Laurent Pizzagalli

Ab initio molecular dynamics calculations of threshold displacement energies in silicon carbide

Using first principles molecular dynamics simulations, we have determined the threshold displacement energies and the associated created defects in cubic silicon carbide. Contrary to previous studies using classical molecular dynamics, we found values close to the experimental consensus, and also created defects in good agreement with recent works on interstitials stability in silicon carbide. We carefully investigated the limits of this approach. Our work shows that it is possible to calculate displacement energies with first principles accuracy in silicon carbide, and suggests that it may be also the case for other covalent materials.

Structure and stability of germanium nanoparticles

In order to tailor the properties of nanodots, it is essential to separate the effects of quantum confinement from those due to the surface, and to determine the mechanisms by which preparation conditions can influence the properties of the dot. We address these issues for the case of small Ge clusters (1--2.5 nm), using a combination of empirical and first-principles molecular-dynamics techniques. Our results show that over a wide temperature range, the diamond structure is more stable than tetragonal-like structures for clusters containing more than 40 atoms; however, the magnitude of the energy difference is strongly dependent on the structure and termination of the surface. On the basis of our calculations, we propose a possible mechanism for the formation of metastable tetragonal clusters observed in vapor deposition experiments, by cold quenching of amorphous nanoparticles exhibiting unsaturated, reconstructed surfaces.

Evidence of two plastic regimes controlled by dislocation nucleation in silicon nanostructures

We performed molecular dynamics simulations of silicon nanostructures submitted to various stresses and temperatures. For a given stress orientation, a transition in the onset of silicon plasticity is revealed depending on the temperature and stress magnitude. At high temperature and low stress, partial dislocation loops are nucleated in the {111} glide set planes. But at low temperature and very high stress, perfect dislocation loops are formed in the other set of {111} planes called shuffle. This result confirmed by three different classical potentials suggests that plasticity in silicon nanostructures could be controlled by dislocation nucleation.

Dislocation formation from a surface step in semiconductors: An ab initio study

The role of a simple surface defect, such as a step, for relaxing the stress applied to a semiconductor, has been investigated by means of large-scale first-principles calculations. Our results indicate that the step is the privileged site for initiating plasticity, with the formation and glide of 60 degrees dislocations for both tensile and compressive deformations. We have also examined the effect of surface and step termination on the plastic mechanisms.

Comparison between classical potentials and ab initio methods for silicon under large shear

The homogeneous shear of the {111} planes along the direction of bulk silicon has been investigated using ab initio techniques, to better understand the strain properties of both shuffle and glide set planes. Similar calculations have been done with three empirical potentials, Stillinger–Weber, Tersoff and EDIP, in order to find the one giving the best results under large shear strains. The generalized stacking fault energies have also been calculated with these potentials to complement this study. It turns out that the Stillinger–Weber potential better reproduces the ab initio results, for the smoothness and the amplitude of the energy variation as well as the localization of shear in the shuffle set.

A new parametrization of the Stillinger–Weber potential for an improved description of defects and plasticity of silicon

A new parametrization of the widely used Stillinger-Weber potential is proposed for silicon, allowing for an improved modelling of defects and plasticity-related properties. The performance of the new potential is compared to the original version, as well as to another parametrization (Vink et al 2001 J. Non-Cryst. Solids, 282 248), in the case of several situations: point defects and dislocation core stability, threshold displacement energies, bulk shear, generalized stacking fault energy surfaces, fracture, melting temperature, amorphous structure, and crystalline phase stability. A significant improvement is obtained in the case of dislocation cores, bulk behaviour under high shear stress, the amorphous structure, and computation of threshold displacement energies, while most of the features of the original version (elastic constants, point defects) are retained. However, despite a slight improvement, a complex process like fracture remains difficult to model.

Theoretical study of kinks on screw dislocation in silicon

Theoretical calculations of the structure, formation and migration of kinks on a non-dissociated screw dislocation in silicon have been carried out using density functional theory calculations as well as calculations based on interatomic potential functions. The results show that the structure of a single kink is characterized by a narrow core and highly stretched bonds between some of the atoms. The formation energy of a single kink ranges from 0.9 to 1.36 eV, and is of the same order as that for kinks on partial dislocations. However, the kinks migrate almost freely along the line of an undissociated dislocation unlike what is found for partial dislocations. The effect of stress has also been investigated in order to compare with previous silicon deformation experiments which have been carried out at low temperature and high stress. The energy barrier associated with the formation of a stable kink pair becomes as low as 0.65 eV for an applied stress on the order of 1 GPa, indicating that displacements of screw dislocations likely occur via thermally activated formation of kink pairs at room temperature.

First principles determination of the Peierls stress of the shuffle screw dislocation in silicon

The Peierls stress of the a/2⟨110⟩ screw dislocation belonging to the shuffle set is calculated for silicon using density functional theory. We have checked the effect of boundary conditions by using two models, the supercell method where one considers a periodic array of dislocations, and the cluster method where a single dislocation is embedded in a small cluster. The Peierls stress is underestimated with the supercell and overestimated with the cluster. These contributions have been calculated and the Peierls stress is determined in the range between 2.4 × 10−2 and 2.8 × 10−2 eV Å−3. When moving, the dislocation follows the {111} plane going through a low energy metastable configuration and never follows the 100 plane, which includes a higher energy metastable core configuration.

Glissile dislocations with transient cores in silicon.

We report an unexpected characteristic of dislocation cores in silicon. Using first-principles calculations, we show that all of the stable core configurations for a nondissociated 60 degrees dislocation are sessile. The only glissile configuration, previously obtained by nucleation from surfaces, surprisingly corresponds to an unstable core. As a result, the 60 degrees dislocation motion is solely driven by stress, with no thermal activation. We predict that this original feature could be relevant in situations for which large stresses occur, such as mechanical deformation at room temperature. Our work also suggests that postmortem observations of stable dislocations could be misleading and that mobile unstable dislocation cores should be taken into account in theoretical investigations.

In situ probing of helium desorption from individual nanobubbles under electron irradiation

The understanding of the mechanisms of helium bubble formation and evolution in materials requires the quantitative determination of several key quantities such as the helium density in the bubbles. Helium nanobubbles of about 16 nm in diameter were created in silicon by helium implantation at high fluence and subsequent annealing. Individual nanobubbles were analyzed by spatially resolved Electron Energy-loss Spectroscopy (EELS). We report on the in situ probing of helium desorption from the nanobubbles under electron irradiation. This opens new perspectives for a more accurate determination of the helium density through spatially resolved EELS.