Martin Riediker
Novartis
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Featured researches published by Martin Riediker.
Advances in Resist Technology and Processing II | 1985
Ottmar Dr. Rohde; Martin Riediker; Armin Schaffner; J. Bateman
To date the use of photoimagable polyimide systems has been limited by lack of photo-speed, excessive volume contraction, and by shelf-life problems. These shortcomings have now been improved to the point where a practical, usable system has become available. Through the use of novel high quantum yield sensitizers, tailored to the g-line (436 nm) of the mercury spectrum, it is now possible to lower exposure times markedly and to reduce the amount of layer shrinkage that occurs in the final cure. Layers up to 70 microns and more of final cured polyimide can be photostructured at high resolution with an exposure energy of less than 1 J/cm2. The system presented is particularly useful for relatively thick layer applications as, for example, alpha particle protection, but can be used also for thin layer applications with accordingly shorter exposure times.
Angewandte Chemie | 1989
Martin Riediker; Rudolf O. Duthaler
Angewandte Chemie | 1989
Rudolf O. Duthaler; Peter Herold; Willy Lottenbach; Konrad Oertle; Martin Riediker
Pure and Applied Chemistry | 1990
Rudolf O. Duthaler; Andreas Hafner; Martin Riediker
Angewandte Chemie | 1989
Guido Bold; Rudolf O. Duthaler; Martin Riediker
Angewandte Chemie | 1989
Rudolf O. Duthaler; Peter Herold; Willy Lottenbach; Konrad Oertle; Martin Riediker
Pure and Applied Chemistry | 1986
A. Roloff; Kurt Meier; Martin Riediker
Helvetica Chimica Acta | 1990
Rudolf O. Duthaler; Peter Herold; Susanne Wyler‐Helfer; Martin Riediker
Angewandte Chemie | 1989
Martin Riediker; Rudolf O. Duthaler
Archive | 1984
Martin Riediker; Ottmar Dr. Rohde; Martin Roth; Niklaus Buhler