Kojiro Hara

Reactions of surface hydrogen on amorphous carbon films with hydrogen plasma

Reactions of surface hydrocarbon components exposed to hydrogen plasma at a substrate temperature of 200 °C were investigated by in-situ infrared spectroscopy, and changes in film thickness were measured. Both the concentration of hydrocarbon components and film thickness decreased because of the hydrogen plasma exposure. The decrease in the former was larger than that in the latter. These results indicate that the abstraction effect of surface hydrogen, as well as the etching effect, was enhanced at 200 °C.

Infrared spectroscopic study on hydrogen plasma induced surface reaction

We used infrared spectroscopy in multiple internal reflection geometry (MIR-IRAS) to investigate the reactions of hydrogen plasma with Si crystal. By hydrogen plasma exposure hydrogen was inserted into the Si crystal, with the changes in the atomic arrangements of Si crystal.