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Dive into the research topics where Makoto Morioka is active.

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Featured researches published by Makoto Morioka.


Japanese Journal of Applied Physics | 1984

A New Two-Dimensional Electron Gas Field-Effect Transistor Fabricated on Undoped AlGaAs–GaAs Heterostructure

Yoshifumi Katayama; Makoto Morioka; Yasushi Sawada; Kiichi Ueyanagi; Tomoyoshi Mishima; Yuichi Ono; Toshiyuki Usagawa; Y. Shiraki

A new two-dimensional electron gas (2DEG) field-effect transistor (FET) which operates in an MOS transistor-like mode is fabricated on undoped AlGaAs–GaAs heterostructures grown by both molecular beam epitaxy and organometallic vapour phase epitaxy. This device with very simple structure is expected to have performance comparable to those of selectively doped heterostructure FETs and can easily be integrated.


Journal of Crystal Growth | 1987

Low temperature MBE growth of high quality AlGaAs

Yasuhiro Shiraki; Tomoyoshi Mishima; Makoto Morioka

Abstract High quality AlGaAs MBE layers have been successfully grown at very low temperatures (


IEEE Journal of Quantum Electronics | 1977

Near-infrared high-power LED's with Ga 1-x Al x As epitaxially grown junctions

Kazuhiro Kurata; Yuichi Ono; Makoto Morioka; Kazuhiro Ito; Mitsuhiro Mori

This paper reports on a study of several techniques of fabricating an efficient Ga 1-x Al x As IRED with high power. Smooth epitaxial layers are grown on a substrate containing a thick Ga 1-x Al x As epitaxial layer which is used to form a hemispherical emitting surface. This is achieved by using a melting-back technique without up-heating. An effect of the AlAs molefraction ratio between n- and p-type regions was clearly found by measurement of a large number of diode chips, and the best performances were obtained on the junctions with the ratio X_{n}/X_{p} simeq 1.5 . Ohmic contacts to the p and n regions were applied on the same surface of the wafer using only one metallic source for the vacuum deposition. A cerium-oxide film serves as an antireflection coating when deposited on the hemispherical surface and increases the optical output power by more than 30 percent. External quantum efficiencies of 28 percent (current density: 400 A/ cm2) and optical output power of 96 mW (drive current: 300 mA, current density: 1500 A/cm2) have been observed from diodes emitting at 8300 A under dc operation at room temperature.


Surface Science | 1986

Determination of band-gap discontinuity in AlGaAs/GaAs system by quantum oscillations of photoluminescence intensity

Tomoyoshi Mishima; Jun-ichi Kasai; Makoto Morioka; Yasushi Sawada; Yoshifumi Katayama; Yasuhiro Shiraki; Yoshimasa Murayama

Abstract An anomalous excitation intensity dependence of photoluminescence (PL) in high-quality Al0.3Ga0.7As/GaAs quantum wells was observed at low temperatures. The PL intensity IPL was seen to increase as IPL ∝ IEXm with increasing excitation intensity IEX and the power m varied periodically between 1 and 2, depending on the well width. This phenomenon can be understood in terms of the carrier trapping efficiency under resonant and off-resonant conditions. From the theoretical analysis of the effect, the conduction band off-set can be estimated to be 59–70%, considerably smaller than the value of Dingle et al.


Archive | 1986

Photo semiconductor device

Hirobumi Ouchi; Hiroshi Matsuda; Makoto Morioka; Kazuhiro Kurata; Yasushi Koga


Archive | 1988

Compound semiconductor structure and process for making same

Masao Yamane; Tomoyoshi Mishima; Shigeo Goto; Susumu Takahashi; Makoto Morioka


Archive | 1980

Light emitting devices

Yuichi Ono; Mitsuhiro Mori; Makoto Morioka; Kazuhiro Ito; Kazuhiro Kurata


Archive | 1975

Epitaxial growth process for compound semiconductor crystals in liquid phase

Masao Kawamura; Kazuhiro Ito; Makoto Morioka; Yuichi Ono; Sachio Ishioka; Kazuhiro Kurata


Archive | 1984

Heterojunction FET with doubly-doped channel

Yasuhiro Shiraki; Yoshifumi Katayama; Yoshimasa Murayama; Makoto Morioka; Yasushi Sawada; Tomoyoshi Mishima; Takao Kuroda; Eiichi Maruyama


Archive | 1975

Light emitting semiconductor device and a method for making the same

Yuichi Ono; Kazuhiro Kurata; Masao Kawamura; Makoto Morioka; Kazuhiro Ito

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