Kęstutis Jarašiūnas

Determination of free carrier bipolar diffusion coefficient and surface recombination velocity of undoped GaN epilayers

Time-resolved nondegenerate four-wave mixing experiments were performed on 2.6-μm-thick GaN epilayers grown by metalorganic chemical-vapor deposition using picosecond pulses at 355 and 1064 nm for grating recording and probing, respectively. Measurements of free carrier grating kinetics at various grating periods Λ in range from 3 to 10 μm allowed determination of nonequilibrium carrier bipolar diffusion coefficient D=1.7 cm2/s at 300 K. Substitution of the D value into two-dimensional carrier transport model allowed fitting of the whole set of grating kinetics at various Λ varying surface recombination velocity S and linear recombination time τR. This procedure provided us a value of S=5×104 cm/s as well as carrier lifetime of ∼1 ns.

Fast and slow carrier recombination transients in highly excited 4H– and 3C–SiC crystals at room temperature

Nonequilibrium carrier recombination in highly excited epitaxial layers of 4H–SiC and free standing 3C–SiC was analyzed numerically and studied experimentally by the time-resolved free carrier absorption (FCA) technique. The measurement setup combined interband carrier excitation by a picosecond laser pulse and probing of carrier dynamics at excess carrier densities in the ΔN=1017–1020 cm−3 range by optically or electronically delayed probe pulses, thus providing temporal resolution of 10 ps and 10 ns, respectively. FCA decay kinetics at different excitation levels and subsequent numerical modeling were used to determine the bulk lifetime, surface recombination velocity, and bimolecular (B) and Auger recombination (C) coefficients at 300 K. Bulk lifetimes of ∼800 ns and ∼65 ns were determined in 4H and 3C epitaxial layers, respectively. The numerical fitting of FCA kinetics in the 4H layer provided values of B=(1.2±0.4)×10−12 cm3/s and C=(7±4)×10−31 cm6/s at lower excitations while the Auger coefficient d...

Optical monitoring of nonequilibrium carrier lifetime in freestanding GaN by time-resolved four-wave mixing and photoluminescence techniques

Optical monitoring of nonequilibrium carrier dynamics was performed in freestanding GaN. Four-wave mixing kinetics directly provided carrier lifetime of 5.4ns in the layer, while complementary measurements by photoluminescence technique revealed the fast transients with subnanosecond decay time. Numerical modeling of photoluminescence decay taking into account the carrier spatial-temporal dynamics allowed us to attribute an origin of the fast photoluminescence transients to carrier diffusion to the bulk and to reabsorption of the backward emission. The studies demonstrated carrier diffusion limited applicability of the time-resolved photoluminescence technique for carrier lifetime measurements in a high quality thick III-nitride layers.

Carrier dynamics in bulk GaN

Carrier dynamics in hydride vapor phase epitaxy grown bulk GaN with very low density of dislocations, 5–8 × 105 cm−2, have been investigated by time-resolved photoluminescence (PL), free carrier absorption, and light-induced transient grating techniques in the carrier density range of 1015 to ∼1019 cm−3 under single and two photon excitation. For two-photon carrier injection to the bulk (527 nm excitation), diffusivity dependence on the excess carrier density revealed a transfer from minority to ambipolar carrier transport with the ambipolar diffusion coefficient Da saturating at 1.6 cm2/s at room temperature. An extremely long lifetime value of 40 ns, corresponding to an ambipolar diffusion length of 2.5 μm, was measured at 300 K. A nearly linear increase of carrier lifetime with temperature in the 80–800 K range and gradual decrease of D pointed out a prevailing mechanism of diffusion-governed nonradiative recombination due to carrier diffusive flow to plausibly the grain boundaries. Under single photon...

The determination of high-density carrier plasma parameters in epitaxial layers, semi-insulating and heavily doped crystals of 4H-SiC by a picosecond four-wave mixing technique

We applied a picosecond four-wave mixing technique for measurements of carrier lifetimes and diffusion coefficients in highly excited epitaxial layers, semi-insulating and heavily doped 4H-SiC substrates. Optical carrier injection at two different wavelengths (266 and 355 nm) allowed us to vary the depth of the excited region from 1–2 µm to 50 µm, and thus determine photoelectric parameters of carrier plasma in the density range from 2 × 1016 to 1019 cm−3. Strong dependence of carrier lifetime and mobility on carrier density was found in the epitaxial layers. The origin of fast decay components, not resolved previously by photoluminescence and free-carrier absorption techniques in SiC, was attributed to nonlinear carrier recombination. Numerical modelling provided a value of bimolecular recombination coefficient equal to B = (2–4) × 10−11 cm3 s−1 and verified a surface recombination velocity S = 4 × 104 cm s−1. In heavily doped crystals, nonlinear carrier recombination reduced the carrier lifetime down to 1.1 ns, while in semi-insulating ones a lifetime of 1.5–2.5 ns was measured. Temperature dependences of four-wave mixing provided monopolar carrier mobility in heavily doped and bipolar one in semi-insulating crystals, and revealed the contribution of ionized impurity and phonon scattering mechanisms.

Diffusion-driven and excitation-dependent recombination rate in blue InGaN/GaN quantum well structures

We report on diffusion-driven and excitation-dependent carrier recombination rate in multiple InGaN/GaN quantum wells by using photoluminescence, light-induced absorption, and diffraction techniques. We demonstrate gradually increasing with excitation carrier diffusivity and its correlation with the recombination rate. At low carrier densities, an increase in radiative emission and carrier lifetime was observed due to partial saturation of non-radiative recombination centers. However, at carrier densities above ∼5 × 1018 cm−3, a typical value of photoluminescence efficiency droop, a further increase of diffusivity forces the delocalized carriers to face higher number of fast non-radiative recombination centers leading to an increase of non-radiative losses.

Hole diffusivity in GaAsBi alloys measured by a picosecond transient grating technique

We applied a time-resolved transient grating technique for investigation of nonequilibrium carrier dynamics in GaAs1−xBix alloys with x=0.025–0.063. The observed decrease in carrier bipolar diffusivity with lowering temperature and its saturation below 80 K revealed a strong localization of nonequilibrium holes. Thermal activation energy ΔEa=46 meV of diffusivity and low hole mobility value μh=10–20 cm2/V s at room temperature confirmed the hybridization model of the localized Bi states with the valence band of GaAs. Nonlinear increase in carrier recombination rate with the Bi content, 1/τR∝Bi(x)3.2 indicated an increasing structural disorder in the alloy.

Diffusion-limited nonradiative recombination at extended defects in hydride vapor phase epitaxy GaN layers

Time-resolved free-carrier absorption and transient grating techniques were applied to determine carrier lifetimes and diffusion coefficients in a set of hydride vapor phase epitaxy GaN layers of various thickness (from 10 to 145 μm). A linear increase in nonradiative carrier lifetime in 80–800 K range found to be in a correlation with decrease of the bipolar carrier diffusion coefficient. This correlation confirmed that recombination rate is governed by carrier diffusive flow to the grain boundaries of columnar defects. A model of diffusion-governed nonradiative lifetime was proposed for fitting the measured lifetime values in the layers of different thickness as well as lifetime dependence on temperature or threading dislocation density.

Improved quantum efficiency in InGaN light emitting diodes with multi-double-heterostructure active regions

InGaN light emitting diodes (LEDs) with multiple thin double-heterostrucutre (DH) active regions separated by thin and low energy barriers were investigated to shed light on processes affecting the quantum efficiency and means to improve it. With increasing number of 3 nm-thick DH active layers up to four, the electroluminescence efficiency scaled nearly linearly with the active region thickness owing to reduced carrier overflow with increasing total thickness, showing almost no discernible efficiency degradation at high injection levels up to the measured current density of 500 A/cm2. Comparison of the resonant excitation dependent photoluminescence measurements at 10 K and room temperature also confirmed that further increasing the number of DH layers beyond six results in degradation of the material quality, and therefore, increasing nonradiative recombination. Using multiple DH active regions is shown to be a superior approach for quantum efficiency enhancement compared with simply increasing the sing...

Anisotropy of free-carrier absorption and diffusivity in m-plane GaN

Polarization-dependent free-carrier absorption (FCA) in bulk m-plane GaN at 1053 nm revealed approximately 6 times stronger hole-related absorption for E⊥c than for E||c probe polarization both at low and high carrier injection levels. In contrast, FCA at 527 nm was found isotropic at low injection levels due to electron resonant transitions between the upper and lower conduction bands, whereas the anisotropic impact of holes was present only at high injection levels by temporarily blocking electron transitions. Carrier transport was also found to be anisotropic under two-photon excitation, with a ratio of 1.17 for diffusivity perpendicular and parallel to the c-axis.