Martin Lapke

The multipole resonance probe: A concept for simultaneous determination of plasma density, electron temperature, and collision rate in low-pressure plasmas

A diagnostic concept is presented which enables the simultaneous determination of plasma density, electron temperature, and collision rate in low-pressure gas discharges. The proposed method utilizes a radio-frequency driven probe of particular spherical design which is immersed in the plasma to excite a family of spatially bounded surface resonances. An analysis of the measured absorption spectrum S(ω) of the probe provides information on the distribution of the plasma in its vicinity, from which the values of the plasma parameters can be inferred. In its simplest realization, the probe consists of two dielectrically shielded, conducting hemispheres, which are symmetrically driven by an radio-frequency source, and the excited resonances can be classified as multipole fields, which allows an analytical evaluation of the measured signal. The proposed method is robust, calibration free, economical, and can be used for ideal and reactive plasmas alike.

The multipole resonance probe: characterization of a prototype

The multipole resonance probe (MRP) was recently proposed as an economical and industry compatible plasma diagnostic device (Lapke et al 2008 Appl. Phys. Lett. 93 051502). This communication reports the experimental characterization of a first MRP prototype in an inductively coupled argon/nitrogen plasma at 10?Pa. The behavior of the device follows the predictions of both an analytical model and a numerical simulation. The obtained electron densities are in excellent agreement with the results of Langmuir probe measurements.

Modeling and simulation of the plasma absorption probe

The plasma absorption probe (PAP) was invented as an economical and robust diagnostic device to determine the electron density distribution in technical plasmas. It consists of a small antenna enclosed by a dielectric tube which is immersed in the plasma. A network analyzer feeds a rf signal to the antenna and displays the frequency dependence of the power absorption. From the absorption spectrum the value of the electron density is calculated. The original evaluation formula was based on the dispersion relation of plasma surface waves propagating along an infinite dielectric cylinder. In this letter the authors present the analysis of a less idealized configuration. The calculated spectra are in good qualitative agreement with their experimental counterparts, but differ considerably from those predicted by the surface wave ansatz. An evaluation scheme which takes our findings into account will improve the performance of the PAP technique further.

Practical implementation of a two-hemisphere plasma absorption probe

The plasma absorption probe is a recently developed tool for efficient determination of electron densities of low temperature plasmas. The occurrence of multiple absorption signals was a serious drawback for interpretation of the probe data. To remedy this drawback, a spherically symmetric design of an absorption probe is proposed. A spherical probe is tested in experiment and simulation and the suppression of the multiple absorption signals is demonstrated. The proof of principle for the concept is given.

The multipole resonance probe: Realization of an optimized radio-frequency plasma probe based on active plasma resonance spectroscopy

A diagnostic concept is presented which enables the simultaneous determination of plasma density, electron temperature, and collision rate in low-pressure gas discharges. The proposed method utilizes a radio-frequency driven probe of particular spherical design which is immersed in the plasma to excite a family of spatially bounded surface resonances. An analysis of the measured absorption spectrum S(ω) of the probe provides information on the distribution of the plasma in its vicinity, from which the values of the plasma parameters can be inferred. In its simplest realization, the probe consists of two dielectrically shielded, conducting hemispheres, which are symmetrically driven by a radio-frequency source, and the excited resonances can be classified as multipole fields, which allows an analytical evaluation of the measured signal. A comparison of the analytical results, 3D-field simulations, and first measurements of a prototype show the functionality of the presented probe concept.

Study on electrostatic and electromagnetic probes operated in ceramic and metallic depositing plasmas

This paper discusses plasma probe diagnostics, namely the multipole resonance probe (MRP) and Langmuir probe (LP), operated in depositing plasmas. The aim of this work is to show that the combination of both probes provides stable and robust measurements and clear determination of plasma parameters for metallic and ceramic coating processes. The probes use different approaches to determine plasma parameters, e.g. electron density ne and electron temperature Te. The LP is a well-established plasma diagnostic, and its applicability in technological plasmas is well documented. The LP is a dc probe that performs a voltage sweep and analyses the measured current, which makes it insensitive against conductive metallic coating. However, once the LP is dielectrically coated with a ceramic film, its functionality is constricted. In contrast, the MRP was recently presented as a monitoring tool, which is insensitive to coating with dielectric ceramics. It is a new plasma diagnostic based on the concept of active plasma resonance spectroscopy, which uses the universal characteristic of all plasmas to resonate on or near the electron plasma frequency. The MRP emits a frequency sweep and the absorption of the signal, the |S11| parameter, is analysed. Since the MRP concept is based on electromagnetic waves, which are able to transmit dielectrics, it is insensitive to dielectric coatings. But once the MRP is metallized with a thin conductive film, no undisturbed RF-signal can be emitted into the plasma, which leads to falsified plasma parameter.In order to compare both systems, during metallic or dielectric coating, the probes are operated in a magnetron CCP, which is equipped with a titanium target. We present measurements in metallic and dielectric coating processes with both probes and elaborate advantages and problems of each probe operated in each coating environment.

A novel radio-frequency plasma probe for monitoring systems in dielectric deposition processes

This paper presents a novel industry compatible plasma probe for monitoring systems in dielectric deposition processes. The probe is based on the so called active plasma resonance spectroscopy and allows an extensive evaluation of different important plasma parameters, needed for the supervision and control of the plasma deposition process. Due to its assembly, the probe is insensitive against additional dielectric coating. Hence, the measurement performance is not affected. 3D-electromagnetic field simulations of the probe in a pseudo plasma deposition process, as well as the measurement with a prototype in a real deposition process show a good agreement with the expected behaviour and confirm the applicability of the probe as a monitoring tool for dielectric deposition processes.

Active plasma resonance spectroscopy: a functional analytic description

The term ‘active plasma resonance spectroscopy’ denotes a class of diagnostic methods which employ the ability of plasmas to resonate on or near the plasma frequency. The basic idea dates back to the early days of discharge physics: a signal in the GHz range is coupled to the plasma via an electrical probe; the spectral response is recorded, and then evaluated with a mathematical model to obtain information on the electron density and other plasma parameters. In recent years, the concept has found renewed interest as a basis of industry compatible plasma diagnostics. This paper analyzes the diagnostic technique in terms of a general description based on functional analytic (or Hilbert Space) methods which hold for arbitrary probe geometries. It is shown that the response function of the plasma–probe system can be expressed as a matrix element of the resolvent of an appropriately defined dynamical operator. A specialization of the formalism to a symmetric probe design is given, as well as an interpretation in terms of a lumped circuit model consisting of series resonance circuits. We present ideas for an optimized probe design based on geometric and electrical symmetry.

Physics of the Advanced Plasma Source: a review of recent experimental and modeling approaches

The Advanced Plasma Source (APS), a gridless hot cathode glow discharge capable of generating an ion beam with an energy of up to 150 eV and a flux of 1019s−1, is a standard industrial tool for the process of plasma ion-assisted deposition (PIAD). This manuscript details the results of recent experimental and modeling work aimed at a physical understanding of the APS. A three-zone model is proposed which consists of (i) the ionization zone (the source itself) where the plasma is very dense, hot, and has a high ionization rate, (ii) the acceleration zone (of ~20 cm extension) where a strong outward-directed electric field accelerates the primary ions to a high kinetic energy, and (iii) a drift zone (the rest of the process chamber) where the emerging plasma beam is further modified by resonant charge exchange collisions that neutralize some of the energetic ions and generate, at the same time, a flux of slow ions.

A general description of active resonance spectroscopic diagnostic tools for technical plasmas

This contribution investigates resonance spectroscopic plasma diagnostic. The idea is simple - the frequency dependence of the power absorption is displayed via a rf-signal fed to an antenna. Using the absorption spectrum, plasma parameter like the electron density or electron temperature are calculated. Starting five decades ago numerous concepts based on this idea have been developed as a promising concept for plasma diagnostics in an industrial setting - which means that the proposed methods are robust, calibration free, and economical, and can be used for ideal and reactive plasmas alike.