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Dive into the research topics where Kousuke Terada is active.

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Featured researches published by Kousuke Terada.


Journal of Applied Physics | 1992

Aging characteristics of ZnS:Mn electroluminescent films grown by a chemical vapor deposition technique

Akiyoshi Mikami; Kousuke Terada; Katsushi Okibayashi; Kouichi Tanaka; Masaru Yoshida; Shigeo Nakajima

The stability of luminance‐voltage characteristics (L‐V) has been investigated on ZnS:Mn electroluminescent films grown by chemical vapor deposition. It is found that the aging pattern varies between the positive shift (P shift) and the negative shift (N shift) with the growth temperature. In both cases the L‐V curve, the current‐voltage relationship, and the symmetry of the light emission with respect to the voltage polarity are strictly cooperative during the aging process. The N shift appears to be dominant when the current is limited by electron injection from the interface, whereas the P shift becomes dominant under the bulk limited conduction, accompanying an excellent symmetry of the emission. A high‐field‐conduction characteristic in the ZnS layer, which is a decisive factor to determine the aging pattern, is significantly affected by its stoichiometry, grain size, and impurity content. It has been further clarified that the N shift consists of the combination of a softening and a shifting in the ...


Journal of Crystal Growth | 1992

Chemical vapor deposition of ZnS : Tb electroluminescent films in a bypass-HCl flow system

Akiyoshi Mikami; Kousuke Terada; Masaru Yoshida; Shigeo Nakajima

Green-emitting ZnS : Tb electroluminescent films have been successfully grown by low-pressure chemical vapor deposition, in which a Tb source is transported as gaseous halide by using a HCl carrier gas. A secondary HCl flow, bypassing the source material, is additionally supplied to the growth ambience. It is shown that the ZnS : Tb film changes from the cubic structure to the hexagonal structure with increasing the bypass-HCl flow rate, whereas the Tb concentration is basically determined by the mass transfer of the Tb-halide. The film growth rate decreases significantly in the presence of the HCl flow, and simultaneously the crystal quality is much improved by the incorporation of the Tb-dopant. Such growth behaviors are explained by supposing two kinds of competetive relations; one is a surface migration process competing between ZnCl2 and an isolated Zn atom, the other is a hexagonal nucleation process competing between TbCl3 and ZnCl2. The critical HCl flow rates to control the crystal structure are completely determined. The growth kinetics and the roles of Tb3+ and Cl- ions are discussed on the basis of the competitive adsorption model.


Archive | 2001

Method of manufacturing color electroluminescent display apparatus and method of bonding light-transmitting substrates

Kousuke Terada; Koichi Tanaka


Archive | 1993

Vapor deposition apparatus for using solid starting materials

Akiyoshi Mikami; Takashi Ogura; Kousuke Terada; Masaru Yoshida; Takuo Yamashita; Koichi Tanaka; Katsushi Okibayashi; Shigeo Nakajima; Hiroaki Nakaya; Kouji Taniguchi


Archive | 1993

Liquid crystal display device having an EL light source in a non-display region or a region besides a display picture element

Katsushi Okibayashi; Kousuke Terada; Akiyoshi Mikami; Hiroyuki Shimoyama


Archive | 1991

Multi-color electroluminescent panel

Kouji Taniguchi; Koichi Tanaka; Kousuke Terada; Akiyoshi Mikami; Masaru Yoshida


Archive | 1991

Method of manufacturing an electroluminescent device

Kousuke Terada; Akiyoshi Mikami; Kouji Taniguchi; Koichi Tanaka; Masaru Yoshida; Shigeo Nakajima


Archive | 1998

Thin film electro-luminescence device

Akiko Sugioka; Noriyuki Takahashi; Isamu Yashima; Makoto Higuchi; Akiyoshi Mikami; Kousuke Terada; Katsuhiro Okada


Archive | 1991

Apparatus for vapor deposition

Koichi Tanaka; Kousuke Terada; Katsushi Okibayashi; Akiyoshi Mikami; Masaru Yoshida; Shigeo Nakajima


Archive | 1991

Process for producing a thin film electroluminescent device

Hiroaki Nakaya; Takuo Yamashita; Takashi Ogura; Kouji Tanaguchi; Koichi Tanaka; Akiyoshi Mikami; Katsushi Okibayashi; Kousuke Terada

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Akiyoshi Mikami

National Archives and Records Administration

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Koichi Tanaka

National Archives and Records Administration

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Katsushi Okibayashi

National Archives and Records Administration

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Shigeo Nakajima

National Archives and Records Administration

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Takashi Ogura

National Archives and Records Administration

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Kouichi Tanaka

National Archives and Records Administration

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