M. A. Majid

Toward 1550-nm GaAs-Based Lasers Using InAs/GaAs Quantum Dot Bilayers

By choice of appropriate growth conditions and optimization of the strain interactions between two closely stacked InAs/GaAs quantum dot (QD) layers, the emission wavelength of the QDs can be significantly extended, giving room-temperature emission from highly uniform QD ensembles in excess of 1500 nm. These QD bilayers are incorporated into edge-emitting laser structures and room-temperature ground-state lasing at 1420 nm and electroluminescence at 1515 nm are observed. Under high-bias conditions, asymmetric broadening of peaks in the laser gain spectra are observed, extending positive net modal gain from the devices to beyond 1500 nm, and the origin of this broadening is discussed.

Simultaneous quantum dash-well emission in a chirped dash-in-well superluminescent diode with spectral bandwidth >700 nm

We report on the quantitative evidence of simultaneous amplified spontaneous emission from the AlGaInAs/InAs/InP-based quantum-well (Qwell) and quantum-dashes (Qdash) in a multistack dash-in-an-asymmetric-well superluminescent diode heterostructure. As a result, an emission bandwidth (full width at half-maximum) of >700 nm is achieved, covering entire O-E-S-C-L-U communication bands, and a maximum continuous wave output power of 1.3 mW, from this device structure. This demonstration paves a way to bridge entire telecommunication bands through proper optimization of device gain region, bringing significant advances and impact to a variety of cross-disciplinary field applications.

Optimization of Quantum-Dot Molecular Beam Epitaxy for Broad Spectral Bandwidth Devices

The optimization of the key growth parameters for broad spectral bandwidth devices based on quantum dots is reported. A combination of atomic force microscopy, photoluminescence of test samples, and optoelectronic characterization of superluminescent diodes (SLDs) is used to optimize the growth conditions to obtain high-quality devices with large spectral bandwidth, radiative efficiency (due to a reduced defective-dot density), and thus output power. The defective-dot density is highlighted as being responsible for the degradation of device performance. An SLD device with 160 nm of bandwidth centered at 1230 nm is demonstrated.

O-band excited state quantum dot bilayer lasers

Bilayer InAs/GaAs quantum dot(QD) lasers operating in the excited state at wavelengths that span the O-band are demonstrated. The higher saturated gain and lower scattering time of the excited states of the ensemble of QDs offers the opportunity for fast direct-modulation lasers. We predict an increase in K-factor limited modulation bandwidth from QD lasers operating in the excited state due to a reduction in carrier transport and scattering times whilst maintaining high peak modal gain.

Large bandgap blueshifts in the InGaP/InAlGaP laser structure using novel strain-induced quantum well intermixing

We report on a novel quantum well intermixing (QWI) technique that induces a large degree of bandgap blueshift in the InGaP/InAlGaP laser structure. In this technique, high external compressive strain induced by a thick layer of SiO2 cap with a thickness ≥1 μm was used to enhance QWI in the tensile-strained InGaP/InAlGaP quantum well layer. A bandgap blueshift as large as 200 meV was observed in samples capped with 1-μm SiO2 and annealed at 1000 °C for 120 s. To further enhance the degree of QWI, cycles of annealing steps were applied to the SiO2 cap. Using this method, wavelength tunability over the range of 640 nm to 565 nm (∼250 meV) was demonstrated. Light-emitting diodes emitting at red (628 nm), orange (602 nm), and yellow (585 nm) wavelengths were successfully fabricated on the intermixed samples. Our results show that this new QWI method technique may pave the way for the realization of high-efficiency orange and yellow light-emitting devices based on the InGaP/InAlGaP material system.

Effect of Deposition Temperature on the Opto-Electronic Properties of Molecular Beam Epitaxy Grown InAs Quantum Dot Devices for Broadband Applications

The effect of the quantum dot (QD) deposition temperature is discussed for dot-in-a-well (DWELL) structures with a view to their optimization for broadband applications. Atomic force microscopy (AFM) analysis allows the measurement of the quantum dot and the defective island density. The reduced QD growth temperature results in broad emission spectrum and increased defective island density. Reduced electroluminescence efficiency, higher reverse leakage currents, and lower reverse breakdown voltage could be correlated to the presence of the defective island density. Maximal output power is obtained for devices with a QD growth temperature of 500 C, whilst the preferred spectral shape and QD density is obtained at the lowest temperature, 470 C. To benefit from broad emission bandwidth, the growth conditions need to be further optimized to avoid, or at least reduce, the defective island density. # 2012 The Japan Society of Applied Physics

First demonstration of orange-yellow light emitter devices in InGaP/InAlGaP laser structure using strain-induced quantum well intermixing technique

In this paper, a novel strain-induced quantum well intermixing (QWI) technique is employed on InGaP/InAlGaP material system to promote interdiffusion via application of a thick-dielectric encapsulant layer, in conjunction with cycle annealing at elevated temperature. Broad area devices fabricated from this novel cost-effective QWI technique lased at room-temperature at a wavelength as short as 608nm with a total output power of ~46mW. This is the shortest- wavelength electrically pumped visible semiconductor laser, and the first report of lasing action yet reported from post- growth interdiffused process. Furthermore, we also demonstrate the first yellow superluminescent diode (SLD) at a wavelength of 583nm with a total two-facet output power of ~4.5mW - the highest optical power ever reported at this wavelength in this material system. The demonstration of the yellow SLD without complicated multiquantum barriers to suppress the carrier overflow will have a great impact in realizing the yellow laser diode.

Excited State Bilayer Quantum Dot Lasers at 1.3 µm

We report the realization of excited state bilayer quantum dot (QD) lasers in the 1.31 µm region. The higher saturated gain and lower scattering time of the excited states of the ensemble of QDs offers the opportunity for high modulation bandwidths. Gain measurements for these structures are discussed and compared to conventional QD laser structures. The extension of QD ground state operating wavelengths to 1.45 µm spanning the O- and E-band is also demonstrated.

Effect of annealing InGaP/InAlGaP laser structure at 950°C on laser characteristics

Abstract. We achieved considerable laser diode (LD) improvement after annealing InGaP/InAlGaP laser structure at 950°C for a total annealing time of 2 min. The photoluminescence intensity is increased by 10 folds and full-wave at half-maximum is reduced from ∼30 to 20 nm. The measured LDs exhibited significantly reduced threshold current (Ith), from 2 to 1.5 A for a 1-mm long LD, improved internal efficiency (ηi), from 63% to 68%, and increased internal losses αi, from 14.3 to 18.6  cm−1. Our work suggests that the use of strain-induced quantum well intermixing is a viable solution for high-efficiency AlGaInP devices at shorter wavelengths. The advent of laser-based solid-state lighting (SSL) and visible-light communications (VLC) highlighted the importance of the current findings, which are aimed at improving color quality and photodetector received power in SSL and VLC, respectively, via annealed red LDs.

InAs/GaAs quantum-dot intermixing: comparison of various dielectric encapsulants

Abstract. We report on the impurity-free vacancy-disordering effect in InAs/GaAs quantum-dot (QD) laser structure based on seven dielectric capping layers. Compared to the typical SiO2 and Si3N4 films, HfO2 and SrTiO3 dielectric layers showed superior enhancement and suppression of intermixing up to 725°C, respectively. A QD peak ground-state differential blue shift of >175  nm (>148  meV) is obtained for HfO2 capped sample. Likewise, investigation of TiO2, Al2O3, and ZnO capping films showed unusual characteristics, such as intermixing-control caps at low annealing temperature (650°C) and interdiffusion-promoting caps at high temperatures (≥675°C). We qualitatively compared the degree of intermixing induced by these films by extracting the rate of intermixing and the temperature for ground-state and excited-state convergences. Based on our systematic characterization, we established reference intermixing processes based on seven different dielectric encapsulation materials. The tailored wavelength emission of ∼1060─1200  nm at room temperature and improved optical quality exhibited from intermixed QDs would serve as key materials for eventual realization of low-cost, compact, and agile lasers. Applications include solid-state laser pumping, optical communications, gas sensing, biomedical imaging, green–yellow–orange coherent light generation, as well as addressing photonic integration via area-selective, and postgrowth bandgap engineering.