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Dive into the research topics where Martina E. Bachlechner is active.

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Featured researches published by Martina E. Bachlechner.


Computing in Science and Engineering | 2001

Multiscale simulation of nanosystems

Aiichiro Nakano; Martina E. Bachlechner; Rajiv K. Kalia; Elefterios Lidorikis; Priya Vashishta; George Z. Voyiadjis; Timothy J. Campbell; Shuji Ogata; Fuyuki Shimojo

The authors describe simulation approaches that seamlessly combine continuum mechanics with atomistic simulations and quantum mechanics. They also discuss computational and visualization issues associated with these simulations on massively parallel computers. Scientists are combining continuum mechanics and atomistic simulations through integrated multidisciplinary efforts so that a single simulation couples diverse length scales. However, the complexity of these hybrid schemes poses an unprecedented challenge, and developments in scalable parallel algorithms as well as interactive and immersive visualization are crucial for their success. This article describes such multiscale simulation approaches and associated computational issues using recent work as an example.


Applied Physics Letters | 1998

Multimillion-atom molecular dynamics simulation of atomic level stresses in Si(111)/Si3N4(0001) nanopixels

Martina E. Bachlechner; Andrey Omeltchenko; Aiichiro Nakano; Rajiv K. Kalia; Priya Vashishta; Ingvar Ebbsjö; A. Madhukar; Paul C. Messina

Ten million atom multiresolution molecular-dynamics simulations are performed on parallel computers to determine atomic-level stress distributions in a 54 nm nanopixel on a 0.1 µm silicon substrate. Effects of surfaces, edges, and lattice mismatch at the Si(111)/Si3N4(0001) interface on the stress distributions are investigated. Stresses are found to be highly inhomogeneous in the nanopixel. The top surface of silicon nitride has a compressive stress of +3 GPa and the stress is tensile, –1 GPa, in silicon below the interface.


computational science and engineering | 1998

Atomistic simulation of nanostructured materials

Aiichiro Nakano; Martina E. Bachlechner; Timothy J. Campbell; Rajiv K. Kalia; Andrey Omeltchenko; Kenji Tsuruta; Priya Vashishta; Shuji Ogata; Ingvar Ebbsjö; A. Madhukar

Materials and devices with microstructures on the nanometer scale are revolutionizing technology, but until recently simulation at this scale has been problematic. The paper considers how developments in parallel computing are now allowing atomistic simulation using multiresolution algorithms, such as fast multipole methods. With these algorithms, researchers may soon be able to simulate applications up to one billion atoms.The International Conference on Computer Design encompasses technical presentations in all fields of the design and implementation of computer systems and their components. ICCDs strength lies in its multidisciplinary character, covering practical and theoretical issues in systems and computer architecture, verification and testing, design and technology, and tools and methodologies. In contrast to most conferences that are specialized in a certain field, ICCD provides an ideal environment for researchers, developers, and students to receive leading-edge information on a wide range of topics related to their own work.


Applied Surface Science | 2001

Multimillion atom simulation of materials on parallel computers : nanopixel, interfacial fracture, nanoindentation, and oxidation

Priya Vashishta; Martina E. Bachlechner; Aiichiro Nakano; Timothy J. Campbell; Rajiv K. Kalia; Sanjay Kodiyalam; Shuji Ogata; Fuyuki Shimojo; Phillip Walsh

We have developed scalable space-time multiresolution algorithms to enable molecular dynamics simulations involving up to a billion atoms on massively parallel computers. Large-scale molecular dynamics simulations have been used to study stress domains and interfacial fracture in semiconductor/dielectric nanopixels, nanoindentation, and oxidation of metallic nanoparticles.


IEEE Transactions on Electron Devices | 2000

Large-scale atomistic modeling of nanoelectronic structures

Aiichiro Nakano; Martina E. Bachlechner; Paulo S. Branicio; Timothy J. Campbell; Ingvar Ebbsjö; Rajiv K. Kalia; A. Madhukar; Shuji Ogata; Andrey Omeltchenko; José Pedro Rino; Fuyuki Shimojo; Phillip Walsh; Priya Vashishta

Large-scale molecular-dynamics simulations are performed on parallel computers to study critical issues on ultrathin dielectric films and device reliability in next-decade semiconductor devices. New interatomic-potential models based on many-body, reactive, and quantum-mechanical schemes are used to study various atomic-scale effects: growth of oxide layers; dielectric properties of high-permittivity oxides; dislocation activities at semiconductor/dielectric interfaces; effects of amorphous layers and pixellation on atomic-level stresses in lattice-mismatched nanopixels; and nanoindentation testing of thin films. Enabling technologies for 10 to 100 million-atom simulations of nanoelectronic structures are discussed, which include multiresolution algorithms for molecular dynamics, load balancing, and data management. In ten years, this scalable software infrastructure will enable trillion-atom simulations of realistic device structures with sizes well beyond /spl mu/m on petaflop computers.


Progress of Theoretical Physics Supplement | 2000

Multimillion Atom Simulations of Nanostructured Materials on Parallel Computers Sintering and Consolidation, Fracture, and Oxidation

Priya Vashishta; Martina E. Bachlechner; Timothy J. Campbell; Rajiv K. Kalia; Hideaki Kikuchi; Sanjay Kodiyalam; Aiichiro Nakano; Shuji Ogata; Fuyuki Shimojo; Phillip Walsh

Multiresolution molecular-dynamics approach for multimillion atom simulations has been used to investigate structural properties, mechanical failure in ceramic materials, and atomiclevel stresses in nanoscale semiconductor/ceramic mesas (Si/Si3N4). Crack propagation and fracture in silicon nitride, silicon carbide, gallium arsenide, and nanophase ceramics are investigated. We observe a crossover from slow to rapid fracture and a correlation between the speed of crack propagation and morphology of fracture surface. A 100 million atom simulation is carried out to study crack propagation in GaAs. Mechanical failure in the Si/Si3N4 interface is studied by applying tensile strain parallel to the interface. Ten million atom molecular dynamics simulations are performed to determine atomic-level stress distributions in a 54nm nanopixel on a 0.1 µm silicon substrate. Multimillion atom simulations of oxidation of aluminum nanoclusters and nanoindentation in silicon nitride are also discussed.


MRS Proceedings | 2000

Coupling of Length Scales: Hybrid Molecular Dynamics and Finite Element Approach for Multiscale Nanodevice Simulations

Elefterios Lidorikis; Martina E. Bachlechner; Rajiv K. Kalia; George Z. Voyiadjis; Aiichiro Nakano; Priya Vashishta

A hybrid molecular-dynamics/finite-element simulation scheme is applied to describe multiscale phenomena in nanodevices. The quality of both static and dynamic coupling between atomistic and continuum regions is studied. The hybrid scheme is used for the Si/Si 3 N 4 interface problem (static coupling), and for the projectile impact on Si problem (dynamic coupling). Excellent agreement is found between hybrid and full molecular dynamics simulation results in the static case, and no wave reflections are found at the atomistic/continuum hand-shake in the dynamic case. The hybrid scheme is thus validated a powerful and cost effective method for performing multiscale simulations of nanodevices.


IEEE Computational Science and Engineering | 1998

N-body problems: Atomistic simulation of nanostructured materials

Aiichiro Nakano; Martina E. Bachlechner; Timothy J. Campbell; Rajiv K. Kalia; Andrey Omeltchenko; Kenji Tsuruta; Priya Vashishta; Shuji Ogata; Ingvar Ebbsjö; A. Madhukar

Materials and devices with microstructures on the nanometer scale are revolutionizing technology, but until recently simulation at this scale has been problematic. Developments in parallel computing are now allowing atomistic simulation using multiresolution algorithms, such as fast multipole methods. With these algorithms, researchers may soon be able to simulate applications up to one billion atoms.


Physical Review Letters | 2001

Coupling length scales for multiscale atomistics-continuum simulations: atomistically induced stress distributions in Si/Si3N4 nanopixels.

Elefterios Lidorikis; Martina E. Bachlechner; Rajiv K. Kalia; Aiichiro Nakano; Priya Vashishta; George Z. Voyiadjis


Archive | 2001

Coupling Length Scales for Multiscale Atomistics-Continuum Simulations

Martina E. Bachlechner; Rajiv K. Kalia; Elefterios Lidorikis; Aiichiro Nakano; Priya Vashishta

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Priya Vashishta

Argonne National Laboratory

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Rajiv K. Kalia

University of Southern California

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Aiichiro Nakano

University of Southern California

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A. Madhukar

University of Southern California

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Shuji Ogata

Nagoya Institute of Technology

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Eli T. Owens

North Carolina State University

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