Martin Kral
Shizuoka University
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Publication
Featured researches published by Martin Kral.
Journal of Physics D | 2008
Martin Kral; Akihisa Ogino; Masaaki Nagatsu
This work reports the effect of hydrogen concentration on the amino group introduction by the plasma treatment of the polyethylene surface. The amino group selectivity on the polyethylene sheet treated by the surface-wave plasma in various N2/H2 gas mixtures was examined by chemical derivatization combined with x-ray photoelectron spectroscopy (XPS). Amino derivatization along with XPS was employed in order to evaluate the amount of the introduced amino group. The highest concentration of the amino group, about 2.0 in amino-N/100 C-atoms, was obtained in the case of ammonia plasma treatment as well as the highest amino selectivity of about 100% in the amino-N/N ratio.
Japanese Journal of Applied Physics | 2006
Akihisa Ogino; Martin Kral; Kazuo Narushima; Mitsuji Yamashita; Masaaki Nagatsu
Surface-wave plasma has been used to modify polymer surfaces. The density and selectivity of the functionalizations are very important for biomaterial applications. Low-temperature plasma treatment has been successfully applied to many types of polymers to generate functional surfaces. In this study, we focus on the surface modification of amino groups on chitosan surfaces by ammonia plasma treatment. Chitosan is a nontoxic, biocompatible and biodegradable polymer, which promotes the scarless healing of skin through embolization. The experimental results of X-ray photoelectron spectroscopy measurements showed that the ammonia plasma exposure to the chitosan surface increased the nitrogen incorporation on the surface from 4.67 to 9.92%. The selectivity of amino group functionalizations (–NH2/N) increased from 53.7 to 78.4% after the plasma irradiation.
Japanese Journal of Applied Physics | 2008
Martin Kral; Akihisa Ogino; Masaaki Nagatsu
The effect of the plasma pretreatment using a biased sample holder on amino group introduction onto a polyethylene (PE) surface is reported. Ar or N2 plasma was used for the pretreatment and was followed by ammonia plasma treatment for 30 s. X-ray photoelectron spectroscopy (XPS) and chemical derivatization were used in order to estimate the concentration of the introduced amino group. In both cases of plasma pretreatment, the reactivity of the surface increased, and the overall nitrogen concentration on the PE surface increased. In the case of Ar pretreatment, we observed no significant change in amino group introduction compared with that without pretreatment, whereas in the case of N2 pretreatment, the concentration of amino groups decreased by about 40%.
Japanese Journal of Applied Physics | 2007
Martin Kral; Akihisa Ogino; Kazuo Narushima; Norihiro Inagaki; Mitsuji Yamashita; Masaaki Nagatsu
In this article, we report the results of the low-temperature chemical modification of a polyurethane (PU) surface using surface-wave excited N2/H2 plasma. Optical emission spectroscopy (OES) and double-probe measurement were performed to obtain optimum plasma properties. X-ray photoelectron spectroscopy (XPS) was employed to characterize the changes on the PU surface and to estimate the amount of introduced nitrogen-containing groups. The result shows that the largest amount of increase was obtained in the case of 90% N2/(N2 + H2) plasma where the N/C ratio on the PU surface increased from 0.0128 before plasma treatment to 0.131 after plasma treatment.
Applied Surface Science | 2008
Akihisa Ogino; Martin Kral; Mitsuji Yamashita; Masaaki Nagatsu
Journal of Photopolymer Science and Technology | 2008
Masaki Nagatsu; Martin Kral; Eiki Anzawa; Suguru Noguchi; Akihisa Ogino
Electrical Engineering in Japan | 2011
Eiki Anzawa; Martin Kral; Akihisa Ogino; Masaaki Nagatsu
Applied Surface Science | 2007
Emil Pinčík; Hikaru Kobayashi; Rudolf Hajossy; Helena Gleskova; Masao Takahashi; M. Jergel; R. Brunner; L. Ortega; M. Kučera; Martin Kral; Jaroslav Rusnák
Ieej Transactions on Fundamentals and Materials | 2011
Masashi Kando; Jan Husarik; Martin Kral
Ieej Transactions on Fundamentals and Materials | 2009
Eiki Anzawa; Martin Kral; Akihisa Ogino; Masaaki Nagatsu