Le Si Dang

Bose-Einstein condensation of exciton polaritons

Phase transitions to quantum condensed phases—such as Bose–Einstein condensation (BEC), superfluidity, and superconductivity—have long fascinated scientists, as they bring pure quantum effects to a macroscopic scale. BEC has, for example, famously been demonstrated in dilute atom gas of rubidium atoms at temperatures below 200 nanokelvin. Much effort has been devoted to finding a solid-state system in which BEC can take place. Promising candidate systems are semiconductor microcavities, in which photons are confined and strongly coupled to electronic excitations, leading to the creation of exciton polaritons. These bosonic quasi-particles are 109 times lighter than rubidium atoms, thus theoretically permitting BEC to occur at standard cryogenic temperatures. Here we detail a comprehensive set of experiments giving compelling evidence for BEC of polaritons. Above a critical density, we observe massive occupation of the ground state developing from a polariton gas at thermal equilibrium at 19 K, an increase of temporal coherence, and the build-up of long-range spatial coherence and linear polarization, all of which indicate the spontaneous onset of a macroscopic quantum phase.

High-temperature ultrafast polariton parametric amplification in semiconductor microcavities

Cavity polaritons, the elementary optical excitations of semiconductor microcavities, may be understood as a superposition of excitons and cavity photons. Owing to their composite nature, these bosonic particles have a distinct optical response, at the same time very fast and highly nonlinear. Very efficient light amplification due to polariton–polariton parametric scattering has recently been reported in semiconductor microcavities at liquid-helium temperatures. Here we demonstrate polariton parametric amplification up to 120 K in GaAlAs-based microcavities and up to 220 K in CdTe-based microcavities. We show that the cut-off temperature for the amplification is ultimately determined by the binding energy of the exciton. A 5-µm-thick planar microcavity can amplify a weak light pulse more than 5,000 times. The effective gain coefficient of an equivalent homogeneous medium would be 107 cm-1. The subpicosecond duration and high efficiency of the amplification could be exploited for high-repetition all-optical microscopic switches and amplifiers. 105 polaritons occupy the same quantum state during the amplification, realizing a dynamical condensate of strongly interacting bosons which can be studied at high temperature.

GaN/AlN short-period superlattices for intersubband optoelectronics: A systematic study of their epitaxial growth, design, and performance

We have studied the effect of growth and design parameters on the performance of Si-doped GaN/AlN multiquantum-well (MQW) structures for intersubband optoelectronics in the near infrared. The samples under study display infrared absorption in the 1.3–1.9 μm wavelength range, originating from the photoexcitation of electrons from the first to the second electronic level in the QWs. A commonly observed feature is the presence of multiple peaks in both intersubband absorption and interband emission spectra, which are attributed to monolayer thickness fluctuations in the quantum wells. These thickness fluctuations are induced by dislocations and eventually by cracks or metal accumulation during growth. The best optical performance is attained in samples synthesized with a moderate Ga excess during the growth of both the GaN QWs and the AlN barriers without growth interruptions. The optical properties are degraded at high growth temperatures (>720 °C) due to the thermal activation of the AlN etching of GaN. Fr...

Critical thickness in epitaxial CdTe/ZnTe

The critical thickness for coherent growth of CdTe on ZnTe by molecular beam epitaxy is assessed by reflection high‐energy electron diffraction, low‐temperature photoluminescence, and transmission electron microscopy. The value is found to be 5 monolayers for this high mismatch system (6%). As opposed to similar studies on III‐V and Si‐Ge systems, there is no evidence of island formation before relaxation by dislocations at the interface.

Si-doped GaN∕AlN quantum dot superlattices for optoelectronics at telecommunication wavelengths

We report on the controlled growth by molecular beam epitaxy of 20-period Si-doped GaN∕AlN quantum dot (QD) superlattices, in order to tailor their intraband absorption within the 1.3–1.55μm telecommunication spectral range. The QD size can be tuned by modifying the amount of GaN in the QDs, the growth temperature, or the growth interruption time (Ostwald ripening). By adjusting the growth conditions, QDs with height (diameter) within the range of 1–1.5nm (10–40nm), and density between 1011 and 1012cm−2 can be synthesized, fully strained on the AlN pseudosubstrate. To populate the first electronic level, silicon can be incorporated into the QDs without significant perturbation of the QD morphology. All the samples exhibit strong p-polarized intraband absorption at room temperature. The broadening of the absorption peak remains below 150meV and can be as small as ∼80meV. This absorption line is attributed to transition from the s ground level of the QD to the first excited level along the growth axis, pz. ...

Optical detection of cyclotron resonance of electron and holes in CdTe

Abstract Cyclotron resonance of electron and holes have been optically detected at 70 GHz and at 1.8 K in n-type CdTe. The bare effective masses, in unit of the free electron mass, are found to be: m ∗ = 0.088 ± 0.004 , m ∗ lh = 0.12 ± 0.01 , m ∗ = 0.60 ± for H // , and m ∗ e = 0.089 0.004 , m ∗ lh = 0.11 ± 0.01 , m ∗ hh = 0.69 ± 0.02 for H // . The Luttinger valence band parameters deduced from these measurements are: γ1 = 5.3 ± 0.5, γ2 = 1.7 ± 0.3 and γ3 = 2.0 ± 0.3, in fair agreement with the calculations of Lawaetz.

Surfactant effect of In for AlGaN growth by plasma-assisted molecular beam epitaxy

In this article, the surfactant capability of In for AlGaN growth by plasma-assisted molecular beam epitaxy has been assessed. We have determined the range of substrate temperatures and In fluxes to form a self-regulated 1×1 In adlayer on AlxGa1−xN(0001). The presence of this In film favors two-dimensional growth of AlGaN under stoichiometric conditions. The formation of metal droplets on the surface is inhibited. In incorporation, if any, is lower than 0.01%. The structural quality of the layers is verified by high-resolution x-ray diffraction, both in symmetric and asymmetric reflections.In this article, the surfactant capability of In for AlGaN growth by plasma-assisted molecular beam epitaxy has been assessed. We have determined the range of substrate temperatures and In fluxes to form a self-regulated 1×1 In adlayer on AlxGa1−xN(0001). The presence of this In film favors two-dimensional growth of AlGaN under stoichiometric conditions. The formation of metal droplets on the surface is inhibited. In incorporation, if any, is lower than 0.01%. The structural quality of the layers is verified by high-resolution x-ray diffraction, both in symmetric and asymmetric reflections.

High-reflectivity GaN/GaAlN Bragg mirrors at blue/green wavelengths grown by molecular beam epitaxy

Highly-reflective GaN/GaAlN quarter-wave Bragg mirrors, designed to be centered at blue/green wavelengths, have been grown by molecular beam epitaxy. The reflectivity for a mirror centered at 473 nm was as high as 93% and the bandwidth reached 22 nm. Detailed x-ray diffraction measurements allowed us to characterize the structural parameters of the Bragg mirrors. We show that, in spite of substantial strain relaxation occurring in our samples, high reflectivity is still possible. In addition, we show that growth interruption at the heterointerfaces is crucial for achieving high reflectivities.

Submicrometre resolved optical characterization of green nanowire-based light emitting diodes

The electroluminescent properties of InGaN/GaN nanowire-based light emitting diodes (LEDs) are studied at different resolution scales. Axial one-dimensional heterostructures were grown by plasma-assisted molecular beam epitaxy (PAMBE) directly on a silicon (111) substrate and consist of the following sequentially deposited layers: n-type GaN, three undoped InGaN/GaN quantum wells, p-type AlGaN electron blocking layer and p-type GaN. From the macroscopic point of view, the devices emit light in the green spectral range (around 550 nm) under electrical injection. At 100 mA DC current, a 1 mm2 chip that integrates around 10(7) nanowires emits an output power on the order of 10 µW. However, the emission of the nanowire-based LED shows a spotty and polychromatic emission. By using a confocal microscope, we have been able to improve the spatial resolution of the optical characterizations down to the submicrometre scale that can be assessed to a single nanowire. Detailed μ-electroluminescent characterization (emission wavelength and output power) over a representative number of single nanowires provides new insights into the vertically integrated nanowire-based LED operation. By combining both μ-electroluminescent and μ-photoluminescent excitation, we have experimentally shown that electrical injection failure is the major source of losses in these nanowire-based LEDs.

GaN quantum dots doped with Eu

Molecular-beam-epitaxy growth of Eu-doped GaN quantum dots embedded in AlN has been achieved. The crucial issue of Eu location has been addressed by extended x-ray absorption fine structure measurements. By comparing the signature of the Eu short-range environment for several samples, it is concluded that Eu is mostly incorporated in GaN dots. Intense cathodoluminescence associated with Eu has been measured, with no GaN bandedge emission, evidence that carrier recombination mostly occurs through rare-earth ion excitation. Persistent photoluminescence of Eu-doped GaN quantum dots as a function of the temperature is suggested to be further confirmation of the recombination of confined carriers through Eu ion excitation.