M. Ficcadenti

Electrical transport properties of microcrystalline silicon grown by plasma enhanced chemical vapor deposition

The dark conductivity and Hall mobility of hydrogenated silicon films deposited varying the silane concentration f=SiH4∕(SiH4+H2) in a conventional plasma enhanced chemical vapor deposition system have been investigated as a function of temperature, taking into account their structural properties. The electrical properties have been studied in terms of a structural two-phase model. A clear transition from the electrical transport governed by a crystalline phase, in the range 1%⩽f⩽3%, to that controlled by an amorphous phase, for f>3%, has been evidenced. Some metastable effects of the dark conductivity have been noticed.

Si Nanocrystals Embedded in a Silicon Oxynitride Matrix

We investigated the morphological and structural change in silicon nanostructures embedded in the silicon oxynitride matrix. The study has been carried out on thin films thermally annealed at high temperature, after deposition at 400°C by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapour Deposition (ECR- PECVD), under different deposition parameters. Our study evidenced the existence of a well defined threshold for the silicon content in the film (around 47%), to get Si nano-crystallization in the silicon oxynitride matrix. Both Si nano-crystals and Si nano-columns have been observed by TEM analysis in two samples having a similar Si content but deposited under different conditions.