M.J. Dutch

The control of tokamak configuration variable plasmas

AbstractThe general control of tokamak plasmas has evolved considerably over the past few years with an increase in the plasma pulse length, an increase in the control of additional heating and fueling, and an increase in the degree to which the shape of the plasma can be varied. The Tokamak Configuration Variable (TCV) is specifically designed to explore the operational benefits of plasma shaping over a wide variety of plasma shapes. Consequently, considerable attention has been given to the control of the poloidal field coil currents that impose the desired shape. All aspects of the control of TCV plasmas, from the diagnostic measurements to the power supplies, via particular control algorithms and overall supervision are discussed.

Elm Control During Double-Null Ohmic H Modes in Tcv

An artificial intelligence system for identifying attributes in an image. The system may include a processor in communication with a client device; and a storage medium. The storage medium may store instructions that, when executed, configure the processor to perform operations including: extracting first features; categorizing the first images in a first group or a second group; modifying first metadata associated with each image in the first images to include a binary label; calculating a classification function; classifying a second plurality of images using the classification function; extracting second features from the second images classified in the first group; categorizing the second images in the first group by attribute; calculating an attribute identification function that identifies attributes of the second images; and identifying at least one attribute associated with a client image using the attribute identification function, the client image being received from the client device.