Masako Yamakawa

Investigation of correlation with the octanol water partition coefficient and the sensitivity of negative-tone molecular resists

In this paper, we report the investigation of correlation with the octanol water partition coefficient and the sensitivity of negative-tone molecular resists based on calix[4]resorcinarene (CRA) by Electron Beam Lithography (EBL). The sensitivity of negative-tone molecular resists were higher as the value of the Octanol water partition coefficient got smaller. It was confirmed that the octanol water partition coefficient was useful to the guess of sensitivity of negativetone molecular resists. Furthermore, we have developed calix[4]resorcinarenes showing well-defined sub 20nm halfpitch patterns.