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Kousuke Suzuki

Nikon

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Publication

Featured researches published by Kousuke Suzuki.

Optical Microlithography XVI | 2003

Aberration optimizing system using Zernike sensitivity method

Yasuo Shimizu; Tadashi Yamaguchi; Kousuke Suzuki; Yuji Shiba; Tomoyuki Matsuyama; Shigeru Hirukawa

We introduce a projection lens adjustment procedure that is customer application oriented. This technique is based on the simulated imaging performance using Zernike sensitivity, the measurement results of wavefront aberration and wavefront change by lens element position change. This system finds the optimum combination of lens position where the amount of specific imaging performance error is in tolerance. In this paper, the idea of optimization and some optimization results are shown.

Archive | 2001

Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method

Tsuneyuki Hagiwara; Naoto Kondo; Eiji Takane; Hiromi Kuwata; Kousuke Suzuki

Archive | 1995

Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors

Tsuneo Miyai; Yuji Imai; Tetsuo Taniguchi; Kousuke Suzuki

Archive | 1998

Projection exposure method and apparatus

Kousuke Suzuki; Minoru Onda

Archive | 2003

IMAGE FORMATION STATE ADJUSTMENT SYSTEM, EXPOSURE METHOD, EXPOSURE APPARATUS, PROGRAM, AND INFORMATION RECORDING MEDIUM

Yasuo Shimizu; Shigeru Hirukawa; Kousuke Suzuki; Tomoyuki Matsuyama

Archive | 2007

Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium

Yasuo Shimizu; Shigeru Hirukawa; Kousuke Suzuki; Tomoyuki Matsuyama

Archive | 2002

Method for measuring optical feature of exposure apparatus and exposure apparatus having means for measuring optical feature

Kousuke Suzuki; Masayuki Murayama

Archive | 2000

Scanning exposure method accounting for thermal transformation of mask

Kousuke Suzuki

Archive | 2007

Exposure apparatus, exposure method, and device manufacturing method

Kousuke Suzuki

Archive | 2003

Bilderzeugungszustandseinstellsystem, belichtungsverfahren, belichtungsvorrichtung, programm und informationsaufzeichnungsmedium

Yasuo Shimizu; Shigeru Hirukawa; Kousuke Suzuki; Tomoyuki Matsuyama

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Shigeru Hirukawa

Nikon

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Tomoyuki Matsuyama

Nikon

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Yasuo Shimizu

Nikon

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Eiji Takane

Nikon

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Hiromi Kuwata

Nikon

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Masayuki Murayama

Nikon

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Minoru Onda

Nikon

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Naoto Kondo

Nikon

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Tetsuo Taniguchi

Nikon

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Tsuneo Miyai

Nikon

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