Masaki Koshiishi
Japan Aerospace Exploration Agency
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Publication
Featured researches published by Masaki Koshiishi.
Applied Optics | 2006
Yuichiro Ezoe; Masaki Koshiishi; Makoto Mita; Kazuhisa Mitsuda; Akio Hoshino; Yoshitaka Ishisaki; Zhen Yang; Takayuki Takano; Ryutaro Maeda
To develop x-ray mirrors for micropore optics, smooth silicon (111) sidewalls obtained after anisotropic wet etching of a silicon (110) wafer were studied. A sample device with 19 microm wide (111) sidewalls was fabricated using a 220 microm thick silicon (110) wafer and potassium hydroxide solution. For what we believe to be the first time, x-ray reflection on the (111) sidewalls was detected in the angular response measurement. Compared to ray-tracing simulations, the surface roughness of the sidewalls was estimated to be 3-5 nm, which is consistent with the atomic force microscope and the surface profiler measurements.
Applied Optics | 2010
Ikuyuki Mitsuishi; Yuichiro Ezoe; Masaki Koshiishi; Makoto Mita; Yoshitomo Maeda; Noriko Y. Yamasaki; Kazuhisa Mitsuda; Takayuki Shirata; Takayuki Hayashi; Takayuki Takano; Ryutaro Maeda
The x-ray reflectivity of an ultralightweight and low-cost x-ray optic using anisotropic wet etching of Si (110) wafers is evaluated at two energies, C K(alpha)0.28 keV and Al K(alpha)1.49 keV. The obtained reflectivities at both energies are not represented by a simple planar mirror model considering surface roughness. Hence, an geometrical occultation effect due to step structures upon the etched mirror surface is taken into account. Then, the reflectivities are represented by the theoretical model. The estimated surface roughness at C K(alpha) (approximately 6 nm rms) is significantly larger than approximately 1 nm at Al K(alpha). This can be explained by different coherent lengths at two energies.
ieee/leos international conference on optical mems and their applications conference | 2006
Masaki Koshiishi; Yuichiro Ezoe; Makoto Mita; Kazuhisa Mitsuda; Takayuki Takano; Ryutaro Maeda; Yoshitaka Ishisaki
In this paper, we report on the development of X-ray optics using anisotropic wet etching of silicon wafers. Both X-ray mirrors and an optics mount are fabricated fully using the MEMS technologies
TRANSDUCERS 2007 - 2007 International Solid-State Sensors, Actuators and Microsystems Conference | 2007
Yuichiro Ezoe; Masaki Koshiishi; Makoto Mita; Yoshitomo Maeda; Kazuhisa Mitsuda; Takeyuki Osawa; Masaki Suzuki; Akio Hoshino; Yoshitaka Ishisaki; Takayuki Takano; Ryutaro Maeda
A novel micromachined X-ray collector using anisotropically etched Si (111) planes as X-ray mirrors for future astronomical missions is reported. Mirrors, fabricated using dynashock-type ultrasonic waves, have very smooth surfaces with an rms roughness of nm or less. After the etching, mirror chips were cut from the wafer with a dicing machine and adhered to a mount formed by deep reactive ion etching, in order to collect parallel X-ray beam (0100 mm) on a tiny focus (phi 4 mm). The first light image was successfully obtained at Al Kalpha 1.49 keV in a ISAS 30 m-long beam line.
Proceedings of SPIE | 2007
Masaki Koshiishi; Yuichiro Ezoe; Makoto Mita; Yoshitomo Maeda; Kazuhisa Mitsuda; Masaki Suzuki; Takeyuki Osawa; Akio Hoshino; Yoshitaka Ishisaki; Takayuki Takano; Ryutaro Maeda
The first light of a ultra-lightweight and low-cost micro-pore X-ray optic utilizing MEMS (Micro Electro Mechanical Systems) technologies is reported. Our idea is to use silicon (111) planes appeared after anisotropic wet etching of silicon wafers. As a first step to Wolter type-1 optics, a single-stage optic with a focal length of 750 mm and a diameter of 100 mm was designed for energies below 2 keV. The optic consists of 218 mirror chips for X-ray reflection and an optic mount for packing these chips. Design parameters and required fabrication accuracies were determined with numerical simulations. The fabricated optic satisfied these accuracies and its imaging quality was measured at the ISAS X-ray beam line at Al Kα 1.49 keV. A focused image was successfully obtained. The measured image size of ~4 mm was consistent with the chip sizes. The estimated X-ray reflectivity also could be explained by micro-roughness of less than 3 nm and geometrical occulting effect due to large obstacle structures on the reflection surface.
Proceedings of SPIE | 2005
Yuichiro Ezoe; Kazuhisa Mitsuda; Makoto Mita; Masaki Koshiishi; Yoshitaka Ishisaki; Keisuke Shinozaki; Akio Hoshino
Development of a new light-weight and low-cost micro pore optics is reported. Utilizing anisotropic chemical wet etching of MEMS (Micro Electro Mechanical System) technology, a number of smooth sidewalls are obtained at once. These sidewalls are potential X-ray mirrors. As a first step of R&D, basic characters of sidewalls such as surface roughness and X-ray reflectivity are experimentally studied. Rms-roughness of 10 ~ 20Å is confirmed in a KOH-etched wafer. Furthermore, the X-ray reflection is for the first time detected at Mg Kα 1.25 keV. Based on the obtained results, numerical simulations of four-stage MEMS X-ray optics are performed for future satellite mission.
international conference on optical mems and nanophotonics | 2008
Ikuyuki Mitsuishi; Yuichiro Ezoe; Masaki Koshiishi; Makoto Mita; Yoshitomo Maeda; Noriko Y. Yamasaki; Kazuhisa Mitsuda; Takayuki Shirata; Takayuki Hayashi; Takayuki Takano; Ryutaro Maeda
X-ray reflectivity of an ultra light-weight X-ray optic using MEMS technologies was measured in two different energies (0.28 keV and 1.49 keV). The obtained reflectivities can be understood by considering the mirror surface structures.
Proceedings of SPIE | 2006
Yuichiro Ezoe; Masaki Koshiishi; Makoto Mita; Kazuhisa Mitsuda; Yoshitaka Ishisaki; Akio Hoshino; Zhen Yang; Takayuki Takano; Harutaka Mekaru; Ryutaro Maeda
Recent development of the extremely light-weight micro pore optics based on the semiconductor MEMS (Micro Electro Mechanical System) technologies is reported. Anisotropic chemical wet etching of silicon (110) wafers were utilized, in order to obtain a row of smooth (111) side walls vertical to the wafer face and to use them as X-ray mirrors. To obtain high performance mirrors with smooth surfaces and a high aspect ratio, several modifications were made to our previous manufacturing process shown in Ezoe et al. (2005). After these improvements, smooth surfaces with rms roughness of the order of angstroms and also a high aspect ratio of 20 were achieved. Furthermore, a single-stage optic was designed as a first step to multi-stage optics. A mounting device and a slit device for the sample optic were fabricated fully using the MEMS technologies and evaluated.
international conference on optical mems and nanophotonics | 2008
Masaki Koshiishi; Yuichiro Ezoe; Ikuyuki Mitsuishi; Makoto Mita; Kazuhisa Mitsuda; Takayuki Takano; Ryutaro Maeda
An ultra light-weight X-ray optic using MEMS technologies was designed for X-ray astronomy. Numerical simulation was utilized to estimate allowable fabrication accuracies. Obtained X-ray images with a fabricated optic were consistent with the design.
Proceedings of SPIE | 2008
Noriko Y. Yamasaki; Kazuhisa Mitsuda; Yoh Takei; Kensuke Masui; Toshishige Hagihara; Shunsuke Kimura; Masaki Koshiishi; Ikuyuki Mitsuishi; Keisuke Shinozaki; Akihiro Tsuchiya; Tomotaka Yoshino; Hiroshi Yoshitake; Ryuichi Fujimoto; Yoshitaka Ishisaki
Multiplexed readout of TES (Transition Edge Sensor) signals is one of the key technologies needed to realize large format arrays of microcalorimeters in future X-ray missions. In the FDM (Frequency-Domain Multiplexing) approach using MHz biasing frequencies, a wide band-width FLL (Flux Locked Loop) circuit is essential to compensate the phase delay between the TES sensor and the room temperature circuits. An analog feedback circuit using a lock-in amplifier technique and phase shifters with a very low noise pre-amplifier is being developed. This circuit will be tested with an actual TES array and an 8-input SQUID in the EURECA project.
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National Institute of Advanced Industrial Science and Technology
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