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Featured researches published by Masami Hayashida.


X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers | 1988

Comparison Among Multilayer Soft X-Ray Mirrors Fabricated By Electron Beam, Dc-, Rf-Magnetron Sputtering And Ion Beam Sputtering Deposition

Shigetaro Ogura; Masahito Niibe; Yutaka Watanabe; Masami Hayashida; Takashi Iizuka

Multilayer Mo/Si mirrors have been fabricated by various physical vapor deposition methods. The best mirror fabricated by RF-magnetron sputtering showed a reflectivity of 57.8% at an incident angle of 25° and at a wavelength of 12.66 nm with synchrotron radiation reflectometer. The characteristics of fabricated multilayer mirrors have been measured using transmission electron microscope for surface and cross-sectional micrographs, electron diffraction for crystalline nature, small-angle x-ray diffractometer and synchrotron radiation reflectometer for reflectivity. Particularly, the dependencies of deposition parameters of Ar pressure and input power in RF-magnetron sputtering and substrate temperature in electron beam deposition in ultra high vacuum, have been investigated. The crystalization of Mo layers is clearly admitted for the mirrors by DC-and RF-magnetron sputtering. Surface roughness is minimum for the mirrors by RF-magnetron sputtering and ion beam sputtering. A possible reason of low reflectivity for the mirrors by ion beam sputtering is discussed from the resluts of additional analysis.


X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography | 1991

Suppression of columnar-structure formation in Mo-Si layered synthetic microstructures

Masahito Niibe; Masami Hayashida; Takashi Iizuka; Akira Miyake; Yutaka Watanabe; Rie Takahashi; Yasuaki Fukuda

We have previously reported that columnar-structures were formed in electron beam (EB) deposited and DCmagnetron sputtered Mo-Si layered synthetic microstructures (LSMs). The columnar structures reduced x-ray reflectivity by roughing layer interfaces of the LSMs. We here investigated the conditions to suppress columnar structure formation, by varying the substrate temperature (T9) in EB deposition and the argon pressure (PAT ) in D C- and RF-sputtering. In the EB deposited LSMs, the columnar structure disappeared and almost uniform LSMs were obtamed both at T□ 400°C and T9< -155°C. In the DC- and RF-sputtered LSMs, the columnar structure formation was suppressed by lowering PAr. The measured x-ray reflectivity of the LSMs increased according to the suppression of the columnar structure formation.


Archive | 1988

Reflection type mask

Tsutomu Ikeda; Yutaka Watanabe; Masayuki Suzuki; Masami Hayashida; Yasuaki Fukuda; Shigetaro Ogura; Takashi Iizuka; Masahito Niibe


Archive | 1994

Method of and apparatus for stabilizing shapes of objects, such as optical elements, as well as exposure apparatus using same and method of manufacturing semiconductor devices

Masahito Niibe; Yasuaki Fukuda; Masami Hayashida


Archive | 1996

Lithographic mask and exposure apparatus using the same

Yutaka Watanabe; Masami Hayashida


Archive | 1996

Illumination system and exposure apparatus having the same

Akira Miyake; Masami Hayashida


Archive | 1995

Exposure apparatus and reflection type mask to be used in the same

Yutaka Watanabe; Masami Hayashida


Archive | 1994

Method and device of manufacturing reflecting mask as well as exposure device and semiconductor device using the reflecting mask

Masami Hayashida; Yutaka Watanabe; 雅美 林田; 豊 渡辺


Archive | 1994

X-ray mirror, and x-ray exposure apparatus and device manufacturing method employing the same

Masami Hayashida; Yutaka Watanabe


Archive | 1992

X-ray lithography mask, light exposure apparatus and process therefore

Masami Hayashida; Yutaka Watanabe

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