Ling-Hui Wu

Comparative study of Ar-implanted Ti-Zr-V non-evaporable getter films on the Al-alloy substrate

Original and Ar-implanted Ti-Zr-V non-evaporable getter (NEG) films were characterized using scanning electron microscope, X-ray diffractometer, electron spectroscopy for chemical analysis, and transmission electron microscopy. Similar properties and results were observed in the surface morphology, the composition, and the crystalline structure for original and implanted Ti-Zr-V films. However, the thermal activation temperature were increased for implanted films. The analysis of implanted Ti-Zr-V films revealed that defects formed in the upper layers of the films can trap diffused gaseous atoms from the surface into the Ti-Zr-V films. Therefore, the thermal activation reaction of Ti-Zr-V films would be affected due to implantation-induced defects in the films. We show directly that the thermal activation reaction of Ti-Zr-V films are changed by the existence of defects in the getter films.Original and Ar-implanted Ti-Zr-V non-evaporable getter (NEG) films were characterized using scanning electron microscope, X-ray diffractometer, electron spectroscopy for chemical analysis, and transmission electron microscopy. Similar properties and results were observed in the surface morphology, the composition, and the crystalline structure for original and implanted Ti-Zr-V films. However, the thermal activation temperature were increased for implanted films. The analysis of implanted Ti-Zr-V films revealed that defects formed in the upper layers of the films can trap diffused gaseous atoms from the surface into the Ti-Zr-V films. Therefore, the thermal activation reaction of Ti-Zr-V films would be affected due to implantation-induced defects in the films. We show directly that the thermal activation reaction of Ti-Zr-V films are changed by the existence of defects in the getter films.

Measurement of the Pressure in the TPS Booster Ring

The booster ring of Taiwan Photon Source (TPS) is designed to provide full energy injection 3 GeV ramped up from 150 MeV with a small beam emittance. It is a synchrotron accelerator of circumference 496.8 m. The vacuum chamber through the magnets is made of thin stainless-steel tube extruded to an elliptical cross section of inner diameters 35 mm and 20 mm, and thickness 0.7 mm. The other chambers have standard 35CF round tube. The vacuum system was baked in the first installation. Because the residual stress of the stainless-steel elliptical tubing caused the magnetic field to become unstable, all elliptical tubing was removed for annealing to proceed, and reinstalled without baking. The ultimate pressure and data for the residual gas are shown as follows.