
The mechanism of coloration of polyimides is investigated theoretically and experimentally. Since light is considered to be absorbed by polyimides via charge-transfer excitation, we used the long-range-corrected time-dependent density functional theory recently developed by Tawada et al. [Y. Tawada, T. Tsuneda, S. Yanagisawa, T. Yanai, K. Hirao J. Chem. Phys.2004, 120, 8425] for the calculation of excitation energies and oscillator strengths. Classical molecular dynamic simulations for packed chain models of polyimides were also performed to analyze the structural information of polyimides in condensed phase. In order to predict the transparency of polyimide film, we developed a theoretical method by combining the results of electronic structure calculations and those of molecular dynamics simulations. We compare our theoretical results with experimental ones and discuss the difference between them. As a result, we clarify the new mechanism of coloration and obtain results for the theoretical UV/Visible spectra.
Journal of Physics and Chemistry of Solids | 2005
Ken-ichi Fukukawa; Lei Zhu; Padma Gopalan; Mitsuru Ueda; Shu Yang
High etch resistance to oxygen plasma for silicon-containing polymers, and the high thermal and mechanical robustness of the etching product, silicon oxide, make it attractive to design novel silicon-containing block copolymers for direct patterning of nanostructures on a desired substrate. Here, we report the synthesis of a series of block copolymers from silicon-containing styrenic monomers and styrene (St) or 4-acetoxystyrene (AcOSt) using living free radical polymerization via a α-hydride nitroxide-mediated unimer (a-H unimer). Controlled polymerization with narrow polydispersity (PDI < 1.25) and high yield (up to 80%) were achieved by optimizing polymerization time and temperature, addition of solvents, use of rate accelerants, monomer addition sequence, and solvent polarity. Block copolymer morphologies before and after O 2 plasma were studied using small-angle X-ray scattering (SAXS) and transmission electron microscopy (TEM). When silicon-containing block formed the major phase and silicon concentration was greater than 12 wt %, the morphology and domain size were maintained after O 2 plasma.
Journal of Physical Chemistry B | 2005
Ken-ichi Fukukawa; Lei Zhu; Padma Gopalan; Mitsuru Ueda; Shu Yang
High etch resistance to oxygen plasma for silicon-containing polymers, and the high thermal and mechanical robustness of the etching product, silicon oxide, make it attractive to design novel silicon-containing block copolymers for direct patterning of nanostructures on a desired substrate. Here, we report the synthesis of a series of block copolymers from silicon-containing styrenic monomers and styrene (St) or 4-acetoxystyrene (AcOSt) using living free radical polymerization via a α-hydride nitroxide-mediated unimer (a-H unimer). Controlled polymerization with narrow polydispersity (PDI < 1.25) and high yield (up to 80%) were achieved by optimizing polymerization time and temperature, addition of solvents, use of rate accelerants, monomer addition sequence, and solvent polarity. Block copolymer morphologies before and after O 2 plasma were studied using small-angle X-ray scattering (SAXS) and transmission electron microscopy (TEM). When silicon-containing block formed the major phase and silicon concentration was greater than 12 wt %, the morphology and domain size were maintained after O 2 plasma.
Biomacromolecules | 2007
Eric D. Pressly; Raffaella Rossin; Aviv Hagooly; Ken-ichi Fukukawa; Benjamin W. Messmore; Michael J. Welch; Karen L. Wooley; Matthew S. Lamm; Rohan A. Hule; Darrin J. Pochan; Craig J. Hawker
Polymer Journal | 2008
Ken-ichi Fukukawa; Mitsuru Ueda
Macromolecules | 2007
Jinqi Xu; Guorong Sun; Raffaella Rossin; Aviv Hagooly; Zicheng Li; Ken-ichi Fukukawa; Benjamin W. Messmore; Dennis A. Moore; Michael J. Welch; Craig J. Hawker; Karen L. Wooley
Macromolecules | 2004
Ken-ichi Fukukawa; Yuji Shibasaki; Mitsuru Ueda
Polymer Journal | 2006
Ken-ichi Fukukawa; Mitsuru Ueda