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Featured researches published by Kenichiro Yamanishi.


Journal of Vacuum Science and Technology | 1996

Formation of TiN films with low Cl concentration by pulsed plasma chemical vapor deposition

Kenji Hiramatsu; Hiroshi Ohnishi; Toru Takahama; Kenichiro Yamanishi

Polycrystalline TiN films containing less than 1 at. % of Cl contamination were formed from TiCl4 at a low temperature (200 °C) condition on a Si substrate by pulsed plasma chemical vapor deposition. The Cl suppression at low temperature was realized by a two‐step process, TiCl4 decomposition and hydrogen reduction. The main objective for reducing Cl in the film was to establish a sufficient reduction period to free TiClx radicals in the gas phase. The length of the reduction period was affected by the radio frequency power, which decided the rate of TiCl4 decomposition and hydrogen reduction.


Archive | 1987

Evaporation source with a shaped nozzle

Hisashi Tsukazaki; Kenichiro Yamanishi; Seiji Yasunaga


Archive | 1996

Semiconductor producing apparatus, and wafer vacuum chucking device, gas cleaning method and nitride film forming method in semiconductor producing apparatus

Yoshimi Kinoshita; Tomoyuki Kanda; Katsuhisa Kitano; Kazuo Yoshida; Hiroshi Ohnishi; Kenichiro Yamanishi; Shigeo Sasaki; Hideki Komori; Taizo Eshima; Kouichirou Tsutahara; Toshihiko Noguchi; Toru Takahama; Yoshihiko Kusakabe; Takeshi Iwamoto; Nobuyuki Kosaka


Archive | 1994

Wafer chuck, semiconductor producing device and production of semiconductor

Kenji Hiramatsu; Tomoyuki Kanda; Yoshimi Kinoshita; Katsuhisa Kitano; Yoshihiko Kusakabe; Toshihiko Noguchi; Hiroshi Onishi; Toru Takahama; Kouichirou Tsutahara; Kenichiro Yamanishi; Kazuo Yoshida; 勝久 北野; 和夫 吉田; 寛 大西; 健一郎 山西; 健司 平松; 儀美 木之下; 智幸 神田; 嘉彦 草壁; 晃一郎 蔦原; 利彦 野口; 亨 高浜


Archive | 1990

CLUSTER BEAM THIN FILM DEPOSITION APPARATUS WITH THERMIONIC ELECTRON CONTROL

Hisashi Tsukazaki; Kenichiro Yamanishi; Seiji Yasunaga


Archive | 1992

APPARATUS FOR AND METHOD OF FORMING THIN FILM

Hisashi Tsukazaki; Kenichiro Yamanishi


Archive | 1990

FLUID TREATMENT APPARATUS AND METHOD OF ITS SHUTDOWN

Masaaki Tanaka; Akira Ikeda; Toshiaki Kobayashi; Kenichiro Yamanishi; Shinichi Inoue; Shigeki Nakayama


Archive | 1990

Fluid treater and method of stopping the same

Masaaki Tanaka; Akira Ikeda; Toshiaki Kobayashi; Kenichiro Yamanishi; Shinichi Inoue; Shigeki Nakayama


Archive | 1993

SEMICONDUCTOR MANUFACTURING APPARATUS, WAFER VACUUM CHUCK DEVICE THEREOF, AND GAS CLEANING AND NITRIDE FILM FORMATION THEREFOR

Taizo Ejima; Takeshi Iwamoto; Tomoyuki Kanda; Yoshimi Kinoshita; Katsuhisa Kitano; Hideki Komori; Noriyuki Kosaka; Yoshihiko Kusakabe; Toshihiko Noguchi; Hiroshi Onishi; Shigeo Sasaki; Susumu Takahama; Kouichirou Tsutahara; Kenichiro Yamanishi; Kazuo Yoshida; 茂雄 佐々木; 勝久 北野; 秀樹 古森; 和夫 吉田; 寛 大西; 宣之 小坂; 健一郎 山西; 猛 岩本; 儀美 木之下; 泰蔵 江島; 智幸 神田; 嘉彦 草壁; 晃一郎 蔦原; 利彦 野口; 享 高浜


Japanese Journal of Applied Physics | 1997

Investigation of Precursors Formed by Mixing

Yoshihiko Kusakabe; Ken-ichi Hanaoka; Hideki Komori; Hiroshi Ohnishi; Kenichiro Yamanishi

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