M. Petukhov

Pseudomorphic-to-bulk fcc phase transition of thin Ni films on Pd(100)

We have measured the transformation of pseudomorphic

An XPD and LEED study of highly strained ultrathin Ni films on Pd(1 0 0)

\mathrm{Ni}

Spectroscopic and structural characterisation of a VOx (x≈1) ultrathin epitaxial film on Pt (111)

films on

Growth of NiO ultrathin films on Pd(100) by post-oxidation of Ni films: the effect of pre-adsorbed oxygen

\mathrm{Pd}(100)

Structure of highly strained ultrathin Ni films on Pd(100)

into their bulk fcc phase as a function of the film thickness. We made use of x-ray diffraction and x-ray induced photoemission to study the evolution of the

An X-ray photoelectron diffraction structural characterization of an epitaxial MnO ultrathin film on Pt(1 1 1)

\mathrm{Ni}

A photoelectron diffraction study of the surface-V2O3 (2 × 2) layer on Pd(1 1 1)

film and its interface with the substrate. The growth of a film with tetragonally strained face centered symmetry (fct) has been observed by out-of-plane x-ray diffraction up to a limit thickness of

Ultrathin film growth and spectroscopic characterization of VOx (0.8 ≤ x ≤ 1.3) on Pt(111)

10\phantom{\rule{0.3em}{0ex}}\mathrm{Ni}

Epitaxial growth of molybdenum on TiO2(110)

pseudomorphic layers (some of them partially filled and intermixed with the substrate), where a new fcc bulklike phase is formed. After the formation of the bulklike

STM study of the initial stages of C60 adsorption on the Pt(1 1 0)-(1 × 2) surface

\mathrm{Ni}