Masahiro Horie

Spectroscopic multilayer film thickness measurement system

Accurate film thickness controls are indispensable for manufacturing defect-free semiconductor devices. Moreover, recent high integration requires simultaneous measurement of each film thickness and optical constants in multi-layers. This paper explains a microspectroscopic film thickness measurement system that measures film thickness at a very small spot (several micrometers in diameter) in several angstrom increments. This system also enables the user to measure film thickness on bulk wafers and SOI wafers, and determine optical constants of unknown films.