Martin Bednarzik

Transparent hybrid polymer stamp copies with sub-50-nm resolution for thermal and UV-nanoimprint lithography

The organic-inorganic hybrid polymer Ormostamp was successfully used for the fabrication of inexpensive, transparent working stamps to be used in nanoimprint lithography. The stamps were produced from different masters by casting and UV exposure of a viscous precursor. The cured hybrid stamp with the replicated surface relief was imprinted into several thermoplastic materials with up to 180 °C imprint temperature. In this article the authors show the effect of the imprint temperature on the structural fidelity. By using combined thermal and UV-nanoimprint lithography at 110 °C imprint temperature, a resolution down to 35 nm is demonstrated. They also investigated deterioration effects due to plasma treatment to simulate the effect of multiple recoating steps.

The spectrometer telescope for imaging x-rays on board the Solar Orbiter mission

The Spectrometer Telescope for Imaging X-rays (STIX) is one of 10 instruments on board Solar Orbiter, a confirmed Mclass mission of the European Space Agency (ESA) within the Cosmic Vision program scheduled to be launched in 2017. STIX applies a Fourier-imaging technique using a set of tungsten grids (at pitches from 0.038 to 1 mm) in front of 32 pixelized CdTe detectors to provide imaging spectroscopy of solar thermal and non-thermal hard X-ray emissions from 4 to 150 keV. The status of the instrument reviewed in this paper is based on the design that passed the Preliminary Design Review (PDR) in early 2012. Particular emphasis is given to the first light of the detector system called Caliste-SO.

SU-8-based deep x-ray lithography/LIGA

Poly-methylmethacrylate (PMMA), a positive resist, is the most commonly used resist for deep X-ray lithography (DXRL)/LIGA technology. Although PMMA offers superior quality with respect to accuracy and sidewall roughness but it is also extremely insensitive. In this paper, we present our research results on SU-8 as negative resist for deep X-ray lithography. The results show that SU-8 is over two order of magnitude more sensitive to X-ray radiation than PMMA and the accuracy of the SU-8 microstructures fabricated by deep X-ray lithography is superior to UV-lithography and comparable to PMMA structures. The good pattern quality together with the high sensitivity offers rapid prototyping and direct LIGA capability. Moreover, the combinational use of UV and X-ray lithography as well as the use of positive and negative resists made it possible to fabricate complex multi-level 3D microstructures. The new process can be used to fabricate complex multi-level 3D structures for MEMS, MOEMS, Bio-MEMS or other micro-devices.

Fabrication of ultra thick, ultra high aspect ratio microcomponents by deep and ultra deep X-ray lithography

Two advanced processes have been developed for fabricating ultra thick and ultra high aspect ratio (HAR) microstructures. One is the SU-8 based deep X-ray lithography (SU-8 based DXRL) process which uses the normal deep X-ray beam to expose the negative SU-8 resist. Another one is wave length shifter(WLS) based Ultra deep X-ray lithography (WLS-UDXRL) process which uses special ultra deep X-ray beam from wave length shifter to expose the positive PMMA resist. For SU-8 based DXRL process, the typical exposure time of a layer of SU-8 is about 1% of that of PMMA. Even for a few millimeters thick resists the exposure time are just a few minutes. In WLS-UDXRL process, the X-ray beam is strengthened by a wave length shifter(WLS) so the required exposure time for ultra thick PMMA is reduced greatly. In the paper, the characteristic of the these two processes are discussed and the examples of the ultra thick and ultra HAR microstructures fabricated by these processes are presented (ultra thick up to 3600 /spl mu/m and HAR up to 360).

Borosilicate-glass-based x-ray masks for LIGA microfabrication

During the past few years, graphite based X-ray masks have been in use at CAMD and BESSY to build a variety of high aspect ratio microstructures and devices where low side wall surface roughness is not needed In order to obtain lower sidewall surface roughness while maintaining the ease of fabrication of the graphite based X-ray masks, the use of borosilicate glass was explored. A borosilicate glass manufactured by Schott Glas (Mainz, Germany) was selected due to its high purity and availability in ultra-thin sheets (30 μm). The fabrication process of the X-ray masks involves the mounting of a 30 μm glass sheet to either a stainless steel ring at room temperature or an invar ring at an elevated temperature followed by resist application, lithography, and gold electroplating. A stress free membrane is obtained by mounting the thin glass sheet to a stainless steel ring, while mounting on an invar ring at an elevated temperature produces a pre-stressed membrane ensuring that the membrane will remain taut during X-ray exposure. X-ray masks have been produced by using both thick negative- and positive-tone photoresists. The membrane mounting, resist application, lithography, and gold electroplating processes have been optimized to yield X-ray masks with absorber thicknesses ranging from 10 μm to 25 μm. Poly(methyl methacrylate) layers of 100 μm to 400 μm have been successfully patterned using the glass membrane masks.

Caliste-SO: the x-ray spectrometer unit of the STIX instrument onboard the Solar Orbiter space mission

Caliste-SO is a hybrid detector integrating in a volume of 12 × 14 × 18 mm3 a 1 mm-thick CdTe pixel detector, a frontend IDeF-X HD ASIC and passive parts to perform high resolution spectroscopy in the 4-200 keV energy range with high count rate capability (104-105 photons/s/cm2). The detector hybridization concept was designed by CEA and 3DPlus to realize CdTe cameras for space astronomy missions with various pixel patterns. For the STIX instrument onboard the Solar Orbiter mission, the imaging system is made by 32 collimators that sample the visibilities of the spatial Fourier transform and doesn’t require fine pitch pixels. The Al-Schottky CdTe detectors produced by Acrorad are then patterned and tested by the Paul Scherrer Institute to produce 12 pixels surrounded by a guard ring within 1 cm2. Electrical and spectroscopic performance tests of the Caliste-SO samples are performed in France at key manufacturing steps, before sending the samples to the principal investigator to mount them in the Detector Electronics Module of STIX in front of each collimator. Four samples were produced in 2013 to be part of the STIX engineering model. Best pixels show an energy resolution of 0.7 keV FWHM at 6 keV (1 keV resolution requirement for STIX) and a low-level detection threshold below 3 keV (4 keV requirement for STIX). The paper describes the design and the production of Caliste-SO and focuses on main performance tests performed so far to characterize the spectrometer unit.

First results in patterning of ultra high aspect ratio microstructures by a 4T wave length shifter at BESSY

Both X-ray lithography beamlines at BESSY can be operated in three different modes: one coming from a dipole (1.3 T) is used for standard exposures for patterning PMMA and SU-8, while the other beamline, coming from a straight section of the storage ring, can be operated in soft wavelength mode (0.4 T) or alternatively in wave length shifter mode (4T). Using the soft wave length mode, copying processes for X-ray mask can be carried, while the very hard radiation generated in the wave length shifter (WLS) modes best for patterning ultra thick PMMA layers up to several mm in thickness. In WLS mode the higher magnetic field of 4T is shifting the critical photon energy to 7.7 keV compared to a standard dipole magnet with 2.5 keV. The lateral intensity homogeneity of this beamline is very high. Tests for using the WLS mode for ultra deep X-ray lithography (UDXRL) were performed and delivered very good results. PMMA layers of up to 4 mm in thickness were patterned successfully. Similar patterning methods to fabricate high aspect ratio micro parts were reported in literature.

Performance and qualification of CdTe pixel detectors for the Spectrometer/Telescope for Imaging X-rays

The Spectrometer/Telescope for Imaging X-rays (STIX) is a remote sensing instrument on-board the ESA Solar Orbiter spacecraft. STIX is designated to the study of energetic phenomena in solar flares. A Fourier-imaging technique using tungsten grid collimators in front of CdTe pixel detectors is employed, covering the 4 to 150 keV energy range with a full-width-half maximum resolution around 1 keV at low energies. Acrorad CdTe detectors of 1 mm thickness with a planar aluminum Schottky contact are used as basis for a subsequent patterning process into eight large pixels, four small pixels, and a guard ring. The patterning is done by means of microfabrication technologies. The area of the patterned sensor is 10×10 mm2. Test equipment has been developed for selecting the detectors with best performance prior to integration with the read-out system, and for qualification purposes. The set-up allows pixel-based dark current measurements at low temperatures. Pixel dark currents below 60 pA are needed to avoid excess noise in the read-out ASIC. The best pixels show dark currents below 10 pA at 300 V bias and −20 °C. Spectroscopic measurements with 133Ba sources confirm the good performance. This paper briefly explains the mission context of the CdTe detectors and then gives details of the production and testing procedures. Typical results are shown, with emphasis on performance degradation studies from displacement damage by proton irradiation. This is expected to be the dominant degradation mechanism for this application.

Flight production of Caliste-SO: the hard x-ray spectrometers for solar orbiter/STIX instrument

Caliste-SO are CdTe hybrid detectors that will be used as spectrometer units in the Spectrometer Telescope for Imaging X-rays (STIX) on-board the Solar Orbiter space mission. Each unit is placed below one collimator of this Fourier telescope to measure one visibility of the image in the 4-150 keV energy range, with a spectral resolution of 1 keV FWHM at 6 keV. The paper presents the scientific requirements, the design, the fabrication and the tests of the Caliste- SO devices before mounting them onto printed circuits boards. Spectral response was characterized on the 98 spacegrade units for various operating parameters. The devices will equip the different instrument validation models, including 32 units for the final instrument flight model to be launched in 2018.