Masaru Kikuchi
Sony Broadcast & Professional Research Laboratories
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Featured researches published by Masaru Kikuchi.
international solid-state circuits conference | 2006
Satoshi Yoshihara; Masaru Kikuchi; Yoshiharu Ito; Yoshiaki Inada; Souichiro Kuramochi; Hayato Wakabayashi; Masafumi Okano; Ken Koseki; Hiromi Kuriyama; Junichi Inutsuka; Akari Tajima; Tadashi Nakajima; Yoshiharu Kudoh; Fumihiko Koga; Y. Kasagi; S. Watanabe; Tetsuo Nomoto
A1/1.8-inch 6.4Mpixel 60frames/s CMOS image sensor fabricated in a 0.18mum 1P3M process is described. A zigzag-shaped 1.75T/pixel architecture and a 10b counter-type column parallel ADC enables 2.5times2.5mum2 pixels. The resulting pixel has 38% fill factor, 12ke-/lux-s, and random noise of 7e-rms. A 10b parallel LVDS interface enables data rates of up to 4.32Gb/s with 216MHz DDR. Full frame and 2times2 binning modes are interchangeable without an extra invalid frame
IEEE Journal of Solid-state Circuits | 2006
Satoshi Yoshihara; Yoshikazu Nitta; Masaru Kikuchi; Ken Koseki; Yoshiharu Ito; Yoshiaki Inada; Souichiro Kuramochi; Hayato Wakabayashi; Masafumi Okano; Hiromi Kuriyama; Junichi Inutsuka; Akari Tajima; Tadashi Nakajima; Yoshiharu Kudoh; Fumihiko Koga; Yasuo Kasagi; Shinya Watanabe; Tetsuo Nomoto
A 1/1.8-inch 6.4 MPixel 60 frames/s CMOS image sensor fabricated in a 0.18-mum single-poly triple-metal (1P3M) process is described. A zigzag-shaped 1.75 T/pixel architecture and a 10-bit counter-type column parallel ADC enables 2.5times2.5 mum2 pixels. The resulting pixel has 38% fill factor and 12ke-/lux.s sensibility. In addition, full frame and 2times2 binning modes are interchangeable without an extra invalid frame
international solid-state circuits conference | 2010
Hayato Wakabayashi; Keiji Yamaguchi; Masafumi Okano; Souichiro Kuramochi; Oichi Kumagai; Seijiro Sakane; Masamichi Ito; Masahiro Hatano; Masaru Kikuchi; Yuuki Yamagata; Takeshi Shikanai; Ken Koseki; Keiji Mabuchi; Yasushi Maruyama; Kentaro Akiyama; Eiji Miyata; Tomoyuki Honda; Masanori Ohashi; Tetsuo Nomoto
This paper presents a 1/2.3-inch 10.3Mpixel Back-Illuminated (BI) CMOS image sensor that targets both digital still camera (DSC) and high-definition camcorder applications. These applications require high-pixel-count, high-sensitivity, high saturation signal, low noise and high-speed imaging for image quality [1]. The sensor is scaled down to get a higher resolution due to higher pixel count. Several approaches such as a Cu process to reduce the pixel height and inner micro-lenses to gather rays of incident light have been proposed to overcome electro-optical challenges [2–4]. The BI process has been reported as one of the most promising technologies to improve optical performance [5,9]. This BI image sensor includes a 10b/12b analog-to-digital converter (ADC), an internal phase-locked loop (PLL) and a 10b serial LVDS interface to enable a data-rate up to 576MHz.
Archive | 2008
Yuuki Yamagata; Ken Koseki; Masaru Kikuchi; Yoshiaki Inada; Junichi Inutsuka; Akari Tajima
Archive | 2014
Hayato Wakabayashi; Masaru Kikuchi; Hiroshi Iwasa; Yuuki Yamagata
Archive | 2008
Hiroshi Iwasa; Masaru Kikuchi; Norito Wakabayashi; Yuuki Yamagata; 優輝 山形; 拓 岩佐; 準人 若林; 勝 菊地
Archive | 2010
Yuichiro Araki; Masaru Kikuchi
Archive | 2013
Yuichiro Araki; Masaru Kikuchi
Archive | 2011
Masahiro Hatano; Masaru Kikuchi
Archive | 2009
Masatsugu Onizuka; Masaru Kikuchi