Maiku Yamaguchi

Two-photon absorption induced by electric field gradient of optical near-field and its application to photolithography

An electric field gradient is an inherent property of the optical near-field (ONF). We investigated its effect on electron excitation in a quantum dot via model calculations combining a density matrix formalism and a classical Lorentz model. The electric field gradient of the ONF was found to cause two-photon absorption by an unusual mechanism. Furthermore, the absorption exhibits a nonmonotonic dependence on the spatial arrangement of the nanosystem, completely different from that of conventional two-photon absorption induced by an intense electric field. The present two-photon absorption process was verified in a previous experimental observation by reinterpreting the results of ONF photolithography.

Optically controlled magnetic-field etching on the nano-scale

Electric and magnetic fields play an important role in both chemical and physical reactions. However, since the coupling efficiency between magnetic fields and electrons is low in comparison with that between electric fields and electrons in the visible wavelength region, the magnetic field is negligible in photo-induced reactions. Here, we performed photo-etching of ZrO2 nano-stripe structures, and identified an etching-property polarisation dependence. Specifically, the etching rate and etched profiles depend on the structure width. To evaluate this polarisation-dependent etching, we performed numerical calculations using a finite-difference time-domain method. Remarkably, the numerical results revealed that the polarisation-dependent etching properties were determined by the magnetic field distributions, rather than the electric field distributions. As nano-scale structures induce a localised magnetic field, the discovery of this etching dependence on the magnetic field is expected to introduce a new perspective on advanced nano-scale structure fabrication.