Lynn Gedvilas

Structural changes during annealing of GaInAsN

The alloy GaInAsN has great potential as a lower-band-gap material lattice matched to GaAs, but there is little understanding of what causes its poor optoelectronic properties and why these improve with annealing. This study provides information about the structural changes that occur when GaInAsN is annealed. The Fourier transform infrared spectra exhibit two primary features: a triplet at ∼470 cm−1 (Ga–N stretch) and two or three bands at ∼3100 cm−1 (N–H stretch). The change in the Ga–N stretch absorption can be explained if the nitrogen environment is converted from NGa4 to NInGa3 after annealing. The N–H stretch is also changed after annealing, implying a second, and unrelated, structural change.

Combinatorial studies of Zn-Al-O and Zn-Sn-O transparent conducting oxide thin films

Abstract In this work, we discuss the development of combinatorial deposition and analysis tools for the investigation of and the optimization of transparent conducting oxides. Library deposition by co-sputtering followed by optical analysis is shown to be a facile way to achieve these goals. Initial work focused on Zn-Al-O libraries with low Al contents as a test case. Subsequent work has focused on the ZnO-SnO2 tie line. Local maxima in the composition dependence of the conductivity were found for Zn/Sn ≈2:1 (Zn2SnO4) and Zn/Sn ≈1:1 (ZnSnO3). For these two representative stoichiometries, constant composition films have also been grown by pulsed laser deposition.

High-mobility transparent conducting Mo-doped In2O3 thin films by pulsed laser deposition

Highly conductive and transparent Mo-doped indium oxide (IMO) thin films were grown on glass and (100) yttria-stabilized zirconia (YSZ) single-crystal substrates by pulsed laser deposition. The electrical, optical, and structural properties were measured for films grown from 0, 1, 2, and 4 wt % Mo-doped targets. Films grown from the 2 wt % Mo-doped target had the best overall properties. In particular, for biaxially textured 2 wt % Mo IMO films grown on (100) YSZ, the conductivity was ∼3000 S cm−1 with a mobility greater than 95 cm2 V−1 s−1. In the visible, the optical transmittance normalized to the substrate was greater than 90%.

Hydrogen structures and the optoelectronic properties in transition films from amorphous to microcrystalline silicon prepared by hot-wire chemical vapor deposition

Transition films from amorphous (a-) to microcrystalline (μc-) silicon were prepared by hot-wire chemical vapor deposition using silane decomposition with either varied hydrogen-to-silane ratio, R, or with fixed R=3 but a varied substrate temperature, Ts. Raman results indicate that there is a threshold for the structural transition from a- to μc-Si:H in both cases. The onset of the structural transition is found to be R≈2 at Ts=250 °C and Ts≈200 °C at R=3. The properties of the material were studied by infrared absorption, optical absorption, photoluminescence (PL), and conductivity temperature dependence. We observed that the peak frequency of the SiH wag mode remains at 630−640 cm−1 for all the films, but the hydrogen content shows two regimes of fast and slow decreases separated by the onset of microcrystallinity. When microcrystallinity increased, we observed that (a) the SiO vibration absorption at 750 cm−1 and 1050−1200 cm−1 appeared, (b) the relative intensity of the 2090 cm−1 absorption increased...

Structural properties of hot wire a-Si:H films deposited at rates in excess of 100 Å/s

The structure of a-Si:H, deposited at rates in excess of 100 A/s by the hot wire chemical vapor deposition technique, has been examined by x-ray diffraction (XRD), Raman spectroscopy, H evolution, and small-angle x-ray scattering (SAXS). The films examined in this study were chosen to have roughly the same bonded H content CH as probed by infrared spectroscopy. As the film deposition rate Rd is increased from 5 to >140 A/s, we find that the short range order (from Raman), the medium range order (from XRD), and the peak position of the H evolution peak are invariant with respect to deposition rate, and exhibit structure consistent with a state-of-the-art, compact a-Si:H material deposited at low deposition rates. The only exception to this behavior is the SAXS signal, which increases by a factor of ∼100 over that for our best, low H content films deposited at ∼5 A/s. We discuss the invariance of the short and medium range order in terms of growth models available in the literature, and relate changes in th...

The electrical, optical and structural properties of InxZn1−xOy (0 ⩽ x ⩽ 1) thin films by combinatorial techniques

Indium–zinc-oxide (IZO) compositional libraries were deposited with dc magnetron sputtering onto glass substrates at 100 °C and analysed with high throughput, combinatorial techniques. The composition range from 4 to 95 at% In for Zn was explored. A peak in conductivity with σ > 3000 (Ω cm)−1 was observed at an indium content of ~70%. The mobility exceeded 30 cm2 (V s)−1 and the carrier concentrations were greater than 8 × 1020 cm−3. Crystalline phases were observed for In concentrations less than 45% and greater than 80% with an intermediate amorphous region. The low indium content films have a zinc oxide type structure with a ZnO (002) spacing ranging from ~2.61 to 2.85 A for 4% In and 45% In, respectively. For indium contents between 82% and 95%, the In2O3 (222) spacing varied from 2.98 to 2.99 A. Regardless of the composition or the degree of crystallinity, all films showed high optical transparency with the transmission >80% across the visible spectrum.

On the influence of short and medium range order on the material band gap in hydrogenated amorphous silicon

We examine different types of order measured in hydrogenated amorphous silicon (a-Si:H) and their effect on the optical absorption (band gap). We first review previous experimental work determining order on a short-range scale as probed by Raman spectroscopy, and provide, using molecular dynamics simulations, a theoretical explanation for why the band gap increases when this type of ordering is improved. We then present results on a-Si:H films deposited by hot wire chemical vapor deposition (CVD) and plasma enhanced CVD where the short-range order, from Raman spectroscopy, does not change, but order on a larger or medium-range scale does. This order is determined by measuring the width of the first x-ray diffraction peak, and was varied by depositing films at different substrate temperatures and∕or different hydrogen dilutions. We find that the film band gap also increases when this type of ordering improves, and we provide a possible mechanism to explain these trends. We also suggest that much of the pre...

Si–H bonding in low hydrogen content amorphous silicon films as probed by infrared spectroscopy and x-ray diffraction

A systematic series of hydrogenated amorphous silicon (a-Si:H films) has been deposited by the hot wire chemical vapor deposition (HWCVD) technique onto crystalline silicon substrates, and the H bonding has been examined by infrared spectroscopy. All deposition parameters were kept the same, except that the substrate temperature (TS) was varied to affect changes in the film H content. Although the peak position of the Si–H stretch mode changes minimally with increasing substrate temperature, the stretch mode shape changes, becoming more intense (compared to the height of the wag mode) and considerably narrower. We show, through annealing experiments, that this narrow stretch mode may be a universal feature of low H content films, and suggest interpretations for this finite (narrow) linewidth. By correlations with x-ray diffraction data, we also show that the narrowing of the stretch mode peak for low H content HWCVD films is an indication of improved lattice ordering, and suggest that this improved orderi...

Conformal thin-film silicon nitride deposited by hot-wire chemical vapor deposition

We have studied silicon nitride thin films deposited by hot-wire chemical vapor deposition as a function of the substrate temperature and hydrogen dilution. We found that adding H2 to the process significantly enhances silicon nitride film deposition. High-quality films can be grown at low substrate temperatures (<350 °C). At optimized conditions, a 500-A-thick silicon nitride film gives a nearly 100% surface coverage on a 100 nm scale object. H dilution dramatically increases the NH2 radicals in the process and leads to conformal films.

Fourier transform infrared quantitative analysis of sugars and lignin in pretreated softwood solid residues

Hydrolysates were obtained from dilute sulfuric acid pretreatment of whole-tree softwood forest thinnings and softwood sawdust. Mid-infrared (IR) spectra were obtained on sample sets of wet washed hydrolysates, and 45°C vacuum-dried washed hydrolysates, using a Fourier transform infrared (FTIR) spectrophotometrer equipped with a diamond-composite attenuated total reflectance (ATR) cell. Partial least squares (PLS) analyiss of spectra from each sample set was performed. Regression analyses for sugar components and lignin were generated using results obtained from standard wet chemical and high-performance liquid chromatography methods. The correlation coefficients of the predicted and measured values were >0.9. The root mean square standard error of the estimate for each component in the residues was generally within 2 wt% of the measured value except where reported in the tables. The PLS regression analysis of the wet washed solids was similar to the PLS regression analysis on the 45°C vacuum-dried sample set. The FTIR-ATR technique allows mid-IR spectra to be obtained in a few minutes from wet washed or dried washed pretreated biomass solids. The prediction of the solids composition of an unknown washed pretreated solid is very rapid once the PLS method has been calibrated with known standard solid residues.