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Dive into the research topics where L. Zimmermann is active.

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Featured researches published by L. Zimmermann.


IEEE Journal of Selected Topics in Quantum Electronics | 2006

CWDM Transmitter Module Based on Hybrid Integration

T. Mitze; M. Schnarrenberger; L. Zimmermann; Jürgen Bruns; Frank Fidorra; Klemens Janiak; J. Kreissl; Sybille Fidorra; Helmut Heidrich; Klaus Petermann

A simple concept for hybrid integration and packaging of III/V active devices in a multipurpose optical platform is introduced. The board could be used as a coarse wavelength-division multiplexing transmitter with four lasers or as a receiver with photodiodes, respectively. The assembly ensures ample heat dissipation, so the laser performance does not suffer after the packaging


international conference on group iv photonics | 2004

Facet preparation of SOI waveguides by etching and cleaving compared to dicing and polishing

M. Schnarrenberger; L. Zimmermann; T. Mitze; Jürgen Bruns; Klaus Petermann

We compared two different techniques of facet preparation of silicon-on-insulator (SOI) waveguides: The conventional by dicing and polishing and our proposed by dry etching the facets and cleaving along anisotropically etched cleaving grooves.


international conference on group iv photonics | 2005

Mach-Zehnder interferometer (MZI) with more than 20 dB extinction ratio on silicon-on-insulator

M. Schnarrenberger; L. Zimmermann; T. Mitze; Jürgen Bruns; Klaus Petermann

We have fabricated an MZI with more than 20 dB extinction ratio on SOI serving for the high demands of differential phase shift keying (DPSK) receivers with the capability of fast thermo-optic tuneability.


IEEE Photonics Technology Letters | 2006

Low Loss Star Coupler Concept for AWGs in Rib Waveguide Technology

M. Schnarrenberger; L. Zimmermann; T. Mitze; Karsten Voigt; Jürgen Bruns; Klaus Petermann

We introduce a new concept for a tapered transition between waveguides and a free propagation region (FPR) for rib waveguide technology. The optical field is pressed downwards to the lower part of the guiding layer by tapering off the waveguide. The subsequent FPR is also etched down to the lower part of the guiding layer, which results in an adiabatic transition from the waveguide to the slab. Arrayed waveguide gratings, designed with this technique, were fabricated in silicon-on-insulator and showed a reduction in insertion loss of about 2.5 dB


international conference on group iv photonics | 2004

A new and simple concept for self-aligned hybrid integration in silicon on insulator (SOI)

T. Mitze; M. Schnarrenberger; L. Zimmermann; Jürgen Bruns; F. Fidorra; F. Kreissl; Klemens Janiak; Helmut Heidrich; Klaus Petermann

A concept for a SOI motherboard is introduced. AuSn solder technology is used for hybrid integration. The device adjustment on the board is realised by passive self-alignment. First results on fabricated boards are very encouraging.


international conference on group iv photonics | 2007

SOI Delay Interferometer with Tuned Polarization Dependent Wavelength Shift for 40 Gbit/s DPSK Demodulation

Karsten Voigt; L. Zimmermann; Georg Winzer; T. Mitze; Jürgen Bruns; Klaus Petermann; C. Schubert

An SOI delay interferometer (DI) manufactured in 4 mum rib waveguide technology with tuned polarization dependent wavelength (PDWL) shift is presented. CW device performance & DPSK demodulation functionality in a 40 Gbits testbed are demonstrated.


lasers and electro optics society meeting | 2005

Study of reactive ion etched (RIE) facets of silicon- on-insulator (SOI) rip waveguides

L. Zimmermann; M. Schnarrenberger; T. Mitze; Jürgen Bruns; Klaus Petermann

In our study we compare the quality of dry etched rip waveguide facets to facets prepared by a conventional polishing technique. Linear SOI waveguide arrays were fabricated on BESOI (bonded and etched-back SOI) material with a silicon top-layer of H = 4 /spl mu/m. We used standard contact lithography for patterning and a commercial RIE system for waveguide and facet etching. We studied different process flows (facet-first and rip-first), different masking materials and loading effects on the wafer. The surface of the facets was characterized by high resolution scanning electron microscopy (SEM). The additional coupling loss introduced by the process flow and by the etching conditions as well as the impact of the two on uniformity of the waveguide transmission were quantified by means of fiber-to-fiber optical measurements (at 1.55 /spl mu/m).


international conference on group iv photonics | 2006

Concept for an Alternative Solder-Free Flip-Chip Technique on SOI using Black-Silicon

M. Schnarrenberger; L. Zimmermann; T. Mitze; Karsten Voigt; Jürgen Bruns; K. Peter

Black-silicon regions are defined on an SOI board and covered with an adhesion layer. The contacts of to be mounted devices are pushed towards these regions, to establish a mechanical, electrical, and thermal contact


international conference on group iv photonics | 2006

CWDM Transmitter Board based on SOI

Jürgen Bruns; T. Mitze; M. Schnarrenberger; L. Zimmermann; M. Krieg; J. Kreissl; Klemens Janiak; T. Hartwich; Klaus Petermann

A CWDM transmitter board based on SOI is demonstrated. Active III/V components are integrated using Au/Sn solder technology and passive alignment. Precise mounting of lasers on the board is necessary to ensure low coupling losses


international conference on group iv photonics | 2005

Hybrid integration of III/V lasers on a silicon-on-insulator (SOI) optical board

T. Mitze; M. Schnarrenberger; L. Zimmermann; Jürgen Bruns; F. Fidorra; J. Kreissl; Klemens Janiak; Sybille Fidorra; Helmut Heidrich; Klaus Petermann

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Jürgen Bruns

Technical University of Berlin

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T. Mitze

Technical University of Berlin

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Klaus Petermann

Technical University of Berlin

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M. Schnarrenberger

Technical University of Berlin

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Karsten Voigt

Technical University of Berlin

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Georg Winzer

Technical University of Berlin

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C. Schubert

Technical University of Berlin

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