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Lowack Klaus

Infineon Technologies

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Publication

Featured researches published by Lowack Klaus.

Archive | 2004

DIELECTRIC MATERIAL HAVING BARRIER EFFECT ON DIFFUSION OF COPPER

Sezi Recai; Walther Andreas; Maltenberger Anna; Lowack Klaus

Archive | 2006

Rough and fine structures transferring method for dynamic random access memory substrate, involves mapping structures with different lithography techniques in resist using positive lacquer and providing negative lacquer based on epoxy resin

Kirch Oliver; Domke Wolf-Dieter; Lowack Klaus

Archive | 2004

METHOD FOR THE TREATMENT OF A RESIST SYSTEM AND CORRESPONDING DEVICE

Domke Wolf-Dieter; Kragler Karl; Lowack Klaus; Schwarzl Siegfried

Archive | 2000

Verfahren zur Metallisierung eines Isolators und/oder eines Dielektrikums

Schmid Guenter; Lowack Klaus; Sezi Recai

Archive | 2002

Polyhydroxamide, daraus durch Cyclisierung erhältliche Polybenzoxazole, Verfahren zur Herstellung der Polyhydroxamide und Polybenzoxazole Beschichtungsmaterial für elektronische Bauelemente elektronische Bauteile mit einer Schicht der Polybenzoxazole, Verfahren zu Beschichtung von Substraten mit den Polyhydroxamiden Verwendung von Polybenzoxazolen als Isolier- und/oder Schutzschicht und Zusammensetzung enthaltend das Polyhydroxamid

Sezi Recai; Halik Marcus; Walter Andreas; Lowack Klaus

Archive | 2004

Verfahren zur Behandlung eines Resistsystems und Vorrichtung dafür

Domke Wolf-Dieter; Kragler Karl; Lowack Klaus

Archive | 2003

Novel dinaphthylene diamine monomers are used to produce poly-o-hydroxyamides which can be cyclized to low dielectric constant polybenzoxazoles useful in electronics

Sezi Recai; Walter Andreas; Lowack Klaus; Maltenberger Anna; Banfic Robert

Archive | 2009

Umverdrahtungsverfahren und damit hergestelltes Bauelement

Schmid Guenter; Zschieschang Ute; Lowack Klaus; Sezi Recai

Archive | 2005

Process to produce microelectronic components by extreme ultraviolet lithography

Domke Wolf-Dieter; Lowack Klaus; Kragler Karl; Schwarzl Siegfried

Archive | 2005

Lithographic method for manufacture of resist pattern having line roughness involves unstructured exposure of resist to light e.g. floodlight of mercury vapor lamp and heating it so that its line roughness is reduced

Lowack Klaus

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Sezi Recai

Infineon Technologies

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Maltenberger Anna

Infineon Technologies

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Walter Andreas

Infineon Technologies

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Domke Wolf-Dieter

Infineon Technologies

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Schmid Guenter

Infineon Technologies

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Halik Marcus

Infineon Technologies

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Kragler Karl

Infineon Technologies

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Kirch Oliver

Infineon Technologies

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Radlik Wolfgang

Infineon Technologies

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Schwarzl Siegfried

Infineon Technologies

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