Li Jiajun

Nano-Crystalline Diamond Films Grown by Radio-Frequency Inductively Coupled Plasma Jet Enhanced Chemical Vapor Deposition*

Radio-frequency inductively coupled plasma jet is utilized to grow diamond films to combine the advantages of clean deposition environment and large deposition area. Before diamond growth, the simulation of deposition environment is studied to understand the flow field and the properties of the plasma. The optical emission spectra (OES) are also applied to diagnose the rf plasma. The plasma density ne and the electron temperature Te deduced from the data measured by OES are about 1.0 × 1014 l/cm3 and 1.4 eV, which are in good agreement with the data calculated in the simulation. Based on the data from both simulation and measurement, the optimized growth parameters are determined to grow diamond films. Nano-crystalline diamond with cauliflower-like morphology is obtained. The crystalline feature and impurity of as-grown films are also studied.

Nano-Crystalline Diamond Films with Pineapple-Like Morphology Grown by the DC Arcjet vapor Deposition Method

A nano-crystlline diamond film is grown by the dc arcjet chemical vapor deposition method. The film is characterized by scanning electron microscopy, high-resolution transmission electron microscopy (HRTEM), x-ray diffraction (XRD) and Raman spectra, respectively. The nanocrystalline grains are averagely with 80 nm in the size measured by XRD, and further proven by Raman and HRTEM. The observed novel morphology of the growth surface, pineapple-like morphology, is constructed by cubo-octahedral growth zones with a smooth faceted top surface and coarse side surfaces. The as-grown film possesses (100) dominant surface containing a little amorphous sp2 component, which is far different from the nano-crystalline film with the usual cauliflower-like morphology.