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Dive into the research topics where Khalid Kandoussi is active.

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Featured researches published by Khalid Kandoussi.


Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors 3 | 2011

(Invited) Similarities between [micro sign]c-Si TFT with Very Thin Active Layer and FD-SOI FETs

Tayeb Mohammed-Brahim; Khalid Kandoussi; Khaled Belarbi; Hervé Lhermite; Nathalie Coulon

The subthreshold slope of microcrystalline silicon Thin Film Transistor is shown to be highly improved when the thickness of the active layer is enough decreased. In the same manner, the threshold voltage of these TFTs with very thin active layer is shown to be controlled dynamically with high efficiency by a second gate in front of the first one. These behaviours are explained considering the similarities between these TFTs and fully depleted SOI-MOSFETs as well as with dual-gate SOI-MOSFETS.


ECS Transactions | 2011

(Invited) Similarities between µc-Si TFT with Very Thin Active Layer and FD-SOI FETs

Tayeb Mohammed-Brahim; Khalid Kandoussi; Khaled Belarbi; Hervé Lhermite; Nathalie Coulon

The subthreshold slope of microcrystalline silicon Thin Film Transistor is shown to be highly improved when the thickness of the active layer is enough decreased. In the same manner, the threshold voltage of these TFTs with very thin active layer is shown to be controlled dynamically with high efficiency by a second gate in front of the first one. These behaviours are explained considering the similarities between these TFTs and fully depleted SOI-MOSFETs as well as with dual-gate SOI-MOSFETS.


2011 International Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors (ULSIC vs. TFT) | 2011

Similarities between µc-Si TFT with Very Thin Active Layer and FD-SOI FETs

Tayeb Mohammed-Brahim; Khalid Kandoussi; Khaled Belarbi; Hervé Lhermite; Nathalie Coulon

The subthreshold slope of microcrystalline silicon Thin Film Transistor is shown to be highly improved when the thickness of the active layer is enough decreased. In the same manner, the threshold voltage of these TFTs with very thin active layer is shown to be controlled dynamically with high efficiency by a second gate in front of the first one. These behaviours are explained considering the similarities between these TFTs and fully depleted SOI-MOSFETs as well as with dual-gate SOI-MOSFETS.


Journal of Non-crystalline Solids | 2006

Improved microcrystalline silicon TFTs

Khalid Kandoussi; Arc'Hanmael Gaillard; Nathalie Coulon; Tanguy Pier; Tayeb Mohammed-Brahim


Journal of Non-crystalline Solids | 2008

Nanocrystalline silicon TFT process using silane diluted in argon-hydrogen mixtures

Khalid Kandoussi; Nathalie Coulon; Khaled Belarbi; Tayeb Mohammed-Brahim


Journal of Non-crystalline Solids | 2008

Excimer laser crystallization of microcrystalline silicon for TFTs on flexible substrate

Tanguy Pier; Khalid Kandoussi; Nathalie Coulon; Tayeb Mohammed-Brahim; Hervé Lhermite


Journal of Non-crystalline Solids | 2006

Undoped and arsenic-doped low temperature (∼165 °C) microcrystalline silicon for electronic devices process

Khalid Kandoussi; Nathalie Coulon; Tayeb Mohammed-Brahim; Alain Moréac


Physica Status Solidi (c) | 2008

Excimer laser annealing of microcrystalline silicon

Tanguy Pier; Khalid Kandoussi; Nathalie Coulon; Tayeb Mohammed-Brahim; Hervé Lhermite


Thin Solid Films | 2007

Microcrystalline silicon and excimer laser crystallized silicon Thin Film Transistors on the same substratel

Tanguy Pier; Khalid Kandoussi; Nathalie Coulon; Hervé Lhermite; Tayeb Mohammed-Brahim; Jean-François Bergamini


Solid-state Electronics | 2011

Highly controllable dual-gate microcrystalline silicon thin film transistor processed at low temperature (T < 180 °C)

Khalid Kandoussi; Emmanuel Jacques; Nathalie Coulon; Tayeb Mohammed-Brahim

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Rabah Cherfi

Centre national de la recherche scientifique

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