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Featured researches published by Masaichi Nagai.


Applied Physics Letters | 1989

Single‐beam overwriting with melt‐erasing process in an InSbTe phase‐change optical disk

Yoshihito Maeda; Hisashi Andoh; Iaso Ikuta; Masaichi Nagai; Yoshimi Katoh; Hiroyuki Minemura; Nobuyoshi Tsuboi; Yoshio Satoh; Norio Gotoh; Masaji Ishigaki

Single‐beam overwriting with melt‐erasing process was made in a 5.25‐in.‐diam phase‐change optical disk using an In22Sb37Te41 recording film. In the overwriting between 2 and 3 MHz signals at the linear velocity of 3–11 m/s, a carrier to noise ratio (C/N) more than 46 dB and an erasability less than −35 dB could be obtained. This high erasability was found to be due to the melt‐erasing process. This disk presents highly erasable overwriting and long data retention time supported by an activation energy of 2.3 eV and a temperature of 230 °C for crystallization of the amorphized part.


Applications of Artificial Neural Networks | 1990

Overwritable phase-change optical disk using an In3SbTe2 ternary compound

Yoshio Sato; Hiroyuki Minemura; Yoshihito Maeda; Isao Ikuta; Hisashi Andoh; Nobuyoshi Tsuboi; Masaichi Nagai

By employing transmission electron microscopy and thermal ana1yis, we examined overwrite repeatability of optical disks using In-Sb-Te alloys, which have high C/N ratio and excellent overwrite modulation characteristics. The overwrite repeatability of more than 105 was achieved by using an In3SbTe2 single-phase ternary compound and heat-flow balanced disk structure.


Japanese Journal of Applied Physics | 1989

Disk structure for high performance overwritable phase-change optical disks

Yoshihito Maeda; Hiroyuki Minemura; Masaichi Nagai; Isao Ikuta; Hisashi Andoh

Disk structure for high performance overwrite using an InSbTe recording film was examined and the results were analyzed by a computer calculation. It was confirmed that dielectric films and reflective films have great influences on the sensitivities of melting and amorphization of the recording film. It was suggested that the thermal contact between the dielectric film and the reflective film is important for stable overwrite repetition.


Optical Data Storage Topical Meeting | 1989

40 dB OVERWRITE -MODULATION PHASE- CHANGE OPTICAL DISK USING In -Sb -Te ALLOY

Yoshio Sato; Yoshihito Maeda; Hisashi Andoh; Isao Ikuta; Masaichi Nagai; Nobuyoshi Tsuboi; Hiroyuki Minemura; Masaji Ishigaki

A single-beam overwrite was achieved by an In-Sb-Te phase-change optical disk. The carrier to noise (C/N) ratio of more than 50 dB and the overwrite modulation of -40 dB were obtained for overwriting frequencies of 2 MHz and 3 MHz using a low power laser diode of 30 The high C/N ratio and the excellent overwrite modulation were due to the large reflectivity difference between the written and erased phases and the use of suitable write/erase power.


Archive | 1990

Optical memory and information processing apparatus

Yoshihito Maeda; Isao Ikuta; Masaichi Nagai; Yoshimi Katou; Hisashi Andoh; Nobuyoshi Tsuboi; Hiroyuki Minemura; Tatsuya Sugita; Yoshio Sato; Yutaka Sugita


Archive | 1992

Methods of varying optical properties, optical devices, information recording media and information recording methods and apparatuses

Yoshihito Maeda; Isao Ikuta; Masaichi Nagai; Yoshimi Kato; Hisashi Andoh; Nobuo Tsukamoto


Archive | 1989

Optical recording media and information recording and reproducing units

Yoshihito Maeda; Isao Ikuta; Hisashi Andoh; Masaichi Nagai; Yoshimi Katoh; Yoshio Sato; Nobuyoshi Tsuboi; Hiroyuki Minemura


Archive | 1990

Information processing apparatus and optical head incorporated therein

Nobuyoshi Tsuboi; Yoshio Sato; Hiroyuki Minemura; Hisashi Andoh; Masaichi Nagai; Isao Ikuta; Yoshimi Katou; Yoshihito Maeda; Tatsuya Sugita; Yutaka Sugita


Archive | 1994

ROM type optical recording medium with a high reflectivity and an optical head operable on ROM, write-one and rewritable disk

Hiroyuki Minemura; Yoshio Sato; Nobuyoshi Tsuboi; Hisashi Andoh; Masaichi Nagai; Isao Ikuta; Yoshimi Kato; Yoshihito Maeda; Tatsuya Sugita; Yutaka Sugita


Archive | 1996

Manufacturing method of CMOS thin film semiconductor device and CMOS thin film semiconductor device manufactured thereby

Akio Mimura; Hiroshi Suga; Masaichi Nagai; Youmei Shinagawa; Isao Ikuta

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