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Dive into the research topics where Kenichi Haga is active.

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Featured researches published by Kenichi Haga.


Japanese Journal of Applied Physics | 2011

Low-Temperature Growth of ZnO Films by Spray Pyrolysis

Kenji Yoshino; Yujin Takemoto; Minoru Oshima; Kouji Toyota; Koichiro Inaba; Kenichi Haga; Koichi Tokudome

Nondoped ZnO film on a polyethylene terephthalate film was successfully grown by conventional spray pyrolysis at 100 °C using a diethylzinc-based solution under air atmosphere. The samples had an average optical transmittance of more than 80%, a flat surface, and an a-axis orientation from the optical transmittance, scanning electron microscopy, and X-ray diffraction measurements, respectively. It was assumed that the growth at low temperature was attributed to atmospheric oxygen and/or steam.


Japanese Journal of Applied Physics | 2011

Low Sheet Resistivity of Transparent Ga-Doped ZnO Film Grown by Atmospheric Spray Pyrolysis

Yujin Takemoto; Minoru Oshima; Kenji Yoshino; Kouji Toyota; Koichiro Inaba; Kenichi Haga; Koichi Tokudome

Ga-doped ZnO film on polyethylene terephthalate film was successfully grown at 150 °C by conventional atmospheric spray pyrolysis using diethylzinc-based solution. The samples had an average optical transmittance of more than 80% and were strongly a-axis orientated according to the result of optical transmittance and X-ray diffraction analyses, respectively. The n-type Ga-doped ZnO films had a low sheet resistivity of 250 Ω/ at an optimal Ga content of 1 at. % upon UV irradiation.


Japanese Journal of Applied Physics | 2014

Fabrication and characterization of ferroelectric-gate thin-film transistors with an amorphous oxide semiconductor, amorphous In–Ga–Zn–O

Kenichi Haga; Eisuke Tokumitsu

We fabricated and characterized ferroelectric-gate thin-film transistors (FeTFTs) with an amorphous In–Ga–Zn–O (a-IGZO) channel and an oxide ferroelectric (Bi,La)4Ti3O12 (BLT) gate insulator, and examined the fabrication conditions beforehand for realizing ferroelectric hysteresis in their drain current versus gate voltage (ID–VG) characteristics. First, the optimal annealing conditions for BLT-thin-film formation by the sol–gel method were considered in terms of chemical phenomena and crystallization mechanism. As a result, the leakage current density of the film was decreased by more than two orders of magnitude. Second, sputtering deposition conditions and postdeposition annealing temperatures of a-IGZO thin films were investigated to prepare the a-IGZO channel with good electrical properties. A small charge-injection-type hysteresis width of 0.2 V was obsereved in ID–VG characteristics of a-IGZO/SiO2 TFTs. Finally, a-IGZO/BLT FeTFTs were fabricated using the above results, and the ferroelectric hysteresis with a width of 0.4 V was observed.


Materials Science Forum | 2012

Characterization of Spin Coated Nondoped and In-Doped ZnO Films Using Novel Precursor Solution

Koichiro Inaba; Yujin Takemoto; Kouji Toyota; Kenichi Haga; Kouichi Tokudome; Masato Shinmiya; Naomi Kamiya; Minoru Oshima; Kenji Yoshino

A novel precursor for ZnO film deposition with Zn-O structure was synthesized by the reaction of diethylzinc and water in some ether solvents. The novel precursor was characterized by 1H-NMR spectroscopy and differential scanning calorimetry (DSC). Nondoped and In-doped ZnO films on a glass substrate have been successfully grown by conventional spin coating using nondoped and In added novel precursor solution. The samples have an optical transmittance of more than 85%, and a smooth surface determined from optical transmittance and scanning electron microscopy, respectively. The sheet resistivity of In-doped ZnO films is lower than that of nondoped ZnO film.


Japanese Journal of Applied Physics | 2014

Relationship between source/drain-contact structures and switching characteristics in oxide-channel ferroelectric-gate thin-film transistors

Kenichi Haga; Yuuki Nakada; Dan Ricinschi; Eisuke Tokumitsu

We report on oxide-channel ferroelectric-gate thin-film transistors (FeTFTs) with the bottom-contact structure for source and drain electrodes. FeTFTs with the bottom-contact structure have faster switching characteristics than those with the top-contact structure, especially for the switching from ON to OFF. First, we confirmed that FeTFTs with the top- or bottom-contact structure exhibit similar ID–VG characteristics and retention properties to each other. Next, we measured the C–V characteristics and confirmed that the oxide semiconductor channel under the source and drain electrodes is depleted in the top-contact structure. This depleted channel impedes the switching from ON to OFF. Finally, we demonstrated that FeTFTs with the bottom-contact structure possess fast switching characteristics for the switching from both OFF to ON and ON to OFF.


Japanese Journal of Applied Physics | 2011

Growth of Spin-Coated ZnO Films Using Diethylzinc Solution

Kenji Yoshino; Masato Shinmiya; Naomi Kamiya; Junko Kosaka; Minoru Oshima; Yujin Takemoto; Kouji Toyota; Koichiro Inaba; Kenichi Haga; Koichi Tokudome

Nondoped ZnO films on a glass substrate have been successfully grown by conventional spin coating at room temperature using a diethylzinc-based solution. The samples have an optical transmittance of more than 80%, and a smooth surface determined from optical transmittance and scanning electron microscopy, respectively.


Archive | 2010

Composition for forming doped or non-doped zinc oxide thin film, and method for producing zinc oxide thin film using same

Koichiro Inaba; Kouji Toyota; Kenichi Haga; Kouichi Tokudome


Archive | 2010

Method for producing zinc oxide thin film, antistatic thin film produced by the same method, ultraviolet ray blocking thin film, and transparent electrode thin film

Kenichi Haga; Koichiro Inaba; Hirohito Takemoto; Koichi Tokutome; Koji Toyoda; Kenji Yoshino; 賢二 吉野; 功一 徳留; 孝一郎 稲葉; 裕仁 竹元; 健一 羽賀; 浩司 豊田


Archive | 2010

COMPOSITION FOR MANUFACTURING DOPED OR UNDOPED ZINC OXIDE THIN FILM AND METHOD FOR MANUFACTURING ZINC OXIDE THIN FILM USING SAME

Koichiro Inaba; Kouji Toyota; Kenichi Haga; Kouichi Tokudome


Archive | 2009

Composition for producing doped zinc oxide thin film, and method for producing doped zinc oxide thin film using the same

Kenichi Haga; Koichiro Inaba; Koichi Tokutome; Koji Toyoda; 功一 徳留; 孝一郎 稲葉; 健一 羽賀; 浩司 豊田

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Kenji Yoshino

National Institute of Advanced Industrial Science and Technology

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Eisuke Tokumitsu

Japan Advanced Institute of Science and Technology

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Joonam Kim

Japan Advanced Institute of Science and Technology

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Akiko Ide

University of Miyazaki

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