Marina Blumin

Growth of Au-catalyzed ordered GaAs nanowire arrays by molecular-beam epitaxy

Ordered gallium arsenide (GaAs) nanowires are grown by molecular-beam epitaxy on GaAs (111)B substrates using Au-catalyzed vapor–liquid–solid growth defined by nanochannel alumina (NCA) templates. Field-emission scanning electron microscope images show highly ordered nanowires with a growth direction perpendicular to the substrate. The size (i.e., diameter) distribution of the wires is drastically narrowed by depositing the gold catalyst through an NCA template mask; this narrows the size distribution of the gold dots and arranges them in a well-ordered array, as defined by the NCA template. The nanowire diameter distribution full width at half maximum on the masked substrate is 5.1 nm, compared with 15.7 nm on an unmasked substrate.

Growth, branching, and kinking of molecular-beam epitaxial 〈110〉 GaAs nanowires

GaAs nanowires were grown on GaAs (100) substrates by vapor–liquid–solid growth. About 8% of these nanowires grew in 〈110〉 directions with straight, Y-branched or L-shaped morphologies. The role of strain-induced reduction in surface free energy is discussed as a possible factor contributing to the evolution of 〈110〉 nanowires. Kinking and branching is attributed to growth instabilities resulting from equivalent surface free energies for 〈110〉 growth directions. Transmission electron microscopy verified that 〈110〉 nanowires are defect free.GaAs nanowires were grown on GaAs (100) substrates by vapor–liquid–solid growth. About 8% of these nanowires grew in 〈110〉 directions with straight, Y-branched or L-shaped morphologies. The role of strain-induced reduction in surface free energy is discussed as a possible factor contributing to the evolution of 〈110〉 nanowires. Kinking and branching is attributed to growth instabilities resulting from equivalent surface free energies for 〈110〉 growth directions. Transmission electron microscopy verified that 〈110〉 nanowires are defect free.

Transport and strain relaxation in wurtzite InAs–GaAs core-shell heterowires

Indium-arsenide–gallium-arsenide (InAs–GaAs) core-shell, wurtzite nanowires have been grown on GaAs (001) substrates. The core-shell geometries (core radii 11 to 26 nm, shell thickness >2.5 nm) exceeded equilibrium critical values for strain relaxation via dislocations, apparent from transmission electron microscopy. Partial axial relaxation is detected in all nanowires increasing exponentially with size, while radial strain relaxation is >90%, but undetected in nanowires with both smaller core radii <16 nm and shell thicknesses <5 nm. Electrical measurements on individual core-shell nanowires show that the resulting dislocations are correlated with reduced electron field-effect mobility compared to bare InAs nanowires.

Faster radial strain relaxation in InAs–GaAs core–shell heterowires

The structure of wurtzite and zinc blende InAs-GaAs (001) core-shell nanowires grown by molecular beam epitaxy on GaAs (001) substrates has been investigated by transmission electron microscopy. Heterowires with InAs core radii exceeding 11 nm, strain relax through the generation of misfit dislocations, given a GaAs shell thickness greater than 2.5 nm. Strain relaxation is larger in radial directions than axial, particularly for shell thicknesses greater than 5.0 nm, consistent with molecular statics calculations that predict a large shear stress concentration at each interface corner.

Highly-ordered GaAs/AlGaAs quantum-dot arrays on GaAs (001) substrates grown by molecular-beam epitaxy using nanochannel alumina masks

Highly-ordered GaAs/AlGaAs quantum-dot arrays (QDA) were grown by molecular-beam epitaxy on GaAs (001) using masks of anodic nanochannel alumina (NCA). The QDA replicated the hexagonal lattice pattern of the NCA masks with period spacing of 100 nm. The circular disk-like dots were defined by the nanohole channels of NCA masks with size adjustable between 45 and 85 nm. Both single- and double-well GaAs/AlGaAs QDA exhibited strong photoluminescence. The single-well QDA showed a narrow peak at 1.64 eV with full width at half maximum of only 16 meV, indicating good size uniformity and crystal quality for the QDA. NCA masked epitaxial growth is thus shown to be a promising general approach for fabricating various heterostructure QDA, including both strained and lattice-matched heterostructures.

Direct observation of single-charge-detection capability of nanowire field-effect transistors

A single localized charge can quench the luminescence of a semiconductor nanowire, but relatively little is known about the effect of single charges on the conductance of the nanowire. In one-dimensional nanostructures embedded in a material with a low dielectric permittivity, the Coulomb interaction and excitonic binding energy are much larger than the corresponding values when embedded in a material with the same dielectric permittivity. The stronger Coulomb interaction is also predicted to limit the carrier mobility in nanowires. Here, we experimentally isolate and study the effect of individual localized electrons on carrier transport in InAs nanowire field-effect transistors, and extract the equivalent charge sensitivity. In the low carrier density regime, the electrostatic potential produced by one electron can create an insulating weak link in an otherwise conducting nanowire field-effect transistor, modulating its conductance by as much as 4,200% at 31 K. The equivalent charge sensitivity, 4 × 10(-5) e Hz(-1/2) at 25 K and 6 × 10(-5) e Hz(-1/2) at 198 K, is orders of magnitude better than conventional field-effect transistors and nanoelectromechanical systems, and is just a factor of 20-30 away from the record sensitivity for state-of-the-art single-electron transistors operating below 4 K (ref. 8). This work demonstrates the feasibility of nanowire-based single-electron memories and illustrates a physical process of potential relevance for high performance chemical sensors. The charge-state-detection capability we demonstrate also makes the nanowire field-effect transistor a promising host system for impurities (which may be introduced intentionally or unintentionally) with potentially long spin lifetimes, because such transistors offer more sensitive spin-to-charge conversion readout than schemes based on conventional field-effect transistors.

Electronic properties of quantum dot systems realized in semiconductor nanowires

Catalyst-assisted growth of semiconductor nanowires has opened up several new and exciting possibilities for low-dimensional semiconductor structures. The authors review progress on the realization of quantum dots in semiconductor nanowires, and their characterization by transport spectroscopy. Emphasis is placed on the wide range electronic properties exhibited due to flexibility of the growth process in terms of nanostructure composition and size. Particular attention is placed on studies of spin in few-electron quantum dots.

Probing the gate--voltage-dependent surface potential of individual InAs nanowires using random telegraph signals.

We report a novel method for probing the gate-voltage dependence of the surface potential of individual semiconductor nanowires. The statistics of electronic occupation of a single defect on the surface of the nanowire, determined from a random telegraph signal, is used as a measure for the local potential. The method is demonstrated for the case of one or two switching defects in indium arsenide (InAs) nanowire field effect transistors at temperatures T=25-77 K. Comparison with a self-consistent model shows that surface potential variation is retarded in the conducting regime due to screening by surface states with density Dss≈10(12) cm(-2) eV(-1). Temperature-dependent dynamics of electron capture and emission producing the random telegraph signals are also analyzed, and multiphonon emission is identified as the process responsible for capture and emission of electrons from the surface traps. Two defects studied in detail had capture activation energies of EB≈50 meV and EB≈110 meV and cross sections of σ∞≈3×10(-19) cm2 and σ∞≈2×10(-17) cm2, respectively. A lattice relaxation energy of Sℏω=187±15 meV was found for the first defect.

Epitaxial growth of 20 nm InAs and GaAs quantum dots on GaAs through block copolymer templated SiO2 masks

We report on selective area growth of InAs and GaAs quantum dots (QDs) on GaAs through ∼20 nm SiO2 windows prepared by block copolymer lithography. We discuss the mechanisms of growth through these masks, highlighting the variation of the resulting morphology (dot size, spacing, uniformity, and areal density) as a function of growth parameters. We have obtained highly uniform arrays of InAs and GaAs QDs with mean diameters and areal densities of 20.6 nm and 1×1011 cm−2, respectively. We have also investigated the optical characteristics of these QDs as a function of temperature and drawn correlations between the optical response and their crystalline quality.

Self-assembled InAs quantum dots and wires grown on a cleaved-edge GaAs(110) surface

We studied the conditions for the Stranski-Krastanov mode of molecular beam epitaxial growth of InAs on a cleaved GaAs(110) surface. Temperature distributions on a subholder with cleaved facets were revealed using thermophotography. Combining these data with a theoretical model enabled a determination of the real temperature on the cleaved-edge surfaces (110), which differed markedly from the temperature on a planar wafer (100). Based on these results, we proposed an approach that combines different growth conditions in one technological process. As a result, appropriate growth conditions were established for InAs quantum dots grown on the cleaved GaAs(110) surface. Control over the dot nucleation process was shown to permit growth of both linear arrays of quantum dots and planar quantum wires on these (110) surfaces.