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Dive into the research topics where Markus Haidl is active.

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Featured researches published by Markus Haidl.


Proceedings of SPIE, the International Society for Optical Engineering | 2000

Progress in Mo/Si multilayer coating technology for EUVL optics

Eric Louis; Andrey E. Yakshin; Peter C. Goerts; Sebastian Oestreich; R. Stuik; Edward L. G. Maas; M.J.H. Kessels; Fred Bijkerk; Markus Haidl; S. Muellender; Michael Mertin; Detlef Schmitz; Frank Scholze; Gerhard Ulm

Extensive optimization on the fabrication of Mo/Si multilayer systems is carried out at the FOM Institute Rijnhuizen using e-beam evaporation. The process is being optimized including parameters such as variation of the mirrors center wavelength, the metal fraction, deposition parameters, and the layer composition. Reflectivities of 69.5% are demonstrated at normal incidence, with values of 67 to 69% being routinely achieved, demonstrating the capabilities of the deposition process. Some evidence of smoothening to interface roughness values lower than the roughness of the initial substrate is given. Furthermore, investigation of the temporal behavior of the coatings does not indicate any loss of reflectivity over an eight-month period. An analysis of the multilayer composition and the interface roughness is given. The reflectivity measurements have been carried out at the PTB facilities at the electron storage rings BESSY I and BESSY II in Berlin. The results of measurements at both facilities are found to be identical and accuracy is discussed in detail.


International Symposium on Optical Science and Technology | 2000

Multilayer reflectance during exposure to EUV radiation

Sebastian Oestreich; Roman Klein; Frank Scholze; Jeroen Jonkers; Eric Louis; Andrey Yakshin; Peter C. Goerts; Gerhard Ulm; Markus Haidl; Fred Bijkerk

Mo/S multilayer mirrors have been exposed to intense monochromatic EUV radiation in order to investigate a possible deterioration of the mirror reflectance under different vacuum conditions. Power densities up to 3 mW/mm2 were applied at the PB undulator beamline at BESSY II, applying a hydrocarbon enriched vacuum. The mirror reflectance has been monitored in situ during several hours of exposure. Vacuum pressures of 3 X 10-8 mbar (without hydrocarbons) and 10-7 mbar (with hydrocarbons) at EUV intensities of 3 mW/mm2, respectively 0.2 mW/mm2 have been applied. The reflectance of the mirrors decreased when exposed to EUV radiation in hydrocarbon enriched vacuum, while no loss in reflectance was observed when no hydrocarbons were added to the vacuum. Ozone-cleaning experiments, using UV produced ozone from air at atmospheric pressure, were performed and show that Mo/S mirrors do not suffer from prolonged exposure to ozone.


Emerging lithographic technologies. Conference | 1999

Reflectivity of Mo/Si multilayer systems for EUVL

Eric Louis; Andrey Yakshin; Peter C. Goerts; Salim Abdali; Edward L. G. Maas; R. Stuik; Fred Bijkerk; Detlef Schmitz; Frank Scholze; Gerhard Ulm; Markus Haidl

Normal-incidence reflectivity data of Mo/Si multilayer systems are being reported for the EUV wavelength range.


International Symposium on Optical Science and Technology | 2001

Bufferlayer and caplayer engineering of Mo/Si EUVL multilayer mirrors

Ulf Kleineberg; T Westerwalbesloh; O. Wehmeyer; Michael Sundermann; Armin Brechling; Ulrich Heinzmann; Markus Haidl; S. Muellender

Bufferlayer and caplayer engineering strategies are getting progressively important for improving crucial properties of EUVL multilayer optics and EUV reflection masks. While bufferlayers modifying the contact between the reflecting interference multilayer and the superpolished substrate aim for a partial smoothing of the residual substrate roughness or for a mitigation of local substrate defects as well as for multilayer film stress relaxation, surface caplayers are capable to enhance the multilayer reflectivity of EUV mirrors and masks. We present experimental results on various bufferlayer systems (singlelayer and multilayer) applied to different substrate materials (ULE, Zerodur, silicon). The bufferlayers have been deposited by e-beam evaporation and ion-polishing techniques at UHV conditions and substrates with and without bufferlayer have been coated with standard Mo/Si multilayers (50 doublelayers, d-spacing 6.8 nm) in the same deposition run. The samples have been analyzed exsitu by means of AFM, TEM, X-ray scattering and reflection and normal-incidence EUV reflectance measurements. We have found significant improvement (+ 0.7 %) of the Mo/Si multilayer EUV reflectivity for some bufferlayer systems applied to substrates with 0.2 - 0.3 nm r.m.s. high spatial frequency roughness (HSFR), while no effect was found on superpolished substrates exhibiting 0.1 nm r.m.s HSFR. The effect of caplayer modification applied to Mo/Si multilayers has been examined regarding EUV reflectivity. The native siliconoxide layer on top of the Mo/Si multilayer coatings has been replaced by an ultrathin (2 nm) chemically inert caplayer. We have found a 1 % - 1.5 % improvement in EUV peak reflectance for one cap material applied to several Mo/Si multilayer in comparison to a native siliconoxide cap.


Archive | 2002

Reflecting device for electromagnetic waves

Martin Weiser; Udo Dinger; Siegfried Stacklies; Markus Haidl


Archive | 2001

Reflector for electromagnetic waves in wavelength range below 200 mm

Siegfried Stacklies; Martin Weiser; Udo Dinger; Markus Haidl


International Symposium on Optical Science and Technology | 2000

Mo/Si multilayer coating technology for EUVL: coating uniformity and time stability

Eric Louis; Andrey Yakshin; Peter C. Goerts; Sebastian Oestreich; Edward L. G. Maas; M.J.H. Kessels; Detlef Schmitz; Frank Scholze; Gerhard Ulm; S. Muellender; Markus Haidl; Fred Bijkerk


Archive | 2002

Apparatus and method for molding optical lenses

Markus Haidl; Norbert Hugenberg; Alexander Witte


SPIE Proc. 4506 | 2001

Bufferlayer and Caplayer Engineering of Mo/Si EUVL Multilayer Mirrors

Ulf Kleineberg; Th. Westerwalbesloh; O. Wehmeyer; M. Sundermann; Armin Brechling; Ulrich Heinzmann; Markus Haidl; S. Müllender


Archive | 2008

Optical observation instrument and a method of controllably adjusting a refractive power in such instrument

Oliver Baumann; Jesús Miguel Cabeza Guillén; Michael Claus; Markus Haidl; Gerhard Kelch; Timo Kratzer; Herbert Krug; Peter Schnitzer; Hexin Wang

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