Kimio Suzuki
Toshiba
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Publication
Featured researches published by Kimio Suzuki.
Proceedings of SPIE, the International Society for Optical Engineering | 1999
Toru Tojo; Ryoji Yoshikawa; Yoji Ogawa; Shuichi Tamamushi; Yoshiaki Hattori; Souji Koikari; Hideo Kusakabe; Takayuki Abe; Munehiro Ogasawara; Kiminobu Akeno; Hirohito Anze; Kiyoshi Hattori; Ryoichi Hirano; Shusuke Yoshitake; Tomohiro Iijima; Kenji Ohtoshi; Kazuto Matsuki; Naoharu Shimomura; Noboru Yamada; Hitoshi Higurashi; Noriaki Nakayamada; Yuuji Fukudome; Shigehiro Hara; Eiji Murakami; Takashi Kamikubo; Yasuo Suzuki; Susumu Oogi; Mitsuko Shimizu; Shinsuke Nishimura; Hideyuki Tsurumaki
Toshiba and Toshiba Machine have developed an advanced electron beam writing system EX-11 for next-generation mask fabrication. EX-11 is a 50 kV variable-shaped beam lithography system for manufacturing 4x masks for 0.15 - 0.18 micrometer technology generation. Many breakthroughs were studied and applied to EX-11 to meet future mask-fabrication requirements, such as critical dimension and positioning accuracy. We have verified the accuracy required for 0.15 - 0.18 micrometer generation.
Archive | 1983
Kimio Suzuki; Jitsuo Toda; Wataru Shimizu
Archive | 1986
Norihiro Iwamoto; Hiroyuki Tsuboi; Yoshitami Hakata; Kimio Suzuki
Archive | 1983
Kimio Suzuki; Jitsuo Toda; Wataru Shimizu
Archive | 1984
Yoshitami Hakata; Masanori Wakuda; Kimio Suzuki
Archive | 1991
Makoto Hayashi; Shizunori Kaneko; Mitsuhiko Iida; Mutsumi Naniwa; Seiichi Tsuchiya; Kimio Suzuki
Archive | 1991
Makoto Hayashi; Shizunori Kaneko; Mitsuhiko Iida; Mutsumi Naniwa; Seiichi Tsuchiya; Kimio Suzuki
Archive | 2000
Kimio Suzuki
Archive | 1991
Makoto Hayashi; Shizunori Kaneko; Mitsuhiko Iida; Mutsumi Naniwa; Seiichi Tsuchiya; Kimio Suzuki
Archive | 1991
Makoto Hayashi; Shizunori Kaneko; Mitsuhiko Iida; Mutsumi Naniwa; Seiichi Tsuchiya; Kimio Suzuki
